Patents by Inventor Yu-Ti Su

Yu-Ti Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220310589
    Abstract: An IC device includes a first power terminal, an IO pad, a first ESD protection device coupled between the first power terminal and IO pad, a first trigger current source device coupled between the first power terminal and IO pad, and a semiconductor substrate over which the first ESD protection device and first trigger current source device are formed. The first ESD protection device includes a parasitic BJT having a collector and an emitter coupled between the IO pad and first power terminal, and a base coupled via a substrate resistance to a well tap coupled to the first power terminal. The first trigger current source device, in response to an ESD voltage on the IO pad, becomes conductive and causes discharge of the ESD voltage through the first ESD protection device to the first power terminal.
    Type: Application
    Filed: March 26, 2021
    Publication date: September 29, 2022
    Inventors: Po-Lin PENG, Yu-Ti SU
  • Publication number: 20220302105
    Abstract: An electrostatic discharge (ESD) protection circuit is coupled between first and second power supply buses. The ESD protection circuit includes a detection circuit; a pull-up circuit, coupled to the detection circuit, comprising at least a first n-type transistor; a pull-down circuit, coupled to the pull-up circuit, comprising at least a second n-type transistor; and a bypass circuit, coupled to the pull-up and pull-down circuits, wherein the detection circuit is configured to detect whether an ESD event is present on either the first or the second bus so as to cause the pull-up and pull-down circuits to selectively enable the bypass circuit for providing a discharging path between the first and second power supply buses.
    Type: Application
    Filed: June 9, 2022
    Publication date: September 22, 2022
    Inventors: Ming-Fu Tsai, Tzu-Heng Chang, Yu-Ti Su, Kai-Ping Huang
  • Patent number: 11450735
    Abstract: A method includes implanting a first guard ring around a periphery of core circuitry. The implanting of the first guard ring includes implanting a first component a first distance from the core circuitry on a first side of the core circuitry, and implanting a second component a second distance from the core circuitry on a second side of the core circuitry, wherein the second distance is greater than the first distance. The method further includes implanting a second guard ring around the periphery of the core circuitry. The implanting of the second guard ring includes implanting a third component a third distance from the core circuitry on the first side of the core circuitry, and implanting a fourth component a fourth distance from the core circuitry on the second side of the core circuitry, wherein the third distance is greater than the fourth distance.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: September 20, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wan-Yen Lin, Wun-Jie Lin, Yu-Ti Su, Bo-Ting Chen, Jen-Chou Tseng, Kuo-Ji Chen, Sun-Jay Chang, Min-Chang Liang
  • Publication number: 20220294212
    Abstract: A device is disclosed herein. The device includes a bias generator, an ESD driver, and a logic circuit. The bias generator includes a first transistor. The ESD driver includes a second transistor and a third transistor coupled to each other in series. The logic circuit is configured to generate a logic control signal. A first terminal of the first transistor is configured to receive a reference voltage signal, a control terminal of the first transistor is configured to receive a detection signal in response to an ESD event being detected, a second terminal of the first transistor is coupled to a control terminal of the third transistor, and a control terminal of the second transistor is configured to receive the logic control signal.
    Type: Application
    Filed: May 29, 2022
    Publication date: September 15, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin PENG, Yu-Ti SU, Chia-Wei HSU, Ming-Fu TSAI, Shu-Yu SU, Li-Wei CHU, Jam-Wem LEE, Chia-Jung CHANG, Hsiang-Hui CHENG
  • Patent number: 11404409
    Abstract: An electrostatic discharge (ESD) protection circuit is coupled between first and second power supply buses. The ESD protection circuit includes a detection circuit; a pull-up circuit, coupled to the detection circuit, comprising at least a first n-type transistor; a pull-down circuit, coupled to the pull-up circuit, comprising at least a second n-type transistor; and a bypass circuit, coupled to the pull-up and pull-down circuits, wherein the detection circuit is configured to detect whether an ESD event is present on either the first or the second bus so as to cause the pull-up and pull-down circuits to selectively enable the bypass circuit for providing a discharging path between the first and second power supply buses.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: August 2, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ming-Fu Tsai, Tzu-Heng Chang, Yu-Ti Su, Kai-Ping Huang
  • Patent number: 11393816
    Abstract: The present disclosure describes a metal-oxide-semiconductor field-effect transistor (MOSFET) device. The MOSFET device includes a first-type substrate, a deep-second-type well in the first-type substrate, a first-type well over the deep-second-type well, and a second-type well over the deep-second-type well. The second-type well and the deep-second-type well form an enclosed space that includes the first-type well. The MOSFET also includes an embedded semiconductor region (ESR) in a vicinity of the enclosed space. The ESR includes a dopant concentration lower than at least one of a dopant concentration of the first-type well, a dopant concentration of the second-type well, and a dopant concentration of the deep-second-type well.
    Type: Grant
    Filed: October 12, 2020
    Date of Patent: July 19, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chien Yao Huang, Yu-Ti Su
  • Publication number: 20220223582
    Abstract: An integrated circuit includes a diode string, a first transistor, a second transistor, and a third transistor. The diode string is coupled between a first reference voltage pin and an input/output (I/O) pad. A first terminal of the second transistor is coupled to a first node, and a gate terminal of the second transistor is coupled to a second reference voltage pin. In response to a voltage at the first terminal of the second transistor being higher than a voltage at the gate terminal of the second transistor, the second transistor is configured to turn on the third transistor, and the third transistor is configured to transmit a voltage received from the first reference voltage pin to a gate terminal of the first transistor.
    Type: Application
    Filed: March 28, 2022
    Publication date: July 14, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin PENG, Yu-Ti SU
  • Patent number: 11380673
    Abstract: An Electro-Static Discharge (ESD) includes a first well having a first conductivity type on a substrate. The device further includes a second well within the first well. The second well has a second conductivity type. The device further includes a third well within the first well. The third well has the second conductivity type. The device further includes a first gate device disposed over the first well, a plurality of active regions between the first gate device and the dummy gate, and a dummy gate disposed within a space between the active regions. The dummy gate is positioned over a space between the second and third wells.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: July 5, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wun-Jie Lin, Han-Jen Yang, Yu-Ti Su
  • Publication number: 20220208753
    Abstract: In some embodiments, a semiconductor device is provided, including a first doped region of a first conductivity type configured as a first terminal of a first diode, a second doped region of a second conductivity type configured as a second terminal of the first diode, wherein the first and second doped regions are coupled to a first voltage terminal; a first well of the first conductivity type surrounding the first and second doped regions in a layout view; a third doped region of the first conductivity type configured as a first terminal, coupled to an input/output pad, of a second diode; and a second well of the second conductivity type surrounding the third doped region in the layout view. The second and third doped regions, the first well, and the second well are configured as a first electrostatic discharge path between the I/O pad and the first voltage terminal.
    Type: Application
    Filed: March 21, 2022
    Publication date: June 30, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin PENG, Li-Wei CHU, Ming-Fu TSAI, Jam-Wem LEE, Yu-Ti SU
  • Publication number: 20220208752
    Abstract: A semiconductor device includes a first diode, a second diode, a clamp circuit and a third diode. The first diode is coupled between an input/output (I/O) pad and a first voltage terminal. The second diode is coupled with the first diode, the I/O pad and a second voltage terminal. The clamp circuit is coupled between the first voltage terminal and the second voltage terminal. The second diode and the clamp circuit are configured to direct a first part of an electrostatic discharge (ESD) current flowing between the I/O pad and the first voltage terminal. The third diode, coupled to the first voltage terminal, and the second diode include a first semiconductor structure configured to direct a second part of the ESD current flowing between the I/O pad and the first voltage terminal.
