Patents by Inventor Yu-Chin Lai

Yu-Chin Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10707081
    Abstract: A method of manufacturing a semiconductor device including operations of forming a first hard mask over an underlying layer on a substrate by a photolithographic and etching method, forming a sidewall spacer pattern having a first sidewall portion and a second sidewall portion on opposing sides of the first hard mask, etching the first sidewall portion, etching the first hard mask and leaving the second sidewall portion bridging a gap of the etched first hard mask, and processing the underlying layer using the second hard mask.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: July 7, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang, Chien Wen Lai, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Li-Te Lin, Pinyen Lin, Ru-Gun Liu, Chin-Hsiang Lin
  • Publication number: 20200197059
    Abstract: An osteo-implant including two end portions, at least one middle structure, and a plurality of connection portions is provided. The middle structure is disposed between the two end portions and includes a plurality of middle portions. The middle portions are connected to the two end portions through the connection portions. When the two end portions are moved relatively along an axial direction of the osteo-implant, the two end portions drive the middle portions to push with each other and have displacements along a radial direction of the osteo-implant through the connection portions, such that an outer diameter of the osteo-implant is increased by the middle portions.
    Type: Application
    Filed: December 20, 2018
    Publication date: June 25, 2020
    Applicant: Industrial Technology Research Institute
    Inventors: Ming-Jun Li, Hong-Jen Lai, Pei-I Tsai, Fang-Hei Tsau, Wei-Chin Huang, Yu-Tsung Chiu
  • Publication number: 20200172647
    Abstract: A silicone hydrogel composition includes a first hydrophilic monomer, a siloxane compound, a first crosslinking monomer, a second hydrophilic monomer, and a second crosslinking monomer. The first hydrophilic monomer and the siloxane compound have an acrylate group or an acrylamide group and may also have a methacrylate group or a methacrylamide group. The first crosslinking monomer has a plurality of acrylate groups or acrylamide groups and may also have methacrylate groups or methacrylamide groups. The second hydrophilic monomer has a non-conjugated vinyl group. The second crosslinking monomer has a plurality of non-conjugated vinyl groups. A sum of the weight of the second hydrophilic monomer and the weight of the second crosslinking monomer is 40 to 100 parts by weight, relative to 100 parts by weight of the sum of the weight of the first hydrophilic monomer, the weight of the siloxane compound, and the weight of the first crosslinking monomer.
    Type: Application
    Filed: June 27, 2019
    Publication date: June 4, 2020
    Inventors: Yu-Chin LAI, Ting-Chun KUAN, Di-Yao HSU, Fang-Yu TSAI, Min-Tzung YEH
  • Publication number: 20200058595
    Abstract: A method for forming a semiconductor device structure is provided. The method includes forming a first overlay grating over a substrate. The method includes forming a layer over the first overlay grating. The method includes forming a second overlay grating over the layer. The second overlay grating has a third strip portion and a fourth strip portion, the third strip portion and the fourth strip portion are elongated in the first elongated axis and are spaced apart from each other, there is a second distance between a third sidewall of the third strip portion and a fourth sidewall of the fourth strip portion, the third sidewall faces away from the fourth strip portion, the fourth sidewall faces the third strip portion, the first distance is substantially equal to the second distance, and the first trench extends across the third strip portion and the fourth strip portion.
