Patents by Inventor Yoshiyuki Yamamoto

Yoshiyuki Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7863805
    Abstract: It is possible to provide an electron emission cathode, an electron emission source having a high-luminance and narrow energy width by using diamond and an electronic device using them. The diamond electron discharge cathode has a monocrystal diamond at least at a part of it. The diamond electron emission cathode has a columnar shape including a sharpened section and a heating section. The sharpened section has an electron emission section. The electron emission section and the heating section are formed by diamond semiconductor, which is formed by a p-type semiconductor containing 2×1015 cm?3 of p-type impurities or above. The electron emission section has the semiconductor. A metal layer is formed on the surface of the electron emission cathode. The metal layer exists at least at a part of the heating section. The distance from the electron emission section to the position nearest to the end of the metal layer is 500 ?m.
    Type: Grant
    Filed: June 19, 2006
    Date of Patent: January 4, 2011
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Yoshiyuki Yamamoto, Akihiko Ueda, Yoshiki Nishibayashi, Takahiro Imai
  • Publication number: 20100314625
    Abstract: Affords a GaN single-crystal mass, a method of its manufacture, and a semiconductor device and method of its manufacture, whereby when the GaN single-crystal mass is being grown, and when the grown GaN single-crystal mass is being processed into a substrate or like form, as well as when an at least single-lamina semiconductor layer is being formed onto a single-crystal GaN mass in substrate form to manufacture semiconductor devices, cracking is controlled to a minimum. The GaN single-crystal mass 10 has a wurtzitic crystalline structure and, at 30° C., its elastic constant C11 is from 348 GPa to 365 GPa and its elastic constant C13 is from 90 GPa to 98 GPa; alternatively its elastic constant C11 is from 352 GPa to 362 GPa.
    Type: Application
    Filed: June 10, 2010
    Publication date: December 16, 2010
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Hideaki NAKAHATA, Shinsuke FUJIWARA, Takashi SAKURADA, Yoshiyuki YAMAMOTO, Seiji NAKAHATA, Tomoki UEMURA
  • Patent number: 7821795
    Abstract: A multilayered substrate includes a plurality of circuit boards including a plurality of wiring layers including a grounding layer and a power layer, a solid electrolytic capacitor having an insulative oxide film layer, an electrolytic layer, and a conductor layer sequentially formed on one surface or both surfaces of a foil-like metal substrate, and a conductive substance passing through the circuit board across a thickness thereof. The solid electrolytic capacitor is disposed to be held between the plurality of circuit boards. The conductor layer is connected to a grounding electrode formed on the grounding layer, the foil-like metal substrate being connected to a power electrode formed on the power layer.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: October 26, 2010
    Assignee: Panasonic Corporation
    Inventors: Yasuhiro Sugaya, Yoshiyuki Yamamoto, Toshiyuki Asahi, Katsumasa Miki, Masaaki Katsumata, Yoshiyuki Saitou, Takeshi Nakayama
  • Patent number: 7807126
    Abstract: A method for manufacturing a diamond single crystal substrate, in which a single crystal is grown from a diamond single crystal serving as a seed substrate by vapor phase synthesis, said method comprising: preparing a diamond single crystal seed substrate which has a main surface whose planar orientation falls within an inclination range of not more than 8 degrees relative to a {100} plane or a {111} plane, as a seed substrate; forming a plurality of planes of different orientation which are inclined in the outer peripheral direction of the main surface relative to the main surface on one side of this seed substrate, by machining; and then growing a diamond single crystal by vapor phase synthesis.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: October 5, 2010
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kiichi Meguro, Yoshiyuki Yamamoto, Takahiro Imai
  • Publication number: 20100209622
    Abstract: Flat, thin AlN membranes and methods of their manufacture are made available. An AlN thin film (2) contains between 0.001 wt. % and 10 wt. % additive atomic element of one or more type selected from Group-III atoms, Group-IV atoms and Group-V atoms. Onto a base material (1), the AlN thin film (2) is formable utilizing a plasma generated by setting inside a vacuum chamber an sintered AlN ceramic containing between 0.001 wt. % and 10 wt. % additive atomic element of one or more type selected from Group-III atoms, Group-IV atoms and Group-V atoms, and with the base material having been set within the vacuum chamber, irradiating the sintered AlN ceramic with a laser.
