Abstract: The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive particle; (b) an ionic oxidizer; and (c) water, wherein the chemical-mechanical polishing composition has a pH of about 1 to about 7, the abrasive particle has an isoelectric point that is higher than 8, and the ionic oxidizer has a negative charge at the pH of the chemical-mechanical polishing composition. The invention also provides a method of chemically-mechanically polishing a substrate, especially a substrate comprising a silicon carbide layer on a surface of the substrate, using said composition.

Abstract: Provided is a chemical-mechanical polishing composition comprising an abrasive, a basic component, at least one compound selected from the group consisting of a quaternary polyammonium salt, a quaternary ammonium salt having 6 or more carbon atoms, and an alkylated polymer having an amide structure, and an aqueous carrier; a rinse composition comprising the at least one compound and an aqueous carrier, as well as a method of chemically-mechanically polishing a substrate, and a method of rinsing a substrate, in which the respective compositions are used.

Abstract: Provided is a chemical-mechanical polishing composition including an abrasive, a basic component, a polyoxyalkylene alkyl ether represented by the formula (i) RO-(AO)n—H, wherein R is a linear or branched C1 to C15 alkyl group, A is an alkylene group selected from the group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents average addition mol numbers of AO and is 2 to 30, and an aqueous carrier, a rinse composition including the polyoxyalkylene alkyl ether and an aqueous carrier, and a substrate chemical-mechanical polishing method and a rinsing method in which these are used.

Abstract: A culture system and a culture device each can minimize the burden on workers and can effectively prevent the effect of temperature changes on culture by performing manipulation of a multilayer culture vessel and the culture in sequence in the same space. The culture system comprises a housing with an internal space in which a multilayer culture vessel including a plurality of trays therein is placed, and a manipulator manipulating the multilayer culture vessel while the multilayer culture vessel is kept in a state placed within the internal space. The multilayer culture vessel is communicated with a liquid supply tube such that a fluid material can be introduced into the multilayer culture vessel from an outside of the housing via the liquid supply tube, or that a fluid can be discharged from the multilayer culture vessel to the outside of the housing via the liquid supply tube.

Abstract: A chemical mechanical polishing composition for polishing a silicon wafer comprises, consists essentially of, or consists of a water based liquid carrier, colloidal silica particles dispersed in the liquid carrier, about 0.01 weight percent to about 2 weight percent of a dipolar aprotic solvent at point of use, and a pH in a range from about 8 to about 12. A method for polishing a silicon wafer may include contacting the wafer with the above described polishing composition, moving the polishing composition relative to the wafer, and abrading the wafer to remove silicon from the wafer and thereby polish the wafer.

Abstract: Provided is a chemical-mechanical polishing composition including an abrasive, a basic component, a polyoxyalkylene alkyl ether represented by the formula (i) RO-(AO)n—H, wherein R is a linear or branched C1 to C15 alkyl group, A is an alkylene group selected from the group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents average addition mol numbers of AO and is 2 to 30, and an aqueous carrier, a rinse composition including the polyoxyalkylene alkyl ether and an aqueous carrier, and a substrate chemical-mechanical polishing method and a rinsing method in which these are used.

Abstract: Provided are a slurry composition to be used in chemical mechanical polishing (CMP), and a method for polishing a substrate. This slurry composition contains water, abrasive grains, and an alkylene polyalkylene oxide amine polymer having a solubility parameter in a range of 9-10. A preferred alkylene polyalkylene oxide amine polymer is given by general formula (1). (In general formula (1), m and n are positive integers, and A and R are alkylene oxide groups.

Abstract: A fastening system for securing a first region having a first securing member and a second region having a second securing member. The system includes a first surface fastener provided on a first securing member and a second surface fastener provided on a first securing member or a second securing member. That securing member, out of the first securing member and the second securing member, having the second surface fastener provided thereon includes the second surface fastener and a substrate having the second surface fastener laminated thereon.

Abstract: A display and operating unit and a main unit are connected with the ability to be separated. In a state with the connection with the main unit separated, the display and operating unit is attached to the front surface side of a panel. In this case, the connector cable is passed through an opening formed on the panel and positioned at the back surface side of the panel, and packing is positioned so as to enclose the periphery of the opening, and the display and operating unit is attached to the front surface side of the panel. Then, the main unit is fixed to the back surface side of the panel, a connector CN1 of the tip end of the connector cable is engaged with a connector of the main unit, and the display and operating unit and the main unit are connected.

Abstract: Provided are a slurry composition to be used in chemical mechanical polishing (CMP), and a method for polishing a substrate. This slurry composition contains water, abrasive grains, and an alkylene polyalkylene oxide amine polymer having a solubility parameter in a range of 9-10. A preferred alkylene polyalkylene oxide amine polymer is given by general formula (1). (In general formula (1), m and n are positive integers, and A and R are alkylene oxide groups.

Abstract: Slurry composition and a method of substrate polishing used in chemical mechanical polishing (CMP). The present invention concerns a slurry composition containing a polishing agent and a water soluble polymer. The slurry composition contains a water soluble polymer that has a solubility parameter in the range of 9.0 to 14.0 and that may contain hetero atoms at a level sufficient to lower the polishing rate near the edges of the polished substrate defined as the region within 1 mm of the outer edge of the polished substrate to a level below the mean polishing rate of the polished substrate. The water soluble polymer may have a mean molecular weight in the range of 200 to about 3,000,000, and the mean molecular weight may be in the range of 200 to 110,000 if hetero atoms are present in the main-chain structure and the SP value is under 9.5.