    Type: Application
    Filed: October 24, 2019
    Publication date: February 20, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Long-Yi CHEN, Jia-Hong CHU, Chi-Wen LAI, Chia-Ching LIANG, Kai-Hsiung CHEN, Yu-Ching WANG, Po-Chung CHENG, Hsin-Chin LIN, Meng-Wei CHEN, Kuei-Shun CHEN
  • Patent number: 10461037
    Abstract: A method for forming a semiconductor device structure is provided. The method includes forming a first overlay grating over a substrate. The first overlay grating has a first strip portion and a second strip portion. The method includes forming a first layer over the first overlay grating. The first layer has a first trench elongated in a second elongated axis, the second elongated axis is substantially perpendicular to the first elongated axis, and the first trench extends across the first strip portion and the second strip portion. The method includes forming a second overlay grating over the first layer. The second overlay grating has a third strip portion and a fourth strip portion. The third strip portion and the fourth strip portion are elongated in the first elongated axis and are spaced apart from each other.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: October 29, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Long-Yi Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Kai-Hsiung Chen, Yu-Ching Wang, Po-Chung Cheng, Hsin-Chin Lin, Meng-Wei Chen, Kuei-Shun Chen
  • Publication number: 20190267298
    Abstract: A semiconductor package structure includes a substrate, a semiconductor die, a lid and a cap. The semiconductor die is disposed on the substrate. The lid is disposed on the substrate. The cap is disposed on the lid. The substrate, the lid and the cap define a cavity in which the semiconductor die is disposed, and a pressure in the cavity is greater than an atmospheric pressure outside the cavity.
    Type: Application
    Filed: February 21, 2019
    Publication date: August 29, 2019
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Hsin Lin WU, Yu-Hsuan TSAI, Chang Chin TSAI, Lu-Ming LAI, Ching-Han HUANG
  • Patent number: 10314847
    Abstract: The present invention discloses scalarane sesterterpenoids represented by formula (I) and meroditerpenoid represented by formula (II), which are extracted from Carteriospongia sp. sponge: where R1 is —CH3 or —C2H5. The compounds of formula (I) can be used to be an anticancer, act as an inhibitor targeting to topoisomerase II and hsp90 and a pharmaceutical composition for anticancer.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: June 11, 2019
    Assignee: National Dong Hwa University
    Inventors: Mei-Chin Lu, Ping-Jyun Sung, Jui-Hsin Su, Kuei-Hung Lai, Yi-Chang Liu, Ying-Chi Du, Yu-Ming Hsu, Ming-Kai Weng, Fu-Wen Kuo
  • Publication number: 20190148147
    Abstract: A method of manufacturing a semiconductor device including operations of forming a first hard mask over an underlying layer on a substrate by a photolithographic and etching method, forming a sidewall spacer pattern having a first sidewall portion and a second sidewall portion on opposing sides of the first hard mask, etching the first sidewall portion, etching the first hard mask and leaving the second sidewall portion bridging a gap of the etched first hard mask, and processing the underlying layer using the second hard mask.
    Type: Application
    Filed: November 1, 2018
    Publication date: May 16, 2019
    Inventors: Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang, Chien Wen Lai, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Li-Te Lin, Pinyen Lin, Ru-Gun Liu, Chin-Hsiang Lin
  • Publication number: 20190009482
    Abstract: A surface-modified contact lens, having a surface contact angle hysteresis of less than 15°, includes a lens body and a first surface modification layer disposed on a surface of the lens body. The first surface modification layer comprises a first reactive hydrophilic polymer. The surface of the lens body has a first functional group or a second functional group, and the first reactive hydrophilic polymer has a third functional group or a fourth functional group. A first covalent cross-link bond is formed between the surface of the lens body and the first surface modification layer. The first covalent cross-link bond is formed by reacting the first functional group or the second functional group of the surface of the lens body with the third functional group or the fourth functional group of the first reactive hydrophilic polymer.
    Type: Application
    Filed: February 14, 2018
    Publication date: January 10, 2019
    Inventors: Yu-Chin LAI, Ming-Nan LIN, Min-Tzung YEH, Ya-Hsuan LIAO
  • Publication number: 20180340036
    Abstract: The present invention provides a water-soluble silicone macromer. The water-soluble silicone macromer has a general formula: E-(M1)x-(M2)y, wherein M1 is a repeating unit which is derived from a silicone containing monomer, M2 is a repeating unit which is derived from a first hydrophilic monomer, and E is an ethylenically unsaturated group. The amount of M1 is in a range of 30-60 wt % based on the total weight of the water-soluble silicone macromer, and the amount of M2 is in a range of 40-70 wt % based on the total weight of the water-soluble silicone macromer. A silicone hydrogel composition containing the water-soluble silicone macromer and a silicone hydrogel lens made of the silicone hydrogel composition are also provided herein.
