Patents by Inventor Yoshio Kimura

Yoshio Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210291625
    Abstract: A heat management device may include: a first heat circuit; a second heat circuit; a heat exchanger configured to cool the first heat circuit and heat the second heat circuit; air-heating apparatus configured to heat air using the second heat circuit; a battery and electrical apparatus configured to be cooled by the first heat circuit; and a radiator configured to exchange heat between the first heat circuit and outside air. A controller may be configured, in the second process, to cause the heat exchanger to cool the heat exchanger passage while a heat medium circulates in the heat exchanger passage and the battery passage and bypasses the radiator passage. The controller may be configured, in the third process, to cause the radiator to cool the heat medium while the heat medium circulates in the radiator passage and the electrical apparatus passage and bypasses the heat exchanger passage.
    Type: Application
    Filed: February 23, 2021
    Publication date: September 23, 2021
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, SUBARU CORPORATION
    Inventors: Kohji KINOSHITA, Shoma HANANO, Yoshio HASEGAWA, Manabu ORIHASHI, Hideyuki KAWAI, Kenichi KUBOTA, Makoto IKEGAMI, Yuuki KIMURA
  • Publication number: 20210291628
    Abstract: A heat circuit may include a controller configured to execute a first process and then a defrosting operation. The first process may be a process to execute a first air-heating operation and a heat storage operation simultaneously. The second process may be a process to execute a defrosting operation. The controller may be configured, in the first air-heating operation, to cause the radiator to heat a radiator passage and cause the air-heating apparatus to heat air using heat of a air-heating passage while circulating the heat medium in the radiator passage and the air-heating passage. The controller may be configured, in the heat storage operation, to circulate the heat medium in an electrical apparatus passage and a bypass passage. The controller may be configured, in the defrosting operation, to circulate the heat medium in the electrical apparatus passage and the radiator passage.
    Type: Application
    Filed: February 23, 2021
    Publication date: September 23, 2021
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, SUBARU CORPORATION
    Inventors: Kohji KINOSHITA, Shoma HANANO, Yoshio HASEGAWA, Manabu ORIHASHI, Kenichi KUBOTA, Hideyuki KAWAI, Makoto IKEGAMI, Yuuki KIMURA
  • Patent number: 10459339
    Abstract: This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 ?m; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: October 29, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuo Fukuoka, Yoshio Kimura, Gousuke Shiraishi
  • Patent number: 10351811
    Abstract: A cell culture container characterized by being equipped with a container main body and a flat plate attached onto one surface of the container main body, wherein the container main body is equipped with an inflow port through which a liquid can flow into the container main body, a passage through which the liquid flowing into the container main body from the inflow port can pass, and an outflow port through which the liquid passing through the passage can flow out from the container main body, and wherein, on the bottom surface of the passage, multiple cell-seeding areas in which cells passing through the passage can be seeded are arranged side by side along the passage.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: July 16, 2019
    Assignee: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Tomoaki Kurakazu, Yasuhiro Oshima, Yoshio Kimura, Kenichi Kagawa, Shinichi Gomi, Shigenori Ozaki
  • Publication number: 20160355773
    Abstract: A cell culture container characterized by being equipped with a container main body and a flat plate attached onto one surface of the container main body, wherein the container main body is equipped with an inflow port through which a liquid can flow into the container main body, a passage through which the liquid flowing into the container main body from the inflow port can pass, and an outflow port through which the liquid passing through the passage can flow out from the container main body, and wherein, on the bottom surface of the passage, multiple cell-seeding areas in which cells passing through the passage can be seeded are arranged side by side along the passage.
    Type: Application
    Filed: August 18, 2016
    Publication date: December 8, 2016
    Inventors: Tomoaki KURAKAZU, Yasuhiro OSHIMA, Yoshio KIMURA, Kenichi KAGAWA, Shinichi GOMI, Shigenori OZAKI
  • Publication number: 20160085154
    Abstract: This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 ?m; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.
    Type: Application
    Filed: May 8, 2014
    Publication date: March 24, 2016
    Inventors: Tetsuo FUKUOKA, Yoshio KIMURA, Gousuke SHIRAISHI
  • Patent number: 8888920
    Abstract: The present invention is an imprint system including an imprint unit transferring a transfer pattern to a coating film formed on a substrate using a template having the transfer pattern formed on a front surface thereof to form a predetermined pattern in the coating film, the imprint system including: a substrate carry-in/out station connected to the imprint unit, capable of keeping a plurality of the substrates, and carrying the substrate into/out of the imprint unit side; and a template carry-in/out station connected to the imprint unit, capable of keeping a plurality of the templates, and carrying the template into/out of the imprint unit side at a predetermined timing.
