Abstract: Methods and apparatus for electrochemical analysis of water include acid cleaning a quartz crystal microbalance (QCM), stabilizing a QCM in analyte solution, and analyzing the solution by chronoamperometry and measuring a frequency shift of the QCM. The method may further include cleaning the QCM in an acid solution prior to stabilizing the QCM in analyte solution. The apparatus may provide at least semi-automated electrochemical analysis of water including determining a concentration of an analyte in a water sample, and communicating the concentration of the analyte over a network. The analyte may be manganese.

Abstract: A computer-implemented method, system, and computer program product for adapting scripts from a source platform to be utilized in a target platform when porting. Traces of system calls from the commands in the source and target platforms are analyzed to identify building blocks. A tree structure for each command of the source and target platforms is constructed with one or more building blocks from the identified building blocks. Commands of the target platform with a functionality within a threshold degree of similarity to the commands of the source platform are identified by analyzing the building blocks of the commands' tree structures. Alternative commands for the commands of the source platform, such as those commands that are not supported by the target platform, may be generated using such identified commands. The script from the source platform may then be adapted to be utilized in the target platform using such alternative commands.

Abstract: Techniques according to the present disclosure may include receiving, at a computer, a command for performing an action on a first image layer of a first container repository. A second container repository is determined which has a dependency on the first container repository, based on a dependency graph storing dependencies of a plurality of container repositories. The action is performed on the first image layer of the first container repository and a corresponding action on a second image layer of the second container repository based on the command.

Abstract: An example operation may include one or more of storing access requirements of a containerized environment, identifying a plurality of types of users of the containerized environment based on the access requirements, identifying a plurality of different restriction priorities for the plurality of types of users within the containerized environment, respectively, based on the access requirements, dynamically generating an access policy that satisfies the plurality of different restriction priorities for the plurality of types of users within the containerized environment, and transforming the access policy into a plugin.

Abstract: Methods and apparatus for analyzing water use a plurality of working electrodes and at least one counter electrode adapted to be in contact with the water, and a source of electrical potential difference that simultaneously applies to each of the plurality of working electrodes a different potential selected from at least one range of potentials. A multichannel device obtains chronoamperometry measurements from the plurality of working electrodes. The chronoamperometry measurements are used to generate a pattern of electrical charge on the plurality of electrodes, and the pattern of electrical charge is correlated with one or more known patterns to perform one or more of: identify one or more analytes in the water, perform speciation of analytes, and determine one or more concentration of the one or more analytes in the water.

Abstract: A micro-electromechanical-system (MEMS) device may be formed to include an anti-stiction polysilicon layer on one or more moveable MEMS structures of a device wafer of the MEMS device to reduce, minimize, and/or eliminate stiction between the moveable MEMS structures and other components or structures of the MEMS device. The anti-stiction polysilicon layer may be formed such that a surface roughness of the anti-stiction polysilicon layer is greater than the surface roughness of a bonding polysilicon layer on the surfaces of the device wafer that are to be bonded to a circuitry wafer of the MEMS device. The higher surface roughness of the anti-stiction polysilicon layer may reduce the surface area of the bottom of the moveable MEMS structures, which may reduce the likelihood that the one or more moveable MEMS structures will become stuck to the other components or structures.

Abstract: The present invention provides a wireless charging cable, a wireless charging coil structure and a producing method thereof, and a wireless charging device. The wireless charging cable has a conductive wire, an alloy layer and an insulation layer. The alloy layer is electroplated on an outer surface of the conductive wire and composed of nickel and iron, the insulation layer is coated on an outer surface of the alloy layer, wherein a better range of the cable diameter of the wireless charging cable is between 0.1 and 0.5 mm. The wireless charging coil structure has a sewed object and a sewing wire material including the wireless charging cable. The sewing wire material is sewed on the sewed object, and the wireless charging cable is sewed to become a wireless charging coil.

Abstract: Provided are a wireless power apparatus, a charging dock and an electronic equipment. In the wireless power apparatus, a housing is provided with a mounting cavity; a first battery is disposed within the mounting cavity; multiple first magnetic pieces are disposed in the housing and are configured for adsorbing multiple first adsorption pieces of an equipment body, respectively; a first charging assembly is configured to charge the first battery, a wireless power supply assembly is disposed within the mounting cavity, is electrically connected to the first battery, and is capable of transmitting power of the first battery to the equipment body.

Abstract: A method, computer program product and system are provided for preloading debug information based on the presence of incremental source code files. Based on parsed input parameters to a source code debugger, a source code repository and a local storage area are searched for an incremental file. In response to the incremental file being located, a preload indicator in the incremental file, which is a source code file, is set. Based on the preload indicator being set, debug symbol data from the incremental file is merged to a preload symbol list. In response to receiving a command to examine the debug symbol data from the incremental file, the preload symbol list is searched for the requested debug symbol data.

Abstract: Devices and methods for controlling wafer uniformity in plasma-based process is disclosed. In one example, a device for plasma-based processes is disclosed. The device includes: a housing defining a process chamber and a gas distribution plate (GDP) arranged in the process chamber. The housing comprises: a gas inlet configured to receive a process gas, and a gas outlet configured to expel processed gas. The GDP is configured to distribute the process gas within the process chamber. The GDP has a plurality of holes evenly distributed thereon. The GDP comprises a first zone and a second zone. The first zone is closer to the gas outlet than the second zone. At least one hole in the first zone is closed.