    Type: Application
    Filed: February 5, 2018
    Publication date: November 29, 2018
    Inventors: Yu-Chin LAI, Ting-Chun KUAN, Hsiang-Ho KUNG, Min-Tzung YEH, Ching-Wen YANG, Tsung-Kao HSU
  • Patent number: 9925293
    Abstract: A solution for treating contact lens is provided. The solution includes about 0.01-1.0 parts by weight (pbw) of a polymer having phosphorylcholine groups, about 0.01-1 pbw of an inorganic salt, and about 100 pbw of water. The polymer has a number-average molecular weight of about 4,000 to about 1,000,000 daltons and has a structure of formula (I): wherein, in formula (I), m is a positive integer, n is zero or a positive integer, and R is C2-C12 alkyl group or C2-C12 hydroxyalkyl group. When n is a positive integer, m/n is greater than 1.
    Type: Grant
    Filed: September 5, 2016
    Date of Patent: March 27, 2018
    Assignee: PEGAVISION CORPORATION
    Inventors: Han-Yi Chang, Ya-Hsuan Liao, Shu-Chen Lu, Ya-Hui Chang, Yu-Chin Lai
  • Publication number: 20170368221
    Abstract: A solution for treating contact lens is provided. The solution includes about 0.01-1.0 parts by weight (pbw) of a polymer having phosphorylcholine groups, about 0.01-1 pbw of an inorganic salt, and about 100 pbw of water. The polymer has a number-average molecular weight of about 4,000 to about 1,000,000 daltons and has a structure of formula (I): wherein, in formula (I), m is a positive integer, n is zero or a positive integer, and R is C2-C12 alkyl group or C2-C12 hydroxyalkyl group. When n is a positive integer, m/n is greater than 1.
    Type: Application
    Filed: September 5, 2016
    Publication date: December 28, 2017
    Inventors: Han-Yi CHANG, Ya-Hsuan LIAO, Shu-Chen LU, Ya-Hui CHANG, Yu-Chin LAI
  • Publication number: 20170368222
    Abstract: A solution for treating a contact lens and a contact lens packaging system are provided. The solution includes about 0.01 to about 1.0 parts by weight (pbw) of a polymer having phosphorylcholine groups, about 0.005 to about 0.05 pbw of a hydrophilic molecule, about 0.01 to about 1.0 pbw of an inorganic salt, and about 100 pbw of water. A number-average molecular weight of the polymer is about 4,000 to about 1,000,000 daltons. The polymer has a structure of formula (I): wherein, in formula (I), m is a positive integer, n is zero or a positive integer, and R is C2-C12 alkyl group, or C2-C12 hydroxyalkyl group. When n is a positive integer, m/n is greater than 1. Moreover, a number-average molecular weight of the hydrophilic molecule is about 10,000 to about 5,000,000 daltons. The hydrophilic molecule is hyaluronic acid (HA) or hyaluronate salt.
    Type: Application
    Filed: November 4, 2016
    Publication date: December 28, 2017
    Inventors: Yu-Chin LAI, Min-Tzong YEH, Han-Yi CHANG, Ya-Hui CHANG
  • Patent number: 9482788
    Abstract: The present disclosure provides a UV-blocking silicone hydrogel composition including a hydrophilic silicone macromer, a UV-blocking monomer, a first hydrophilic monomer, a crosslinker and a polymerization initiator. The hydrophilic silicone macromer has a general formula: V-L-S-(L?-V?)x, wherein V and V? are independently ethylenically-based polymerizable groups, L and L? are independently a covalent bond or a linkage group, S is a siloxane group having a chemical structure such as and x is 0 or 1. A silicone contact lens containing the UV-blocking silicone hydrogel composition is also provided herein.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: November 1, 2016
    Assignee: PEGAVISION CORPORATION
    Inventors: Yu-Chin Lai, Min-Tzung Yeh, Han-Yi Chang, Heng-Yi Li, Hung-Ju Chang, Che-Cheng Wu
  • Publication number: 20160161638
    Abstract: The present disclosure provides a UV-blocking silicone hydrogel composition including a hydrophilic silicone macromer, a UV-blocking monomer, a first hydrophilic monomer, a crosslinker and a polymerization initiator. The hydrophilic silicone macromer has a general formula: V-L-S-(L?-V?)x, wherein V and V? are independently ethylenically-based polymerizable groups, L and L? are independently a covalent bond or a linkage group, S is a siloxane group having a chemical structure such as and x is 0 or 1. A silicone contact lens containing the UV-blocking silicone hydrogel composition is also provided herein.
