Abstract: A method of cleaning wafer-cleaning brushes includes passing a wafer having a first polished main side and an opposing unpolished backside between a pair of substantially cylindrical shaped wafer-cleaning brushes are rotated about an axial direction of the brushes while passing the wafer between the pair of wafer-cleaning brushes. A cleaning solution is applied to the brushes while passing the wafer between the pair of wafer-cleaning brushes. While passing between the pair of brushes, the first polished main side of the wafer faces a first direction, the first direction is an opposite direction to which a polished side of a production wafer faces during a subsequent polished wafer cleaning operation. The substantially cylindrical shaped wafer-cleaning brushes include a plurality of protrusions on an external surface of the brushes, and the brushes contact the wafer at least a portion of time the wafer is passing between the pair of brushes.

Abstract: A method of cleaning wafer-cleaning brushes includes passing a wafer having a first polished main side and an opposing unpolished backside between a pair of substantially cylindrical shaped wafer-cleaning brushes are rotated about an axial direction of the brushes while passing the wafer between the pair of wafer-cleaning brushes. A cleaning solution is applied to the brushes while passing the wafer between the pair of wafer-cleaning brushes. While passing between the pair of brushes, the first polished main side of the wafer faces a first direction, the first direction is an opposite direction to which a polished side of a production wafer faces during a subsequent polished wafer cleaning operation. The substantially cylindrical shaped wafer-cleaning brushes include a plurality of protrusions on an external surface of the brushes, and the brushes contact the wafer at least a portion of time the wafer is passing between the pair of brushes.

Abstract: A multifunctional wheelchair contains: a body, a support plate, a lifting seat, and a shampoo basin. The body includes a retractable mounting, a chair back, at least one drive device, and two frames. The two frames have two main wheels, the two frames have two guide wheels, and the two armrests are arranged on a second drive device. A respective armrest has an abutting portion, and the retractable mounting have two racks. The support plate is detachably engaged on the retractable mounting of the body. The lifting seat is removably engaged on the retractable mounting of the body, and the lifting seat includes a saddle on a third drive device which is configured to drive the saddle to lift or descend adjustably. The shampoo basin is detachably connected on the chair back and included a washing chamber.

Abstract: A back clapping machine with chest percussion function includes a casing, a movement mechanism, a clap mechanism, and a buffer unit. The casing includes an outer cover, a rear cover, and a housing space therein, in which the movement mechanism is disposed. The clap mechanism is in the housing space and connected with the front lateral side of the movement mechanism. The buffer unit is in the housing space and arranged to elastically abut against the outer cover and the rear cover therebetween. Thus, the present invention automatically carries out back clapping operation and detects the distance for back clapping, also provides a shock buffering effect, thus achieving a back clapping chest percussion operation through a hand alike structure and preventing pressure ulcer.

Abstract: A method includes forming a trench in a low-K dielectric layer, where the trench exposes an underlying contact area of a substrate. A first tantalum nitride (TaN) layer is conformally deposited within the trench, where the first TaN layer is deposited using atomic layer deposition (ALD) or chemical vapor deposition (CVD). A tantalum (Ta) layer is deposited on the first TaN layer conformally within the trench, where the Ta layer is deposited using physical vapor deposition (PVD). An electroplating process is performed to deposit a conductive layer over the Ta layer. A via is formed over the conductive layer, where forming the via includes depositing a second TaN layer within the via and in contact with the conductive layer.

Abstract: A back clapping machine with chest percussion function includes a casing, a movement mechanism, a clap mechanism, and a buffer unit. The casing includes an outer cover, a rear cover, and a housing space therein, in which the movement mechanism is disposed. The clap mechanism is in the housing space and connected with the front lateral side of the movement mechanism. The buffer unit is in the housing space and arranged to elastically abut against the outer cover and the rear cover therebetween. Thus, the present invention automatically carries out back clapping operation and detects the distance for back clapping, also provides a shock buffering effect, thus achieving a back clapping chest percussion operation through a hand alike structure and preventing pressure ulcer.

Abstract: A smart home includes Internet of things (IOT) devices that are paired with an IOT gateway. A backend system is in communication with the IOT gateway to receive IOT operating data of the IOT devices. The backend system generates a machine learning model for an IOT device. The machine learning model is consulted with IOT operating data of the IOT device to detect anomalous operating behavior of the IOT device. The machine learning model is updated as more and newer IOT operating data of the IOT device are received by the backend system.

Abstract: A multifunctional wheelchair contains: a body, a support plate, a lifting seat, and a shampoo basin. The body includes a retractable mounting, a chair back, at least one drive device, and two frames. The two frames have two main wheels, the two frames have two guide wheels, and the two armrests are arranged on a second drive device. A respective armrest has an abutting portion, and the retractable mounting have two racks. The support plate is detachably engaged on the retractable mounting of the body. The lifting seat is removably engaged on the retractable mounting of the body, and the lifting seat includes a saddle on a third drive device which is configured to drive the saddle to lift or descend adjustably. The shampoo basin is detachably connected on the chair back and included a washing chamber.

Abstract: An image processing apparatus is applied to a display and includes a sampling unit, a comparing unit, a determining unit and an operating unit. The sampling unit is configured to receive a pulse-width modulation (PWM) signal and sample the PWM signal to output a current image. The comparing unit is coupled to the sampling unit and configured to compare the current image with a previous image to generate a comparison result, wherein the previous image is prior to the current image. The determining unit is coupled to the comparing unit and configured to determine whether the current image is the same with the previous image according to the comparison result and a threshold value. If a determination result of the determining unit is YES, the operating unit stops its operation.

