Patents by Inventor Yoshinori Sakamoto

Yoshinori Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6074962
    Abstract: Disclosed is a method for the formation of a silica-based coating film of a relatively large thickness in the manufacturing process of semiconductor devices and liquid crystal display panels by repeating the sequence consisting of coating of the surface with a coating solution containing a partial hydrolysis-condensation product of a trialkoxy silane compound followed by drying until a desired overall thickness of the coating film is obtained prior to a final baking treatment at 350 to 500.degree. C . The invention provides an improvement obtained by an ultraviolet irradiation treatment of the coating film intervening between a sequence of coating and drying and the next sequence of coating and drying so that the adhesion between the coating layers formed by repeating the sequence of coating and drying can be improved along with an advantage of absence of pinholes in the coating film.
    Type: Grant
    Filed: May 1, 1998
    Date of Patent: June 13, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshinori Sakamoto, Yoshio Hagiwara
  • Patent number: 5795378
    Abstract: Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: August 18, 1998
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshinori Sakamoto, Yoshio Hagiwara, Toshimasa Nakayama
  • Patent number: 5762697
    Abstract: Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.
    Type: Grant
    Filed: November 15, 1996
    Date of Patent: June 9, 1998
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshinori Sakamoto, Yoshio Hagiwara, Toshimasa Nakayama
  • Patent number: 5614251
    Abstract: Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3,in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formul aSi(OR).sub.4,in which each R has the same meaning as defined above,in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
    Type: Grant
    Filed: November 29, 1995
    Date of Patent: March 25, 1997
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshinori Sakamoto, Yoshio Hagiwara, Hatsuyuki Tanaka, Toshimasa Nakayama
  • Patent number: 5496402
    Abstract: Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3,in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4,in which each R has the same meaning as defined above, in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
    Type: Grant
    Filed: September 16, 1994
    Date of Patent: March 5, 1996
    Assignee: Tokyo Ohka Kogyo Co, Ltd.
    Inventors: Yoshinori Sakamoto, Yoshio Hagiwara, Hatsuyuki Tanaka, Toshimasa Nakayama
  • Patent number: 4958017
    Abstract: An industrially advantageous process for producing an inosine-guanosine mixture having a higher weight ratio of guanosine/inosine than a starting mixture of nucleoside crystals and inosine subtantially free of guanosine from which comprises adjusting an aqueous fluid containing 10 to 30% by weight/volume of a nucleoside mixture to a pH of 9.1 to 9.5, wherein the total amount of inosine and guanosine is more than 95% by weight based on dry matters and the weight ratio of guanosine/inosine is 0.5 to 1, separating the resultant solids and then crystallizing inosine from the resulting solution.
    Type: Grant
    Filed: December 13, 1988
    Date of Patent: September 18, 1990
    Assignee: Takeda Chemical Industries, Ltd.
    Inventors: Shohei Fujinawa, Yoshinori Sakamoto, Harumasa Iizuka
  • Patent number: 4783224
    Abstract: A hydrophilic coating is formed on an aluminum surface by the application of an aqueous solution of an amphoteric acrylamide polymer which is dried in place. The polymer solution may contain a cross-linking agent and the dried coating may be subsequently treated to form a water-glass coating.
    Type: Grant
    Filed: December 14, 1987
    Date of Patent: November 8, 1988
    Assignee: Nihon Parkerizing Co., Ltd.
    Inventors: Ryosuke Sako, Takao Ogino, Motoki Kanazawa, Akira Nishihara, Hiroshi Okita, Yoshinori Sakamoto