    Type: Application
    Filed: December 5, 2014
    Publication date: June 9, 2016
    Inventors: Yu-Chin LAI, Min-Tzung YEH, Han-Yi CHANG, Heng-Yi LI, Hung-Ju CHANG, Che-Cheng WU
  • Patent number: 9133221
    Abstract: A method for manufacturing a hydrophilic silicone macromer is provided. A hydrosilylation between a Si—H bond of a polysiloxane and a C?C bond of a hydrophilic mononmer is performed by using a rhodium-containing catalyst to form the polysiloxane having a hydrophilic side chain having an amide group or a phosphoryl choline group. After performing an end-capping reaction, the hydrophilic silicone macromer is formed.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: September 15, 2015
    Assignee: PEGAVISION CORPORATION
    Inventors: Wei-Jia Ting, Heng-Yi Li, Yu-Chin Lai, Han-Yi Chang
  • Patent number: 9056879
    Abstract: A method for manufacturing a hydrophilic silicone prepolymer is disclosed. The method comprises ring-opening polymerization (ROP) of cyclosiloxanes, hydrosilylation of polysiloxanes, copolymerization, and end-capping reaction. After the above processes, the hydrophilic silicone prepolymer can be obtained.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: June 16, 2015
    Assignee: PEGAVISION CORPORATION
    Inventors: Heng-Yi Li, Wei-Jia Ting, Yu-Chin Lai, Han-Yi Chang
  • Patent number: 9046641
    Abstract: A silicone hydrogel composition is disclosed. The composition includes at least one silicone macromer, a hydroxy-functionalized silicone-containing monomer, a first hydrophibic monomer and at least one crosslinker, in which the first hydrophibic monomer is N-vinyl pyrrolidone. The silicone macromer and the hydroxy-functionalized silicone-containing monomer are mutually soluble with N-vinylpyrrolidone. Silicone hydrogel contact lenses prepared from the silicone hydrogel composition are also disclosed.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: June 2, 2015
    Assignee: PEGAVISION CORPORATION
    Inventors: Yu-Chin Lai, Min-Tzung Yeh, Heng-Yi Li, Wei-Jia Ting
  • Publication number: 20140364624
    Abstract: A method for manufacturing a hydrophilic silicone macromer is provided. A hydrosilylation between a Si—H bond of a polysiloxane and a C?C bond of a hydrophilic mononmer is performed by using a rhodium-containing catalyst to form the polysiloxane having a hydrophilic side chain having an amide group or a phosphoryl choline group. After performing an end-capping reaction, the hydrophilic silicone macromer is formed.
    Type: Application
    Filed: August 26, 2014
    Publication date: December 11, 2014
    Inventors: Wei-Jia Ting, Heng-Yi Li, Yu-Chin Lai, Han-Yi Chang
  • Patent number: 8865925
    Abstract: A method for manufacturing a hydrophilic silicone macromer is provided. A hydrosilylation between a Si—H bond of a polysiloxane and a C?C bond of a hydrophilic monomer is performed by using a rhodium-containing catalyst to form the polysiloxane having a hydrophilic side chain having an amide group or a phosphoryl choline group. After performing an end-capping reaction, the hydrophilic silicone macromer is formed.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: October 21, 2014
    Assignee: Pegavision Corporation
    Inventors: Wei-Jia Ting, Heng-Yi Li, Yu-Chin Lai, Han-Yi Chang