    Type: Application
    Filed: February 18, 2009
    Publication date: August 19, 2010
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Issei Satoh, Naho Mizuhara, Keisuke Tanizaki, Michimasa Miyanaga, Takashi Sakurada, Yoshiyuki Yamamoto, Hideaki Nakahata
  • Patent number: 7771693
    Abstract: A diamond single crystal substrate manufacturing method for growing by vapor-phase synthesis a single crystal from a diamond single crystal seed substrate, comprising etching away by reactive ion etching, prior to single crystal growth, at least 0.5 ?m and less than 400 ?m, in etching thickness off the surface of the seed substrate which has been mechanically polished, thereby removing from the surface of the seed substrate the work-affected layers caused by mechanical polishing; and growing then a single crystal thereon. The manufacturing method provides a diamond single crystal substrate having a high quality, large size, and no unintentional impurity inclusions, and suitable for use as semiconductor materials, electronic components, optical components or the like.
    Type: Grant
    Filed: August 15, 2008
    Date of Patent: August 10, 2010
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kiichi Meguro, Yoshiyuki Yamamoto, Takahiro Imai
  • Patent number: 7737614
    Abstract: An object is to provide an electron emission cathode and an electron emission source using diamond and having a high brightness and a small energy width that are suitable for electron ray and electron beam devices and vacuum tubes, in particular, electron microscopes and electron beam exposure devices, and also electronic devices using such cathode and source. A diamond electron emission cathode according to the present invention has single crystal diamond in at least part thereof, the diamond electron emission cathode having a columnar shape formed by a sharpened acute section and a heating section, being provided with one electron emitting portion in the sharpened acute section, and being constituted of at least two types of semiconductors that differ in electric properties.
    Type: Grant
    Filed: June 19, 2006
    Date of Patent: June 15, 2010
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Akihiko Ueda, Yoshiyuki Yamamoto, Yoshiki Nishibayashi, Takahiro Imai
  • Publication number: 20100143748
    Abstract: Methods of growing and manufacturing aluminum nitride crystal, and aluminum nitride crystal produced by the methods. Preventing sublimation of the starting substrate allows aluminum nitride crystal of excellent crystallinity to be grown at improved growth rates. The aluminum nitride crystal growth method includes the following steps. Initially, a laminar baseplate is prepared, furnished with a starting substrate having a major surface and a back side, a first layer formed on the back side, and a second layer formed on the first layer. Aluminum nitride crystal is then grown onto the major surface of the starting substrate by vapor deposition. The first layer is made of a substance that at the temperatures at which the aluminum nitride crystal is grown is less liable to sublimate than the starting substrate. The second layer is made of a substance whose thermal conductivity is higher than that of the first layer.
    Type: Application
    Filed: December 19, 2008
    Publication date: June 10, 2010
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Keisuke Tanizaki, Naho Mizuhara, Michimasa Miyanaga, Hideaki Nakahata, Yoshiyuki Yamamoto
  • Publication number: 20100111812
    Abstract: The object of the present invention is to obtain a high quality single crystalline diamond that has less distortion and large area suitable for semiconductor device substrates or an optical component material. The present invention is a single crystalline diamond produced by chemical vapor deposition, wherein, when a linear polarized light which is composed of two linear polarized lights perpendicular to each other is introduced into one main face of the single crystalline diamond, a maximum value of a retardation between the two linear polarized lights perpendicular to each other which come out from an opposite main face is not more than 50 ?m at maximum per a thickness of 100 ?m across an entire of the single crystalline diamond, and also a method for producing the diamond.
    Type: Application
    Filed: January 8, 2010
    Publication date: May 6, 2010
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Kiichi MEGURO, Yoshiyuki Yamamoto, Takahiro Imai
  • Patent number: 7699383
    Abstract: A pedestrian protection apparatus for a vehicle, including a plate member which is disposed at a front face of the vehicle, which includes front and rear portions, and which is fixed at the rear portion to the vehicle with at least a leading end part of the front portion protruded from the front face of the vehicle, the apparatus being arranged to sweep a leg portion of a pedestrian, thereby protecting the leg portion, wherein the leading end part includes at least one horizontally extending portion and a plurality of vertically extending portions each having an anterior surface substantially orthogonal to a horizontal plane, the horizontally extending portion and the vertically extending portions being formed integrally with the leading end part so as to be alternately disposed in the frontward and backward direction of the vehicle and extend in a staircase-like form.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: April 20, 2010
    Assignee: Kojima Press Industry Co., Ltd.