    Type: Application
    Filed: March 21, 2022
    Publication date: June 30, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin PENG, Li-Wei CHU, Ming-Fu TSAI, Jam-Wem LEE, Yu-Ti SU
  • Patent number: 11355927
    Abstract: A device is disclosed herein. The device includes an electrostatic discharge (ESD) detector, a bias generator, and an ESD driver including at least two transistors coupled to each other in series. The ESD detector is configured to detect an input signal and generate a detection signal in response to an ESD event being detected. The bias generator is configured to generate a bias signal according to the detection signal. The at least two transistors are controlled according to the bias signal and a logic control signal, and the input signal is applied across the at least two transistors.
    Type: Grant
    Filed: July 22, 2020
    Date of Patent: June 7, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin Peng, Yu-Ti Su, Chia-Wei Hsu, Ming-Fu Tsai, Shu-Yu Su, Li-Wei Chu, Jam-Wem Lee, Chia-Jung Chang, Hsiang-Hui Cheng
  • Patent number: 11289472
    Abstract: An integrated circuit includes an input/output (I/O) pad, an electrostatic discharge (ESD) primary circuit and a bias voltage generator. The electrostatic discharge primary circuit includes a first transistor. A first terminal of the first transistor is coupled to the I/O pad. The bias voltage generator is configured to provide a gate bias signal to the gate terminal of the first transistor. The bias voltage generator provides the gate bias signal at a first voltage level in response to that an ESD event occurs on the I/O pad. The bias voltage generator provides the gate bias signal at a second voltage level in response to that no ESD event occurs on the I/O pad. The first voltage level is lower than the second voltage level.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: March 29, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin Peng, Yu-Ti Su
  • Patent number: 11282831
    Abstract: A semiconductor device includes a first diode, a second diode, a clamp circuit and a third diode. The first diode is coupled between an input/output (I/O) pad and a first voltage terminal. The second diode is coupled with the first diode, the I/O pad and a second voltage terminal. The clamp circuit is coupled between the first voltage terminal and the second voltage terminal. The second diode and the clamp circuit are configured to direct a first part of an electrostatic discharge (ESD) current flowing between the I/O pad and the first voltage terminal. The third diode, coupled to the first voltage terminal, and the second diode include a first semiconductor structure configured to direct a second part of the ESD current flowing between the I/O pad and the first voltage terminal.
    Type: Grant
    Filed: September 18, 2019
    Date of Patent: March 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin Peng, Li-Wei Chu, Ming-Fu Tsai, Jam-Wem Lee, Yu-Ti Su
  • Publication number: 20220037310
    Abstract: An integrated circuit includes an input/output (I/O) pad, an electrostatic discharge (ESD) primary circuit and a bias voltage generator. The electrostatic discharge primary circuit includes a first transistor. A first terminal of the first transistor is coupled to the I/O pad. The bias voltage generator is configured to provide a gate bias signal to the gate terminal of the first transistor. The bias voltage generator provides the gate bias signal at a first voltage level in response to that an ESD event occurs on the I/O pad. The bias voltage generator provides the gate bias signal at a second voltage level in response to that no ESD event occurs on the I/O pad. The first voltage level is lower than the second voltage level.
    Type: Application
    Filed: July 30, 2020
    Publication date: February 3, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin PENG, Yu-Ti SU
  • Publication number: 20220029414
    Abstract: A device is disclosed herein. The device includes an electrostatic discharge (ESD) detector, a bias generator, and an ESD driver including at least two transistors coupled to each other in series. The ESD detector is configured to detect an input signal and generate a detection signal in response to an ESD event being detected. The bias generator is configured to generate a bias signal according to the detection signal. The at least two transistors are controlled according to the bias signal and a logic control signal, and the input signal is applied across the at least two transistors.