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: November 18, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano
  • Patent number: 8840728
    Abstract: The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: September 23, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano
  • Patent number: 8728565
    Abstract: The present invention provides a method for inhibiting production of copper sulfide in an electrical insulating oil inside an oil-filled electrical apparatus, including adding a benzotriazole compound not having a long-chain alkyl group when the oil-filled electrical apparatus is an open-type oil-filled electrical apparatus, or adding a benzotriazole compound having a long-chain alkyl group when the oil-filled electrical apparatus is a closed-type oil-filled electrical apparatus.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: May 20, 2014
    Assignee: Mitsubishi Electric Corporation
    Inventors: Fukutaro Kato, Eiichi Nagao, Tsuyoshi Amimoto, Yoshio Kimura, Noboru Hosokawa, Junji Tanimura, Satoru Toyama
  • Patent number: 8564804
    Abstract: Print job data is generated in accordance with a printing instruction from an application. When encryption of the print job data is designated, the generated print job data is encrypted, and the generated or encrypted print job data is output. When a printing apparatus serving as an output destination to which the encrypted print job data is output does not have a decryption function of decrypting the encrypted print job data, the output destination is changed to a decryption apparatus having the decryption function. When designation to save the print job data in the printing apparatus is detected in encryption, the print job is canceled.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: October 22, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masakatsu Sakurai, Yoshio Kimura
  • Patent number: 8547574
    Abstract: A technique for providing a first information processing apparatus configured to acquire first identification information as information for identifying the information processing apparatus, searching for a second information processing apparatus capable of wireless communication, acquiring a second identification information as information for identifying the second information processing apparatus that was found, comparing the first identification information and the second identification information, changing the first identification information when the first identification information and the second identification information are identical, and notifying when the first identification information is changed.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: October 1, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yoshio Kimura
  • Publication number: 20130216698
    Abstract: The present invention provides a method for inhibiting production of copper sulfide in an electrical insulating oil inside an oil-filled electrical apparatus, including adding a benzotriazole compound not having a long-chain alkyl group when the oil-filled electrical apparatus is an open-type oil-filled electrical apparatus, or adding a benzotriazole compound having a long-chain alkyl group when the oil-filled electrical apparatus is a closed-type oil-filled electrical apparatus.
    Type: Application
    Filed: April 8, 2011
    Publication date: August 22, 2013
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Fukutaro Kato, Eiichi Nagao, Tsuyoshi Amimoto, Yoshio Kimura, Noboru Hosokawa, Junji Tanimura, Satoru Toyama
  • Patent number: 8457310
    Abstract: A print system which are capable of inhibiting simultaneous use of the encrypted print and the box storage to thereby increase the security of print data. A host computer has an encryption function of encrypting print data, and issues a print job for the print data encrypted by the encryption function. A print server receives the issued print job, and has a decryption function of decrypting the encrypted print data of the received print job. A printer has a storage function of storing the print data decrypted by the decryption function, and outputs the stored print data. At least one of the host computer and the print server inhibits simultaneous use of the encryption function and the storage function.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: June 4, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroshi Uchikawa, Yushi Matsukubo, Fumio Mikami, Yoshinobu Umeda, Tadashi Kawaguchi, Yoshio Kimura, Yasuhiko Hirano, Hitoshi Imai, Hiroyasu Morita
  • Patent number: 8408158
    Abstract: A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.
    Type: Grant
    Filed: March 9, 2006
    Date of Patent: April 2, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Masami Akimoto, Shinichi Hayashi, Yasushi Hayashida, Nobuaki Matsuoka, Yoshio Kimura, Issei Ueda, Hikaru Ito
  • Patent number: 8302556
    Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.
    Type: Grant
    Filed: August 12, 2010
    Date of Patent: November 6, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Masami Akimoto, Shinichi Hayashi, Yasushi Hayashida, Nobuaki Matsuoka, Yoshio Kimura, Issei Ueda, Hikaru Ito
  • Patent number: 8268384
    Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.
    Type: Grant
    Filed: September 21, 2010
    Date of Patent: September 18, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Nobuaki Matsuoka, Yoshio Kimura, Akira Miyata
  • Patent number: 8231285
    Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: July 31, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Kunie Ogata, Koki Nishimuko, Hiroshi Tomita, Yoshio Kimura, Ryouichi Uemura, Michio Tanaka
  • Publication number: 20120180475
    Abstract: An actuator 10 includes a main body 14 having a displacement unit 11 and electrodes 12 and 13 configured to apply a voltage to the displacement unit 11, the displacement unit being made of a mixture of a silicone-containing elastomer and an ionic liquid, and being displaced by applying a voltage between the electrodes; and a displacement transmission unit 15 configured to be displaced in an out-of-plane direction by displacement of the displacement unit 11.
    Type: Application
    Filed: September 28, 2010
    Publication date: July 19, 2012
    Applicants: UNIVERSITY OF YAMANASHI, TOKYO ELECTRON LIMITED
    Inventors: Masahiro Shimizu, Shigekazu Komatsu, Eiichi Nishimura, Yoshio Kimura, Takahiko Ooasa, Hidenori Okuzaki
  • Publication number: 20120097336
    Abstract: The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.
    Type: Application
    Filed: June 21, 2010
    Publication date: April 26, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano
  • Publication number: 20120086142
    Abstract: The present invention is a system including: an imprint unit transferring a transfer pattern to a coating film on a substrate using a template to form a predetermined pattern in the coating film; a treatment station connected to the imprint unit and performing a predetermined treatment on the template; a template carry-in/out station connected to the treatment station, capable of keeping templates, and carrying the template in/out from/to the treatment station; a carry line provided through the imprint unit and carrying the template between the imprint unit and the treatment station; and a substrate carry-in/out station connected to the imprint unit, capable of keeping substrates, and carrying the substrate in/out from/to the imprint unit.
    Type: Application
    Filed: June 21, 2010
    Publication date: April 12, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano