Patents by Inventor Yoshiki Hasegawa

Yoshiki Hasegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160360800
    Abstract: A garment provided with cup sections includes: a first part on a front side including a pair of cup sections and a front side base section to support a lower edge portion side of the cup section; and a second part on a skin side including a pair of pad sections and a skin side base section to support a lower edge portion side of the pad section. A side portion of the front side base section and a side portion of the skin side base section are connected and thereby the first part and the second part are coupled to each other. The first part is movable upward, downward, forward, and backward relative to the second part.
    Type: Application
    Filed: February 25, 2014
    Publication date: December 15, 2016
    Inventors: Masaru Yuasa, Keiko Masuda, Mari Sakaguchi, Nobuko Hatano, Yoshiki Hasegawa
  • Publication number: 20140296582
    Abstract: The present invention provides a method for producing a reduction reaction product, wherein recovery of the reaction solvent and/or distillation is carried out after adding a nitrogen-containing compound into a reaction liquid of a reduction reaction that has been conducted using a transition metal complex. The present invention is capable of suppressing decrease in the optical purity of the reduction reaction product due to the transition metal complex used as a catalyst.
    Type: Application
    Filed: November 4, 2011
    Publication date: October 2, 2014
    Applicant: TAKASAGO INTERNATIONAL CORPORATION
    Inventors: Hideki Nara, Yoshiki Hasegawa
  • Patent number: 8013049
    Abstract: The present invention discloses a production method of core-shell type highly liquid absorbent resin particles comprising: (1) a first step in which a particle core portion is formed by suspension polymerizing an aqueous solution (e) containing (meth)acrylic acid, a crosslinking agent (c) and an anionic surfactant (d) in a hydrophobic organic solvent (a) containing a nonionic surfactant (b), and (2) a second step in which a shell portion that covers the particle core portion is formed by suspension polymerizing an aqueous solution (g) containing a water-soluble vinyl polymer (f), having carboxyl groups and polymerizable unsaturated double bonds and having a number average molecular weight of 500 to 10000, in a suspension obtained in the first step.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: September 6, 2011
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Hisakazu Tanaka, Kazuo Yamamura, Yoshiki Hasegawa, Masayuki Kamei
  • Publication number: 20090317733
    Abstract: Disclosed is a compound having excellent electron transporting ability, which is useful for electrophotographic photosensitive bodies or organic EL devices. Specifically disclosed is a novel quinone compound having a structure represented by general formula (I). Also disclosed is a highly sensitive, positive charge type electrophotographic photosensitive body for copying machines and printers, wherein the novel organic material is used as a charge-transporting material in a photosensitive layer. Also specifically disclosed is an electrophotographic photosensitive body having a photosensitive layer formed on a conductive base and containing a charge-generating material and a charge-transporting material, wherein the photosensitive layer contains at least one of the above-described compounds. Further disclosed is an electrophotographic apparatus using such a positive charge type electrophotographic photosensitive body.
    Type: Application
    Filed: January 17, 2007
    Publication date: December 24, 2009
    Applicant: Fuji Electric Device Technology Co., Ltd.
    Inventors: Kenichi Okura, Yoichi Nakamura, Motohiro Takeshima, Yoshiki Hasegawa, Hiroyuki Kenmochi, Tohru Kobayashi
  • Publication number: 20070276061
    Abstract: The present invention discloses a production method of core-shell type highly liquid absorbent resin particles comprising: (1) a first step in which a particle core portion is formed by suspension polymerizing an aqueous solution (e) containing (meth)acrylic acid, a crosslinking agent (c) and an anionic surfactant (d) in a hydrophobic organic solvent (a) containing a nonionic surfactant (b), and (2) a second step in which a shell portion that covers the particle core portion is formed by suspension polymerizing an aqueous solution (g) containing a water-soluble vinyl polymer (f), having carboxyl groups and polymerizable unsaturated double bonds and having a number average molecular weight of 500 to 10000, in a suspension obtained in the first step.
    Type: Application
    Filed: January 21, 2005
    Publication date: November 29, 2007
    Inventors: Hisakazu Tanaka, Kazuo Yamamura, Yoshiki Hasegawa, Masayuki Kamei
  • Publication number: 20060204874
    Abstract: A compound having a superior electron-transporting property useful for electrophotographic photoconductors and organic ELs, a positive charge type electrophotographic photoconductor for high sensitive copiers or printers and an electrophotographic apparatus using the same, by using the organic compound in a photosensitive layer as an electron-transporting material are provided. The present invention relates a quinone compound having a structure represented by Formula (I): (wherein R1, R2, R3, R4, R5, R6, R7 and R8 each denote hydrogen or an alkyl; R9 and R10 each denote hydrogen, an alkyl, aryl, or heterocyclic group; R11 and R12 each denote a halogen, an alkyl, alkoxy, alkyl halide, nitro, aryl, or heterocyclic group; n and m each denote an integer of 0 to 4; A denotes oxygen or SO2; and the substituent is a halogen, an alkyl, alkoxy, alkyl halide, nitro, aryl, or heterocyclic group), an electrophotographic photoconductor, and an electrophotographic apparatus using the same.
