Abstract: The present invention relates to a polyimide precursor and a lithography pattern formed by the same. The polyimide precursor has a repeating unit having a structure of formula (I): in the formula (I), Ar represents a tetravalent group derivated from a tetracarboxylic dianhydride compound; R1 represents a divalent group derivated from a diamine compound; and R2 independently represent a thermal-crosslinking group, a photosensitive-crosslinking group, or a hydrogen atom. The polyimide precursor has an excellent pattern-forming ability.

Abstract: A method of fabricating a semiconductor structure including the following steps is provided. A mask layer is formed on a semiconductor substrate. The semiconductor substrate revealed by the mask layer is anisotropically etched until a cavity is formed in the semiconductor substrate, wherein anisotropically etching the semiconductor substrate revealed by the mask layer comprises performing a plurality of first cycles and performing a plurality of second cycles after performing the first cycles, each cycle among the first and second cycles respectively includes performing a passivating step and performing an etching step after performing the passivating step. During the first cycles, a first duration ratio of the etching step to the passivating step is variable and ramps up step by step. During the second cycles, a second duration ratio of the etching step to the passivating step is constant, and the first duration ratio is less than the second duration ratio.

Abstract: Methods for manufacturing MEMS structures are provided. The method includes forming a first trench and a second trench in a MEMS substrate by performing a main etching process and etching the MEMS substrate through the first trench and the second trench to form a first through hole and an extended second trench by performing a first step of an over-etching process. The method further includes etching the MEMS substrate through the extended second trench to form a second through hole by performing a second step of the over-etching process. In addition, a width of the first trench is greater than a width of the second trench, and a height of the first trench is greater than ¾ of a height of the MEMS substrate, and a height of the second trench is smaller than ? of the MEMS substrate.

Abstract: A method, computer program product, and system is disclosed for generating an Interactive Voice Response (IVR) system tree. A plurality of IVR system options from the IVR system are received. A first set of selections of the IVR system options are received from the user. A second set of selections of the IVR system are received, comprising at least a second set of subtrees. In response to identifying a plurality of subtrees of the second set of subtrees that are associated with the root node, the identified plurality of subtrees are mapped to the option tree. An IVR combination tree is generated. A visualization IVR combination tree is generated for display, in response to receiving a second user request for access to the IVR system. A target service associated with a user input selection of at least one end node of the visualized IVR combination tree is accessed.

Abstract: Methods for manufacturing MEMS structures are provided. The method includes forming a first trench and a second trench in a MEMS substrate by performing a main etching process and etching the MEMS substrate through the first trench and the second trench to form a first through hole and an extended second trench by performing a first step of an over-etching process. The method further includes etching the MEMS substrate through the extended second trench to form a second through hole by performing a second step of the over-etching process. In addition, a width of the first trench is greater than a width of the second trench, and a height of the first trench is greater than ¾ of a height of the MEMS substrate, and a height of the second trench is smaller than ? of the MEMS substrate.

Abstract: A method for forming a micro-electro-mechanical system (MEMS) device structure is provided. The method includes forming a second substrate over a first substrate, and a cavity is formed between the first substrate and the second substrate. The method includes forming a hole through the second substrate using an etching process, and the hole is connected to the cavity. The etching process includes a plurality of etching cycles, and each of the etching cycles includes an etching step, and the etching step has a first stage and a second stage. The etching time of each of the etching steps during the second stage is gradually increased as the number of etching cycles is increased.

Abstract: A multi-zone gas distribution plate (GDP) for high uniformity in plasma-based etching is provided. A housing defines a process chamber and comprises a gas inlet configured to receive a process gas. A GDP is arranged in the process chamber and is configured to distribute the process gas within the process chamber. The GDP comprises a plurality of holes extending through the GDP, and further comprises a plurality of zones into which the holes are grouped. The zones comprise a first zone and a second zone. Holes of the first zone share a first cross-sectional profile and holes of the second zone share a second cross-sectional profile different than the first cross-sectional profile. A method for designing the multi-zone GDP is also provided.

Abstract: A method, computer program product, and system is disclosed for generating an Interactive Voice Response (IVR) system tree. A plurality of IVR system options from the IVR system are received. A first set of selections of the IVR system options are received from the user. A second set of selections of the IVR system are received, comprising at least a second set of subtrees. In response to identifying a plurality of subtrees of the second set of subtrees that are associated with the root node, the identified plurality of subtrees are mapped to the option tree. An IVR combination tree is generated. A visualization IVR combination tree is generated for display, in response to receiving a second user request for access to the IVR system. A target service associated with a user input selection of at least one end node of the visualized IVR combination tree is accessed.

Abstract: A method, computer program product, and system is disclosed for generating an Interactive Voice Response (IVR) system tree. A plurality of IVR system options from the IVR system are received. A first set of selections of the IVR system options are received from the user. A second set of selections of the IVR system are received, comprising at least a second set of subtrees. In response to identifying a plurality of subtrees of the second set of subtrees that are associated with the root node, the identified plurality of subtrees are mapped to the option tree. An IVR combination tree is generated. A visualization IVR combination tree is generated for display, in response to receiving a second user request for access to the IVR system. A target service associated with a user input selection of at least one end node of the visualized IVR combination tree is accessed.

Abstract: A multi-zone gas distribution plate (GDP) for high uniformity in plasma-based etching is provided. A housing defines a process chamber and comprises a gas inlet configured to receive a process gas. A GDP is arranged in the process chamber and is configured to distribute the process gas within the process chamber. The GDP comprises a plurality of holes extending through the GDP, and further comprises a plurality of zones into which the holes are grouped. The zones comprise a first zone and a second zone. Holes of the first zone share a first cross-sectional profile and holes of the second zone share a second cross-sectional profile different than the first cross-sectional profile. A method for designing the multi-zone GDP is also provided.