    Inventors: Masanobu Fukukawa, Yoshihiro Ogura, Kaoru Ito, Kuniaki Hasegawa, Hiroki Kurokawa, Yoshiyuki Yamamoto, Naoki Goda
  • Patent number: 7667977
    Abstract: The mounting board has a capacitor-forming sheet made from a valve metal, first and second board-forming structures, first and second electrodes, an extractor electrode, and a conductive polymer. The capacitor-forming sheet has an inner layer and a rough oxide film on at least one face of the inner layer. The first board-forming structure is provided on a face of the capacitor-forming sheet, and the second board-forming structure is provided on another face thereof on a side opposite to the first one. The first and second electrodes are isolated to each other and provided on a surface of at least one of the first and second board-forming structures. The extractor electrode and conductive polymer are provided inside at least one of the first and second board-forming structures. The extractor electrode electrically-connects the first electrode with the inner layer. The conductive polymer electrically-connects the second electrode with the rough oxide film.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: February 23, 2010
    Assignee: Panasonic Corporation
    Inventors: Yasuhiro Sugaya, Toshiyuki Asahi, Katsumasa Miki, Yoshiyuki Yamamoto, Hiroyuki Ishitomi, Tsuyoshi Himori
  • Publication number: 20100033806
    Abstract: Affords a wavelength converter manufacturing method and a wavelength converter whereby the transmissivity can be improved. A method of manufacturing a wavelength converter (10a) is provided with the following steps. At first, crystal is grown. Then a first crystal (11) and a second crystal (12) are formed by sectioning the crystal into two or more in such a way that the domains are the reverse of each other. The first and second crystals (11) and (12) are then interlocked in such a way that a domain inversion structure in which the polar directions of the first and second crystals (11) and (12) periodically reverse along an optical waveguide (13) is formed, and the domain inversion structure satisfies quasi-phase-matching conditions for an incoming beam (101).
    Type: Application
    Filed: July 28, 2009
    Publication date: February 11, 2010
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Issei Satoh, Michimasa Miyanaga, Yoshiyuki Yamamoto, Hideaki Nakahata
  • Patent number: 7655208
    Abstract: The object of the present invention is to obtain a high quality single crystalline diamond that has less distortion and large area suitable for semiconductor device substrates or an optical component material. The present invention is a single crystalline diamond produced by chemical vapor deposition, wherein, when a linear polarized light which is composed of two linear polarized lights perpendicular to each other is introduced into one main face of the single crystalline diamond, a maximum value of a retardation between the two linear polarized lights perpendicular to each other which come out from an opposite main face is not more than 50 ?m at maximum per a thickness of 100 ?m across an entire of the single crystalline diamond, and also a method for producing the diamond.
    Type: Grant
    Filed: April 12, 2006
    Date of Patent: February 2, 2010
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kiichi Meguro, Yoshiyuki Yamamoto, Takahiro Imai
  • Patent number: 7615203
    Abstract: A single crystal diamond grown by vapor phase synthesis, wherein when one main surface is irradiated with a linearly polarized light considered to be the synthesis of two mutually perpendicular linearly polarized light beams, the phase difference between the two mutually perpendicular linearly polarized light beams exiting another main surface on the opposite side is, at a maximum, not more than 50 nm per 100 ?m of crystal thickness over the entire crystal. This single crystal diamond is of a large size and high quality unattainable up to now, and has characteristics that are extremely desirable in semiconductor device substrates and are applied to optical components of which low strain is required.
    Type: Grant
    Filed: May 26, 2005
    Date of Patent: November 10, 2009
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Yoshiyuki Yamamoto, Kiichi Meguro, Takahiro Imai
  • Publication number: 20090169814
    Abstract: A method for growing a low-resistance phosphorus-doped epitaxial thin film having a specific resistance of 300 ?cm or less at 300 K on a principal surface of a {111} monocrystal substrate under conditions in which the phosphorus atom/carbon atom ratio is 3% or higher, includes the principal surface having an off-angle of 0.50° or greater. The diamond monocrystal having a low-resistance phosphorus-doped diamond epitaxial thin film is such that the thin-film surface has an off-angle of 0.50° or greater with respect to the {111} plane, and the specific resistance of the low-resistance phosphorus-doped diamond epitaxial thin film is 300 ?cm or less at 300 K.
