Abstract: According to one embodiment, there is provided an image display apparatus including: a memory storing data; a memory controller causing image data of an image for display at a startup time to be stored in the memory, before a power state shifts to a standby state; and a display controller reading the image data stored in the memory and causing the image for display at the startup time to be displayed, when the power state returns from the standby state.

Abstract: A buffer tank for use in a liquid treatment apparatus applying a liquid treatment to a substrate surface by supplying thereto a treating liquid from a nozzle, the buffer tank is provided in a flow path of the treating liquid from a supply tank of the liquid to the nozzle, the buffer tank including an inlet port for introducing the treating liquid supplied from the supply tank into a buffer tank body, a first accumulation region in the buffer tank body for holding the treating liquid introduced into the buffer tank, a first vent port for discharging bubbles accumulated in the first accumulation region, a filter through which the treating liquid in the first accumulation region passes, the filter filtering the treating liquid, and a supplying port for supplying the treating liquid filtered with the filter to the nozzle.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks: DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.

Abstract: The object is to reduce the total processing time by transferring the substrate at the first delivery stage to the process block where processing can be carried out earliest. The substrate processing apparatus includes first transfer means (22) for delivering a wafer (W) with respect to a substrate carrier (C), and second transfer means (23) for delivering a wafer (W) between a plurality of process blocks (B3-B5) and the first transfer means (22) via a first delivery stage (24), to transfer the wafer (W) with respect to the process blocks (B3-B5). In this apparatus, the process block where there is no wafer (W) or where processing of the last wafer (W) within the relevant process block will be completed earliest is determined based on processing information of the wafers (W) from the process blocks (B3-B5), and the wafer (W) of the first delivery stage (24) is transferred by the second transfer means (23) to the relevant process block. This ensures smooth transfer of the wafer (W) to the process block.

Abstract: A data processing device transmits specific information through a network, receives a public key transmitted based on the specific information through the network, and stores the received public key. Further, the data processing device receives print data and encrypted data corresponding to the print data, decrypts the received encrypted data by using the stored public key, and prints the received print data if the data after it was decrypted is specific data. Meanwhile, the data processing device does not print the received print data if the data after it was decrypted is not the specific data.

Abstract: A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A substrate processing apparatus capable of readily addressing an increase/decrease in quantity of substrates to be processed and a change in type thereof. The substrate processing apparatus includes a carrier block having a first transfer device performing delivery of the substrate with respect to a substrate carrier on a carrier placement portion, a transfer block provided adjacent to the carrier block and having a second transfer device, a first delivery stage performing delivery of the substrate between the first transfer device and the second transfer device, and a plurality of process blocks freely attachable/detachable with respect to the transfer block. Since the process blocks perform a series of processing on the substrate in units of the process blocks, it is readily possible to address considerable increase/decrease in quantity of processed substrates by attaching/detaching the process block(s), and to address the different change in type thereof by changing the process block(s).

Abstract: A process system includes a plurality of processing modules each processing a substrate with a process liquid. There is disposed a dispensing mechanism that dispenses the process liquid to the vertically arranged modules. The dispensing mechanism is provided with a process liquid supply source, and pumps corresponding to the respective processing modules. Each pump temporarily stores therein the process liquid which has been pressure-fed through a riser piping from the process liquid supply source by a pressing apparatus, and delivers the process liquid from an outlet. There are disposed nozzles each having a discharge port and discharging the process liquid to the corresponding processing module. Delivery pipings connecting the outlets of the pumps with the discharge ports of the corresponding nozzles have identical length to each other.

Abstract: Disclosed is an exhaust system for discharging a fluid which is supplied into a hermetically closed container 54 for containing a semiconductor wafer W, a substrate to be supplied in the container 54 and subjected to a process. The exhaust system comprises an outer exhaust pipe 71 which is connected to the hermetically closed container via an exhaust connecting pipe 68 and has closed top and bottom ends, a downstream guide passage 201 which is provided in the outer exhaust pipe 71 and adapted to downwardly guide an exhaust fluid flowing through the outer exhaust pipe 71, and an upstream guide passage 202 which is adapted to upwardly guide the exhaust fluid having flowed through the downstream guide passage 201 as well as to cause foreign matter or the like in the exhaust fluid to be settled by gravity. The exhaust fluid having flowed through the upstream guide passage 202 is discharged from a discharging passage 203 to the outside.

Abstract: A polishing composition contains silica abrasive grains having an average particle size of 20 to 100 nm, an alkali selected from the group consisting of ammonia, ammonium salts, alkali metal salts, and alkali metal hydroxides, and a silicone oil having an HLB value greater than or equal to 8. The polishing composition is suitable for use in an application for polishing an object to be polished.

Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.

Abstract: In case a file is prepared by executing an application, the fee for the use of the application is charged according to whether such file is subjected to an output process. Thus the user of the application need not pay the fee for the use of the application for the mere preparation of the file by using the application.

Abstract: Print job data is generated in accordance with a printing instruction from an application. When encryption of the print job data is designated, the generated print job data is encrypted, and the generated or encrypted print job data is output. When a printing apparatus serving as an output destination to which the encrypted print job data is output does not have a decryption function of decrypting the encrypted print job data, the output destination is changed to a decryption apparatus having the decryption function. When designation to save the print job data in the printing apparatus is detected in encryption, the print job is canceled.

Abstract: To provide a device searching client which can extract, for example, dynamic search conditions which are peculiar to a printing matter (print job), search a device, and correctly print, in a printer as a device searching client, a CRT has search condition input means for allowing the user to input not only static data but also dynamic data as search conditions.

Abstract: A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.