Abstract: A fingerprint authentication method and an electronic device are provided. The fingerprint authentication method includes: performing a fingerprint enrollment operation through a fingerprint sensor and storing enrolled fingerprint information to a storage circuit; sensing to-be-authenticated fingerprint information through the fingerprint sensor in a fingerprint authentication operation; and performing a default function corresponding to an authentication success of the fingerprint authentication operation and updating the enrolled fingerprint information according to authenticated fingerprint information if a similarity between the to-be-authenticated fingerprint information and the enrolled fingerprint information conforms to a default condition.

Abstract: A method includes applying a first amount of heat to a vapor region of a precursor canister, measuring an indication of saturated vapor pressure within the vapor region during the applying the first amount of heat, and applying a second amount of heat to the vapor region of the precursor canister, the second amount of heat being adjusted from the first amount of heat based on the indication of saturated vapor pressure.

Abstract: Methods for use in electrochemical plating processes are described herein. An exemplary method includes determining a wafer electrical property associated with a wafer, wherein the wafer electrical property affects the wafer during an electrochemical plating (ECP) process; adjusting a process parameter to be applied to the wafer during the ECP process based on the determined wafer electrical property, wherein the process parameter specifies at least one of a current or a voltage; and applying the adjusted process parameter to the wafer undergoing the ECP process. In some implementations, the process parameter is adjusted, such that a peak entry current of the ECP process substantially matches a plating current of the ECP process induced following the peak entry current.

Abstract: An image processing apparatus and an image processing method applied to a display are disclosed. The image processing apparatus includes a sampling unit, a comparing unit, a determining unit and an operating unit. The sampling unit is configured to receive a pulse-width modulation (PWM) signal and sample the PWM signal to output a current image. The comparing unit is coupled to the sampling unit and configured to compare the current image with a previous image to generate a comparison result, wherein the previous image is prior to the current image. The determining unit is coupled to the comparing unit and configured to determine whether the current image is the same with the previous image according to the comparison result and a threshold value. If a determination result of the determining unit is YES, the operating unit stops its operation.

Abstract: An optical lens is provided. The optical lens includes, in order from an object side to an image-forming side, a first lens having negative refractive power, a second lens having negative refractive power, a third lens having refractive power and having an Abbe number Vd3, a cemented lens having refractive power, and a fourth lens having refractive power and having an Abbe number Vd4, wherein 15?Vd3 and/or Vd3?30, and 60?Vd4 and/or Vd4?85.

Abstract: A memory system with dynamic auto-repairing function and an operation method thereof is described herein. The memory system includes a memory and an automatic detection and repairing circuit. The automatic detection and repairing circuit is coupled to the memory. The automatic detection and repairing circuit includes a self-test unit and a repairing unit. The self-test unit is coupled to the memory. The repairing unit is coupled to the memory and the self-test unit respectively. When the memory system is operated in the initial state, the self-test unit instantly detects the defects in the memory and the repairing unit instantly repairs the defects in the memory. Then, the memory system enters into a working state from the initial state.

Abstract: A method of cleaning wafer-cleaning brushes includes passing a wafer having a first polished main side and an opposing unpolished backside between a pair of substantially cylindrical shaped wafer-cleaning brushes are rotated about an axial direction of the brushes while passing the wafer between the pair of wafer-cleaning brushes. A cleaning solution is applied to the brushes while passing the wafer between the pair of wafer-cleaning brushes. While passing between the pair of brushes, the first polished main side of the wafer faces a first direction, the first direction is an opposite direction to which a polished side of a production wafer faces during a subsequent polished wafer cleaning operation. The substantially cylindrical shaped wafer-cleaning brushes include a plurality of protrusions on an external surface of the brushes, and the brushes contact the wafer at least a portion of time the wafer is passing between the pair of brushes.

Abstract: A method includes forming a trench in a low-K dielectric layer, where the trench exposes an underlying contact area of a substrate. A first tantalum nitride (TaN) layer is conformally deposited within the trench, where the first TaN layer is deposited using atomic layer deposition (ALD) or chemical vapor deposition (CVD). A tantalum (Ta) layer is deposited on the first TaN layer conformally within the trench, where the Ta layer is deposited using physical vapor deposition (PVD). An electroplating process is performed to deposit a conductive layer over the Ta layer. A via is formed over the conductive layer, where forming the via includes depositing a second TaN layer within the via and in contact with the conductive layer.

Abstract: A fingerprint authentication method and an electronic device are provided. The fingerprint authentication method includes: performing a fingerprint enrollment operation through a fingerprint sensor and storing enrolled fingerprint information to a storage circuit; sensing to-be-authenticated fingerprint information through the fingerprint sensor in a fingerprint authentication operation; and performing a default function corresponding to an authentication success of the fingerprint authentication operation and updating the enrolled fingerprint information according to authenticated fingerprint information if a similarity between the to-be-authenticated fingerprint information and the enrolled fingerprint information conforms to a default condition.

Abstract: An optical lens comprises in order from an object side to an image-forming side, a first lens group having positive refractive power and a second lens group having negative refractive power. The second lens group comprises a third lens and a fourth lens. The optical lens satisfies at least one of the following conditions: a thickness of the first lens group is less than a first distance between the first lens group and the second lens group, and |?7/D4|?2. The second distance is between a projected position which an effective diameter of an object-side surface of the fourth lens projected on an optical axis and a first intersection point which the object-side surface of the fourth lens and the optical axis is ?7, and a thickness of the fourth lens is D4.

Abstract: A device comprises a semiconductor substrate; a dielectric layer deposited over the semiconductor substrate, the dielectric layer including a trench; and a structure in the trench. The structure includes a chemical vapor deposition (CVD) TaN layer formed on a side wall of the trench; a physical vapor deposition (PVD) Ta layer formed over the CVD TaN layer; and a metal-containing layer formed over the PVD Ta layer.