    Type: Application
    Filed: December 26, 2007
    Publication date: July 2, 2009
    Inventors: Akihiko Ueda, Kiichi Meguro, Yoshiyuki Yamamoto, Yoshiki Nishibayashi, Takahiro Imai
  • Publication number: 20090160307
    Abstract: A diamond electron source in which a single sharpened tip is formed at one end of a pillar-shaped diamond monocrystal of a size for which resist application is difficult in a microfabrication process, as an electron emission point used in an electron microscope or other electron beam device, and a method for manufacturing the diamond electron source. One end of a pillar-shaped diamond monocrystal 10 is ground to form a smooth flat surface 11, and a ceramic layer 12 is formed on the smooth flat surface 11. A thin-film layer 14 having a prescribed shape is deposited on the ceramic layer 12 using a focused ion beam device, after which the ceramic layer 12 is patterned by etching using the thin-film layer 14 as a mask. A single sharpened tip is formed at one end of the pillar-shaped diamond monocrystal 10 by dry etching using the resultant ceramic mask.
    Type: Application
    Filed: September 18, 2007
    Publication date: June 25, 2009
    Inventors: Akihiko Ueda, Yoshiyuki Yamamoto, Yoshiki Nishibayashi, Takahiro Imai
  • Publication number: 20090160308
    Abstract: An object is to provide an electron emitting cathode achieving high luminance, low energy dispersion, and long life. It is therefore an object to provide a diamond electron emitting cathode graspable on a sufficiently stable basis, sharpened at the tip, and improved in electric field intensity. A diamond electron emitting cathode 110 according to the present invention is partitioned into at least three regions, i.e., a front end region 203 intended for electron emission at a tip of columnar shape, a rear end region 201 intended for grasping opposite in the longitudinal direction, and a thinned intermediate region 202, a cross-sectional area of the rear end region is not less than 0.2 mm2, the tip of the front end region is sharpened, and a maximum cross-sectional area of the thinned intermediate region is not more than 0.1 mm2.
    Type: Application
    Filed: June 27, 2007
    Publication date: June 25, 2009
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Yoshiyuki Yamamoto, Akihiko Ueda, Yoshiki Nishibayashi, Takahiro Imai
  • Publication number: 20090142249
    Abstract: A method for manufacturing a diamond single crystal substrate, in which a single crystal is grown from a diamond single crystal serving as a seed substrate by vapor phase synthesis, said method comprising: preparing a diamond single crystal seed substrate which has a main surface whose planar orientation falls within an inclination range of not more than 8 degrees relative to a {100} plane or a {111} plane, as a seed substrate; forming a plurality of planes of different orientation which are inclined in the outer peripheral direction of the main surface relative to the main surface on one side of this seed substrate, by machining; and then growing a diamond single crystal by vapor phase synthesis.
    Type: Application
    Filed: February 3, 2009
    Publication date: June 4, 2009
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Kiichi MEGURO, Yoshiyuki YAMAMOTO, Takahiro IMAI
  • Publication number: 20090120366
    Abstract: The present invention provides a microwave plasma CVD device that can satisfactorily perform plasma position control under a condition capable of fabricating a large-area high-quality diamond thin film or the like.
    Type: Application
    Filed: January 29, 2007
    Publication date: May 14, 2009
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Akihiko Ueda, Kiichi Meguro, Yoshiyuki Yamamoto, Yoshiki Nishibayashi, Takahiro Imai
  • Patent number: 7524372
    Abstract: A method for manufacturing a diamond single crystal substrate, in which a single crystal is grown from a diamond single crystal serving as a seed substrate by vapor phase synthesis, said method comprising: preparing a diamond single crystal seed substrate which has a main surface whose planar orientation falls within an inclination range of not more than 8 degrees relative to a {100} plane or a {111} plane, as a seed substrate; forming a plurality of planes of different orientation which are inclined in the outer peripheral direction of the main surface relative to the main surface on one side of this seed substrate, by machining; and then growing a diamond single crystal by vapor phase synthesis.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: April 28, 2009
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kiichi Meguro, Yoshiyuki Yamamoto, Takahiro Imai