Abstract: Disclosed is a sample holding carrier allowing samples to be measured accurately, and a fluorescence detection device for use with the sample holding carrier. A biosensor substrate includes a base substrate, a plurality of wells formed on a first surface side of the base substrate; and grooves formed on the first surface side of the base substrate separately from the wells and generating fluorescence under exposure to excitation light. The fluorescence detection device applies excitation light to the grooves, thereby figuring out the level of the fluorescence to be detected from the biosensor substrate. As a result, the fluorescence detection device can amplify the detection signals of the fluorescence generated when the excitation light is applied to the wells to an appropriate level, thereby accurately detecting the fluorescence generated in the samples.

Abstract: A display and operating unit and a main unit are connected with the ability to be separated. In a state with the connection with the main unit separated, the display and operating unit is attached to the front surface side of a panel. In this case, the connector cable is passed through an opening formed on the panel and positioned at the back surface side of the panel, and packing is positioned so as to enclose the periphery of the opening, and the display and operating unit is attached to the front surface side of the panel. Then, the main unit is fixed to the back surface side of the panel, a connector CN1 of the tip end of the connector cable is engaged with a connector of the main unit, and the display and operating unit and the main unit are connected.

Abstract: Slurry composition and a method of substrate polishing used in chemical mechanical polishing (CMP). The present invention concerns a slurry composition containing a polishing agent and a water soluble polymer. The slurry composition contains a water soluble polymer that has a solubility parameter in the range of 9.0 to 14.0 and that may contain hetero atoms at a level sufficient to lower the polishing rate near the edges of the polished substrate defined as the region within 1 mm of the outer edge of the polished substrate to a level below the mean polishing rate of the polished substrate. The water soluble polymer may have a mean molecular weight in the range of 200 to about 3,000,000, and the mean molecular weight may be in the range of 200 to 110,000 if hetero atoms are present in the main-chain structure and the SP value is under 9.5.

Abstract: A printed board connecting structure including a first printed board provided with either a male or female connector as a first connector, and a second printed board provided with the other connector (the female or male connector) as a second connector, wherein the first printed board and the second printed board are connected through mating of the first connector and the second connector. The first printed board comprises a guiding hole on a board surface in the vicinity of the first connector; and the second printed board comprises a guiding protrusion for guiding the mating of the first connector and the second connector by first engaging with the guiding hole of the first printed board when the first connector and the second connector are to be mated.

Abstract: The present invention provides a sample holding carrier that can accurately measure a sample with a simple configuration, and a fluorescence detection system and device that use the same. Biosensor substrate includes: base substrate on which excitation light is incident from a lower surface; reflecting film that is arranged on an upper surface of base substrate to partially reflect the excitation light; and plural wells that are arranged on an upper surface side of reflecting film and have bottom surface portions. The excitation light is converged to be incident on base substrate. Distance from reflecting surface that is of a boundary between reflecting film and base substrate to bottom surface portion of well is less than or equal to a focal depth of the excitation light. Therefore, the sample accommodated in bottom surface portion of well can surely and efficiently be irradiated with the excitation light, and accurately be measured.

Abstract: The present invention provides a sample holding carrier that can accurately measure a sample with a simple configuration, and a fluorescence detection system and device that use the same. Biosensor substrate includes: base substrate on which excitation light is incident from a lower surface; reflecting film that is arranged on an upper surface of base substrate to partially reflect the excitation light; and plural wells that are arranged on an upper surface side of reflecting film and have bottom surface portions. The excitation light is converged to be incident on base substrate. Distance from reflecting surface that is of a boundary between reflecting film and base substrate to bottom surface portion of well is less than or equal to a focal depth of the excitation light. Therefore, the sample accommodated in bottom surface portion of well can surely and efficiently be irradiated with the excitation light, and accurately be measured.

Abstract: Disclosed is a sample holding carrier allowing samples to be measured accurately, and a fluorescence detection device for use with the sample holding carrier. A biosensor substrate includes a base substrate, a plurality of wells formed on a first surface side of the base substrate; and grooves formed on the first surface side of the base substrate separately from the wells and generating fluorescence under exposure to excitation light. The fluorescence detection device applies excitation light to the grooves, thereby figuring out the level of the fluorescence to be detected from the biosensor substrate. As a result, the fluorescence detection device can amplify the detection signals of the fluorescence generated when the excitation light is applied to the wells to an appropriate level, thereby accurately detecting the fluorescence generated in the samples.

Abstract: A purification unit for purifying air by a photocatalytic reaction includes a first light source which emits light; a first reflection plate which reflects the light emitted from the first light source; and a plurality of purification plates which cause the photocatalytic reaction by irradiation of the light emitted from the first light source. In this arrangement, at least one of the purification plates is disposed between the first reflection plate and the first light source, and the light emitted from the first light source is transmitted through the purification plate disposed between the first reflection plate and the first light source, and then is reflected on the first reflection plate for irradiation onto the purification plates.

Abstract: A recording medium includes at least one recording layer on which information is recorded by multi-photon absorption, and a servo layer disposed in a laminated direction with respect to the recording layer and having a track for guiding a beam spot of laser light having a first wavelength and a beam spot of laser light having a second wavelength along a scanning trajectory. The servo layer and the at least one recording layer constitute a set of layers, and a plurality of sets of layers is formed in the laminated direction. The servo layer is made of a material having a high reflectance with respect to laser light having a third wavelength for generating a servo signal, and low reflectances with respect to the laser light having the first wavelength and the laser light having the second wavelength.