Abstract: A method for forming a micro-electro-mechanical system (MEMS) device structure is provided. The method includes forming a second substrate over a first substrate, and a cavity is formed between the first substrate and the second substrate. The method includes forming a hole through the second substrate using an etching process, and the hole is connected to the cavity. The etching process includes a plurality of etching cycles, and each of the etching cycles includes an etching step, and the etching step has a first stage and a second stage. The etching time of each of the etching steps during the second stage is gradually increased as the number of etching cycles is increased.

Abstract: A multi-zone gas distribution plate (GDP) for high uniformity in plasma-based etching is provided. A housing defines a process chamber and comprises a gas inlet configured to receive a process gas. A GDP is arranged in the process chamber and is configured to distribute the process gas within the process chamber. The GDP comprises a plurality of holes extending through the GDP, and further comprises a plurality of zones into which the holes are grouped. The zones comprise a first zone and a second zone. Holes of the first zone share a first cross-sectional profile and holes of the second zone share a second cross-sectional profile different than the first cross-sectional profile. A method for designing the multi-zone GDP is also provided.

Abstract: A mold vacuum valve device includes a first mold having a mounting hole formed therethrough, a second mold connected to the first mold, and a sliding block. The second mold has a shaping cavity, a runner passage in fluid communication with a side of the shaping cavity, and a vacuum passage in fluid communication with an opposite side of the shaping cavity. The shaping cavity is defined by a serrated bottom wall surface, and cooperates with the mounting hole to define an accommodating space. The sliding block is disposed movably within the accommodating space, and has a head portion and a body portion. The head portion has a serrated side surface complementary to the serrated bottom wall surface. The head portion cooperates with the second mold to define a shaping clearance.

Abstract: An air blower is provided with an upper resonant chamber including an upper cover having an opening, an upper casing having an inlet engaging the opening, the upper casing secured to the upper cover to form a first chamber, first apertures through portions of the upper casing other than the inlet and communicating with the first chamber, and a first noise absorption material in the first chamber; a lower resonant chamber including a lower cover, a lower casing secured to the lower cover to form a second chamber, second apertures through the lower casing and communicating with the second chamber, and a second noise absorption material in the second chamber. The upper casing is on the lower casing to form a flow path. An impeller is in the flow path. In response to resonance, noise can be absorbed by the first and second absorption materials and converted into heat.

Abstract: A modular cyclonic separator comprises separating tubes each including an air-guiding impeller that is fixed coaxially in an outer tube body and that is formed with spiral channels for causing an airflow, which flows radially into the separating tube, to follow a cyclonic flow pattern through a separating chamber in the separating tube, thereby separating some of solid impurities from the airflow within the separating chamber. Each separating tube is capable of connecting selectively with one or two three-port valves to form a first or second filtration module, in which the airflow passes through a fluid passage in the one three-port valve or one of the two three-port valves prior to entering the separating tube.

Abstract: Provided is a patterned conductive film may include a conductive interconnected nano-structure film. The conductive interconnected nano-structure film may include a first region and a second region adjacent to the first region. A conductivity of the first region may be at least 1000 times a conductivity of the second region.

Abstract: A phased array transmitter is disclosed comprising a vector modulator, a true time delay block coupled to the vector modulator, a local oscillator phase shifter and RF-converter block coupled to the true time delay block, and an antenna. The vector modulator applies vector modulation to a baseband signal and provides an intermediate frequency signal to the true time delay block. The true time delay block applies a true time delay to the intermediate frequency signal and provides a delayed intermediate frequency signal to the local oscillator phase shifter and RF-converter block. The local oscillator phase shifter and RF-converter block multiplies the delayed intermediate frequency signal by a local oscillator signal and applies a phase shift to the delayed intermediate frequency signal to provide a radio frequency signal to the antenna for onwards transmission.

Abstract: A centrifugal fan is provided with an electric motor; an impeller driven by the electric motor; and fan dampers around an inner surface of fan housing and surrounding the impeller. Each fan damper has a windward, concave surface facing a rotational direction of the impeller. A spiral airflow created by the impeller passes the windward curved portions of the fan dampers and the motor toward an outlet. A portion of the kinetic energy of the spiral airflow is transmitted axially and the remaining kinetic energy of the spiral airflow is converted into static pressure to convey the spiral airflow toward the outlet so as to converge the spiral airflow from the electric motor to the outlet, thereby causing most of the spiral airflow to flow axially when it reaches the outlet.

Abstract: An air blower is provided with an upper resonant chamber including an upper cover having an opening, an upper casing having an inlet engaging the opening, the upper casing secured to the upper cover to form a first chamber, first apertures through portions of the upper casing other than the inlet and communicating with the first chamber, and a first noise absorption material in the first chamber; a lower resonant chamber including a lower cover, a lower casing secured to the lower cover to form a second chamber, second apertures through the lower casing and communicating with the second chamber, and a second noise absorption material in the second chamber. The upper casing is on the lower casing to form a flow path. An impeller is in the flow path. In response to resonance, noise can be absorbed by the first and second absorption materials and converted into heat.

Abstract: A modular cyclonic separator comprises separating tubes each including an air-guiding impeller that is fixed coaxially in an outer tube body and that is formed with spiral channels for causing an airflow, which flows radially into the separating tube, to follow a cyclonic flow pattern through a separating chamber in the separating tube, thereby separating some of solid impurities from the airflow within the separating chamber. Each separating tube is capable of connecting selectively with one or two three-port valves to form a first or second filtration module, in which the airflow passes through a fluid passage in the one three-port valve or one of the two three-port valves prior to entering the separating tube.