Abstract: A heat exchange device includes two end caps each having two openings, a barrel connected to and disposed between the end caps, a heat exchanger disposed in the barrel, a condensing unit and an electric unit mounted respectively to the end caps. The heat exchanger includes two conduit members spaced apart by a gap, a passage unit and a vortex chamber. The condensing unit absorbing and dissipating heat of the fluid. The electric unit is co-movable with at least a portion of one of the conduit members such that a dimension of the gap is adjusted, so as to change the temperature of the fluid flowing out of the device.

Abstract: A condensing device includes two end caps each having two openings, a barrel connected to and disposed between the end caps, a heat exchanger disposed in the barrel, and a condensing unit mounted to one end cap. The heat exchanger includes a passage and a vortex chamber each cooperating with a respective one of the openings of each of the end caps to define a flow channel to permit fluid to flow therethrough. A cooling chip module of the condensing unit includes a heat absorbing plate disposed at an end proximate to the one end cap, and a heat dissipating plate disposed at an opposite end.

Abstract: Methods and apparatus for electrochemical analysis of water include acid cleaning a quartz crystal microbalance (QCM), stabilizing a QCM in analyte solution, and analyzing the solution by chronoamperometry and measuring a frequency shift of the QCM. The method may further include cleaning the QCM in an acid solution prior to stabilizing the QCM in analyte solution. The apparatus may provide at least semi-automated electrochemical analysis of water including determining a concentration of an analyte in a water sample, and communicating the concentration of the analyte over a network. The analyte may be manganese.

Abstract: A micro-electromechanical-system (MEMS) device may be formed to include an anti-stiction polysilicon layer on one or more moveable MEMS structures of a device wafer of the MEMS device to reduce, minimize, and/or eliminate stiction between the moveable MEMS structures and other components or structures of the MEMS device. The anti-stiction polysilicon layer may be formed such that a surface roughness of the anti-stiction polysilicon layer is greater than the surface roughness of a bonding polysilicon layer on the surfaces of the device wafer that are to be bonded to a circuitry wafer of the MEMS device. The higher surface roughness of the anti-stiction polysilicon layer may reduce the surface area of the bottom of the moveable MEMS structures, which may reduce the likelihood that the one or more moveable MEMS structures will become stuck to the other components or structures.

Abstract: A micro-electromechanical-system (MEMS) device may be formed to include an anti-stiction polysilicon layer on one or more moveable MEMS structures of a device wafer of the MEMS device to reduce, minimize, and/or eliminate stiction between the moveable MEMS structures and other components or structures of the MEMS device. The anti-stiction polysilicon layer may be formed such that a surface roughness of the anti-stiction polysilicon layer is greater than the surface roughness of a bonding polysilicon layer on the surfaces of the device wafer that are to be bonded to a circuitry wafer of the MEMS device. The higher surface roughness of the anti-stiction polysilicon layer may reduce the surface area of the bottom of the moveable MEMS structures, which may reduce the likelihood that the one or more moveable MEMS structures will become stuck to the other components or structures.

Abstract: Devices and methods for controlling wafer uniformity using a gas baffle plate are disclosed. In one example, a device for plasma-based processes is disclosed. The device includes: a housing defining a process chamber and a baffle plate arranged above a wafer in the process chamber. The baffle plate is configured to control plasma distribution on the wafer. The baffle plate has a shape of an annulus that comprises a first annulus sector and a second annulus sector. The first annulus sector has a first inner radius. The second annulus sector has a second inner radius that is different from the first inner radius.

Abstract: Devices and methods for controlling wafer uniformity using a gas baffle plate are disclosed. In one example, a device for plasma-based processes is disclosed. The device includes: a housing defining a process chamber and a baffle plate arranged above a wafer in the process chamber. The baffle plate is configured to control plasma distribution on the wafer. The baffle plate has a shape of an annulus that comprises a first annulus sector and a second annulus sector. The first annulus sector has a first inner radius. The second annulus sector has a second inner radius that is different from the first inner radius.

Abstract: Devices and methods for controlling wafer uniformity in plasma-based process is disclosed. In one example, a device for plasma-based processes is disclosed. The device includes: a housing defining a process chamber and a gas distribution plate (GDP) arranged in the process chamber. The housing comprises: a gas inlet configured to receive a process gas, and a gas outlet configured to expel processed gas. The GDP is configured to distribute the process gas within the process chamber. The GDP has a plurality of holes evenly distributed thereon. The GDP comprises a first zone and a second zone. The first zone is closer to the gas outlet than the second zone. At least one hole in the first zone is closed.

Abstract: A transparent film heater is provided, including a transparent conductive film, at least two main electrodes and at least four multiple electrodes. The transparent conductive film is disposed on a transparent substrate. At least two main electrodes are arranged on two sides of the transparent conductive film along an edge of the transparent conductive film. The at least four multiple electrodes are composed of a first pair of multiple electrodes and a second pair of multiple electrodes, and are arranged on the transparent conductive film. A first spacing region and a second spacing region are respectively located between adjacent end points of the two main electrodes along the edge of the transparent conductive film. The first pair of multiple electrodes are arranged in the first spacing region, and the second pair of multiple electrodes are arranged in the second spacing region.

Abstract: Provided is a failure mode analysis method for a memory device including the following steps. A wafer is scanned by a test system to generate a failure pattern of the wafer, and a failure count of a single-bit in the wafer is obtained by a test program. A single-bit grouping table is defined according to a word-line layout, a bit-line layout, and an active area layout. A core group and a gap group are formed through grouping in at least one process in a self-aligned double patterning process. Failure counts of single-bits in the core group and the gap group are respectively counted to generate core failure data and gap failure data.