    Type: Application
    Filed: July 22, 2020
    Publication date: January 27, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Lin PENG, Yu-Ti SU, Chia-Wei HSU, Ming-Fu TSAI, Shu-Yu SU, Li-Wei CHU, Jam-Wem LEE, Chia-Jung CHANG, Hsiang-Hui CHENG
  • Publication number: 20210305235
    Abstract: A snapback electrostatic discharge (ESD) protection circuit includes a first well in a substrate, a drain region of a transistor, a source region of the transistor, a gate region of the transistor, and a second well embedded in the first well. The first well has a first dopant type. The drain region is in the first well, and has a second dopant type different from the first dopant type. The source region is in the first well, has the second dopant type, and is separated from the drain region in a first direction. The gate region is over the first well and the substrate. The second well is embedded in the first well, and is adjacent to a portion of the drain region. The second well has the second dopant type.
    Type: Application
    Filed: January 7, 2021
    Publication date: September 30, 2021
    Inventors: Chia-Lin HSU, Yu-Hung YEH, Yu-Ti SU, Wun-Jie LIN
  • Publication number: 20210210490
    Abstract: Capacitor cells are provided. A first PMOS transistor is coupled between a power supply and a first node, and has a gate connected to a second node. A first NMOS transistor is coupled between a ground and the second node, and has a gate connected to the first node. A second PMOS transistor is coupled between the second node and the power supply, and has a gate connected to the second node. A second NMOS transistor is coupled between the first node and the ground, a gate connected to the first node, and has a gate connected to the first node. Sources of the first and second PMOS transistors share a P+ doped region in N-type well region, and the first PMOS transistor is disposed between the second PMOS transistor and the first and second NMOS transistors.
    Type: Application
    Filed: March 24, 2021
    Publication date: July 8, 2021
    Inventors: Chien-Yao Huang, Wun-Jie Lin, Chia-Wei Hsu, Yu-Ti Su
  • Patent number: 10991442
    Abstract: A memory device includes a memory circuit and a fuse protection circuit. The memory circuit includes a program line and a fuse. The program line is configured to receive a program voltage for programming the fuse. The fuse protection circuit is coupled to the memory circuit and is configured to prevent unintentional programming of the fuse.
    Type: Grant
    Filed: September 8, 2020
    Date of Patent: April 27, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Yu-Der Chih, Chen-Ming Hung, Jen-Chou Tseng, Jam-Wem Lee, Ming-Hsiang Song, Shu-Chuan Lee, Shao-Yu Chou, Yu-Ti Su
  • Publication number: 20210117605
    Abstract: An integrated circuit design method includes receiving an integrated circuit design, and determining a floor plan for the integrated circuit design. The floor plan includes an arrangement of a plurality of functional cells and a plurality of tap cells. Potential latchup locations in the floor plan are determined, and the arrangement of at least one of the functional cells or the tap cells is modified based on the determined potential latchup locations.
    Type: Application
    Filed: December 21, 2020
    Publication date: April 22, 2021
    Inventors: Po-Chia Lai, Kuo-Ji Chen, Wen-Hao Chen, Wun-Jie Lin, Yu-Ti Su, Mohammed Rabiul Islam, Shu-Yi Ying, Stefan Rusu, Kuan-Te Li, David Barry Scott
  • Patent number: 10971495
    Abstract: A capacitor cell is provided. A first PMOS transistor is coupled between a power supply and a first node, and has a gate connected to a second node. A first NMOS transistor is coupled between a ground and the second node, and has a gate connected to the first node. A second PMOS transistor is coupled between the second node and the first node, and has a gate connected to the second node. A second NMOS transistor has a drain connected to the first node, a gate connected to the first node, and a source connected to the ground or the second node. The first and second PMOS transistors and the first and second NMOS transistors are arranged in the same row. The second PMOS transistor is disposed between the first PMOS transistor and the first and second NMOS transistors.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: April 6, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Chien-Yao Huang, Wun-Jie Lin, Chia-Wei Hsu, Yu-Ti Su