    Type: Application
    Filed: March 14, 2006
    Publication date: September 14, 2006
    Inventors: Kenichi Ohkura, Motohiro Takeshima, Shinichi Omokawa, Yoshiki Hasegawa, Tohru Kobayashi
  • Patent number: 6969750
    Abstract: The water absorbent material of the present invention is composed of a copolymer of an anhydropolyamino acid having at least one ethylenically unsaturated double bond in a molecule, a water-soluble monomer having an ethylenically unsaturated double bond and polysaccharides, and has high water absorption ratio and high water absorption rate in pure water or water having a low ion content and also has high absorption properties for high concentration salt-containing solutions.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: November 29, 2005
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Hisakazu Tanaka, Toshiya Kato, Shigeki Ideguchi, Hideyuki Ishizu, Yoshiki Hasegawa
  • Publication number: 20050258398
    Abstract: A 1,5-dithia-s-indacene or 1,7-dithia-s-indacene derivative represented by general formula (1): wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group or an alkoxy group; R3-R12 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom or a cyano group; either of X1 and X2 represents a sulfur atom while the other represents a carbon atom; either of X3 and X4 represents a sulfur atom while the other represents a carbon atom; R13, R14, R15 or R16 is present only in the case where X1, X2, X3 or X4, respectively, is a carbon atom, and R13, R14, R15 or R16 each independently represents a hydrogen atom, an alkyl group or a halogen atom; and a broken line independently indicates a double bond in the case where X1, X2, X3 or X4 to which the broken line is connected represents a carbon atom or a broken line independently indicates a single bond in case X1, X2, X3 or X4 to which the broken line is connected represents a sulfur atom.
    Type: Application
    Filed: April 27, 2005
    Publication date: November 24, 2005
    Inventors: Tohru Kobayashi, Yoshiki Hasegawa
  • Publication number: 20050171309
    Abstract: The water absorbent material of the present invention is composed of a copolymer of an anhydropolyamino acid having at least one ethylenically unsaturated double bond in a molecule, a water-soluble monomer having an ethylenically unsaturated double bond and polysaccharides, and has high water absorption ratio and high water absorption rate in pure water or water having a low ion content and also has high absorption properties for high concentration salt-containing solutions.
    Type: Application
    Filed: April 5, 2005
    Publication date: August 4, 2005
    Applicant: DAINIPPON INK AND CHEMICALS, INC.
    Inventors: Hisakazu Tanaka, Toshiya Kato, Shigeki Ideguchi, Hideyuki Ishizu, Yoshiki Hasegawa
  • Patent number: 6805920
    Abstract: This invention provides a polymerizable liquid crystal compound having a large value of &Dgr;n/n, excellent in coating properties on an alignment film and easily aligned. Disclosed is a polymerizable liquid crystal compound having at least one polymerizable reactive group and showing nematic liquid crystal properties, having a &Dgr;n/n value of 0.14 or more wherein n is average refractive index and &Dgr;n is extraordinary light refractive index (ne) minus ordinary light refractive index (no), and being aligned by application onto an alignment film.
    Type: Grant
    Filed: April 11, 2002
    Date of Patent: October 19, 2004
    Assignees: Nitto Denko Corporation, Takasago International Corporation
    Inventors: Shusaku Nakano, Amane Mochizuki, Yukiharu Iwaya, Shinya Yamada, Tsutomu Hashimoto, Yuji Nakayama, Yoshiki Hasegawa, Ken Suzuki, Tohru Kobayashi
  • Publication number: 20040081817
    Abstract: An absorbent material which comprises an absorbent resin containing a polyacidic amino acid as a constituent component of the resin and having a structure in which primary particles are agglomerated and including pores having a total pore volume as measured by a mercury penetration method of 0.5 to 5.0 cm3/g.
    Type: Application
    Filed: February 25, 2003
    Publication date: April 29, 2004
    Applicant: DAINIPPON INK AND CHEMICALS, INC.
    Inventors: Hisakazu Tanaka, Yoshiki Hasegawa, Masahiko Asada
  • Patent number: 6653399
    Abstract: A water absorbent material, comprising, as a main component, a water absorbent resin which has a structure in which a anhydropolyamino acid having an ethylenically unsaturated double bond is grafted with polysaccharides, wherein at least a portion of the anhydropolyamino acid is hydrolyzed and crosslinked, has high water absorbency and high biodegradability even if the anhydropolyamino acid has a low molecular weight.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: November 25, 2003
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Hisakazu Tanaka, Shigeki Ideguchi, Yoshiki Hasegawa
  • Publication number: 20030072893
    Abstract: This invention provides a polymerizable liquid crystal compound having a large value of An/n, excellent in coating properties on an alignment film and easily aligned. Disclosed is a polymerizable liquid crystal compound having at least one polymerizable reactive group and showing nematic liquid crystal properties, having a &Dgr;n/n value of 0.14 or more wherein n is average refractive index and &Dgr;n is extraordinary light refractive index (ne) minus ordinary light refractive index (no), and being aligned by application onto an alignment film.
    Type: Application
    Filed: April 11, 2002
    Publication date: April 17, 2003
    Inventors: Shusaku Nakano, Amane Mochizuki, Yukiharu Iwaya, Shinya Yamada, Tsutomu Hashimoto, Yuji Nakayama, Yoshiki Hasegawa, Ken Suzuki, Tohru Kobayashi
  • Publication number: 20030045198
    Abstract: The water absorbent material of the present invention is composed of a copolymer of an anhydropolyamino acid having at least one ethylenically unsaturated double bond in a molecule, a water-soluble monomer having an ethylenically unsaturated double bond and polysaccharides, and has high water absorption ratio and high water absorption rate in pure water or water having a low ion content and also has high absorption properties for high concentration salt-containing solutions.
    Type: Application
    Filed: March 22, 2002
    Publication date: March 6, 2003
    Inventors: Hisakazu Tanaka, Toshiya Kato, Shigeki Ideguchi, Hideyuki Ishizu, Yoshiki Hasegawa
  • Publication number: 20020161110
    Abstract: A water absorbent material, comprising, as a main component, a water absorbent resin which has a structure in which a anhydropolyamino acid having an ethylenically unsaturated double bond is grafted with polysaccharides, wherein at least a portion of the anhydropolyamino acid is hydrolyzed and crosslinked, has high water absorbency and high biodegradability even if the anhydropolyamino acid has a low molecular weight.
    Type: Application
    Filed: February 26, 2002
    Publication date: October 31, 2002
    Applicant: DAINIPPON INK AND CHEMICALS, INC.
    Inventors: Hisakazu Tanaka, Shigeki Ideguchi, Yoshiki Hasegawa
  • Patent number: 6461940
    Abstract: A dicing blade is disclosed which is capable of precisely cutting an object at a high speed without causing significant deposition of swarf upon a cut surface even when the object being cut has a large thickness. The dicing blade includes a ring-shaped cutting blade having a cutting edge formed on the peripheral rim of the ring-shaped cutting blade. At least one slit with a depth greater than the thickness of an object to be cut is formed in the cutting edge.
    Type: Grant
    Filed: June 14, 2000
    Date of Patent: October 8, 2002
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Yoshiki Hasegawa, Yasunobu Yoneda
  • Patent number: 5580812
    Abstract: The conductive material film, e.g. a polysilicon film, is anisotropically etched for forming a pattern, e.g. a storage electrode, and a base insulating film, e.g. an insulating film made of SiO.sub.2, is isotropically etched for exposing the sidewall or backside of the conductive material film during a manufacturing process of the semiconductor element, e.g. a memory cell including a transistor and a capacitor. A belt cover film, including the conductive material film, is formed to cover the surrounding and vicinity of a chip in which the semiconductor element is formed, at the same time when the conductive material film is formed.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: December 3, 1996
    Assignee: Fujitsu Limited
    Inventors: Shinichirou Ikemasu, Yoshiki Hasegawa, Yasuhiko Konno
  • Patent number: 5502332
    Abstract: The conductive material film, e.g. a polysilicon film, is anisotropically etched for forming a pattern, e.g. a storage electrode, and a base insulating film, e.g. an insulating film made of SiO.sub.2, is isotropically etched for exposing the sidewall or backside of the conductive material film during a manufacturing process of the semiconductor element, e.g. a memory cell including a transistor and a capacitor. A belt cover film, including the conductive material film, is formed to cover the surrounding and vicinity of a chip in which the semiconductor element is formed, at the same time when the conductive material film is formed.
    Type: Grant
    Filed: August 19, 1994
    Date of Patent: March 26, 1996
    Assignee: Fujitsu Limited
    Inventors: Shinichirou Ikemasu, Yoshiki Hasegawa, Yasuhiko Konno
  • Patent number: 5405466
    Abstract: A method of manufacturing a multilayer ceramic electronic component including a step of firing a ceramic green sheet laminate having internal electrodes containing at least one of palladium and silver, and a step of firing the ceramic green sheet laminate in a furnace having an oxygen partial pressure of not more than 5% in a temperature area exceeding 50.degree. C. during a temperature rise from 400.degree. C. to 1100.degree. C.
    Type: Grant
    Filed: September 9, 1993
    Date of Patent: April 11, 1995
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Yasuyuki Naito, Tetsuya Doi, Yoshiki Hasegawa, Tadashi Morimoto, Yukio Tanaka
  • Patent number: 5141983
    Abstract: An aqueous coating composition comprising, as essential components, an aqueous polyurethane resin (A) obtained by reacting a diisocyanate and glycols containing a carboxylic acid group-containing glycol to prepare an urethane prepolymer, neutralizing the urethane prepolymer and subjecting the neutralized urethane prepolymer to chain extension with a hydrazine derivative, and an aqueous dispersion (B) of an acrylic copolymer whose constituent monomers contain carbonyl group-containing monomer or an amido group-containing monomer in an amount of at least 0.
    Type: Grant
    Filed: December 17, 1991
    Date of Patent: August 25, 1992
    Assignee: Dainippon Ink & Chemicals, Inc.
    Inventors: Yoshiki Hasegawa, Fumio Yoshino, Shinichi Yoshioka, Kiyoshi Ohnishi