Patents by Inventor Yue Guo

Yue Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11462389
    Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: October 4, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo, Kartik Ramaswamy, Valentin N. Todorow, Olivier Luere, Jonathan Kolbeck, Linying Cui
  • Patent number: 11462388
    Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: October 4, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo, Kartik Ramaswamy, Valentin N. Todorow, Olivier Luere, Linying Cui
  • Publication number: 20220284476
    Abstract: The disclosed subject matter relates to a system and method for selecting/recommending ads based on a contextual bandit approach. The disclosed approach leverages various embedding vectors of item, search, page taxonomy trained based on traffic data via advanced deep learning models, and uses model signals (e.g. historical CTR, item price, rating, quality) from other ad placements. The learning mechanism on top of the current methodology to automatic chooses the best feature sets and adjust model performance over time. The contextual bandit model performs better with respect to CTR than the Thompson Sampling model, and achieves lower regret and faster convergence over time.
    Type: Application
    Filed: March 8, 2021
    Publication date: September 8, 2022
    Inventors: Peng Yang, Dong Xu, Yue Guo
  • Publication number: 20220280327
    Abstract: A lumbar support belt includes a back belt, a first waist belt, a second waist belt, and a tightening mechanism. The first waist belt and the second waist belt are connected to two ends of the back belt, respectively, to wrap around the waist and the abdomen of a user. The back belt is a plastic support board. The first waist belt includes a first front part and the second waist belt includes a second front part. The first front part and the second front part are attached to each other to form a compression belt abutting against the abdomen of the user. The first waist belt includes a first back part and the second waist belt includes a second back part. The first back part and the second back part are disposed at a distance from the support board.
    Type: Application
    Filed: May 26, 2022
    Publication date: September 8, 2022
    Inventors: Yue GUO, Jianlong YAO, Ling BAI
  • Publication number: 20220275025
    Abstract: A series of bone remodeling regulatory peptides and application thereof are disclosed. Through sequence alignment, structure analysis, physical and chemical properties and function prediction, a series of bone remodeling regulatory peptides are designed and synthesized by solid-phase peptide synthesis method: Core peptide sequence: Gly-Xaa-Pro-Gly-Xaa-Xaa-Gly-Xaa-Xaa, A1-1: Gly-Ala-Pro-Gly-Pro-Gln-Gly-Phe-Gln, A1-2-1: Gly-Ala-Pro-Gly-Ala-Pro-Gly-Ser-Gln, A1-4-1: Gly-Pro-Pro-Gly-Pro-Ala-Gly-Phe-Ala, A1-5-3: Gly-Pro-Pro-Gly-Ala-Thr-Gly-Phe-Pro, and OSCpep: Gly-Ala-Pro-Gly-Pro-Ala-Gly-Phe-Ala. These peptides have the features of short length, simple synthesis, low cost, low cytotoxicity, high biological stability, moderate half-life, good bone targeting. They can regulate the differentiation and function of osteoclasts and osteoblasts by adjusting the concentration, thereby achieving the orderly regulation of bone resorption and bone formation, and have wide potential application prospects.
    Type: Application
    Filed: August 15, 2019
    Publication date: September 1, 2022
    Applicant: THE SECOND XIANGYA HOSPITAL OF CENTRAL SOUTH UNIVERSITY
    Inventors: Houde ZHOU, Yue GUO, Yinghui ZHOU, Haiqng YUE
  • Patent number: 11386339
    Abstract: Approaches, techniques, and mechanisms are disclosed for accessing AI services from one region to another region. An artificial intelligence (AI) service director is configured with mappings from domain names of AI cloud engines to IP addresses of edge nodes of an AI delivery edge network. The AI cloud engines are located in an AI source region. The AI delivery edge network is deployed in a non-AI-source region. An AI application, which accesses AI services using a domain name of an AI cloud engine in the AI cloud engines located in the AI source region, is redirected to an edge node in the edge nodes of the AI delivery edge network located in the non-AI-source region. The AI application is hosted in the non-AI-source region. The AI services is then provided, by way of the edge node located in the non-AI-source region, to the AI application.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: July 12, 2022
    Assignee: GLOBAL ELMEAST INC.
    Inventors: Zaide Liu, Ken Zhang, Yue Guo
  • Publication number: 20220205092
    Abstract: The present invention discloses a coating device including: a first shell, having a top portion and a side portion; and a second shell, accommodated in the first shell and at least partially divergently extending downwards from the top portion of the first shell. The first shell and the second shell define a first space in between, the second shell defines a second space, and the first space surrounds the second space and the two are not in communication.
    Type: Application
    Filed: December 14, 2021
    Publication date: June 30, 2022
    Inventors: Yue Guo, Chun Liu, Ziyou Liu, Zhuo Wang, Jingshu Li
  • Publication number: 20220173888
    Abstract: The present invention is direct to a two-mode blockchain consensus protocol and a system implementing such a protocol. The system includes a plurality of node computers (and a communications network connecting the plurality of node computers. The plurality of node computers includes a first node computer, a collecting node computer, a committee of node computers, and one or more node computers that operate based on proof of work algorithms. Each node computer in the plurality includes a blockchain consensus software application running on the processor of the node computer. The blockchain consensus software application is adapted to connect to the plurality of node computers that are connected to the communications network. The blockchain consensus software application implements the two-mode blockchain consensus protocol. Through the software application, the plurality of node computers operate to reach a consensus on adding data to a public ledger.
    Type: Application
    Filed: February 16, 2022
    Publication date: June 2, 2022
    Inventors: Runting Shi, Rafael Pass, Yue Guo
  • Publication number: 20220130642
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, apparatus can include a first voltage/current (V/I) probe configured to connect to an input side of a matching network of the processing chamber and a second V/I probe configured to connect to an output side of the matching network and a processor coupled to the first V/I probe and the second V/I probe and configured to, based on a phase gap between a V and I of an RF signal detected by at least one of the first V/I probe or the second V/I probe at a target frequency, detect a minimum phase gap between the V and I, and control at least one of impedance tuning of the matching network or process control of the processing chamber using at least one of a peak or RMS of V, I and phase measured at the target frequency or under sweeping frequency.
    Type: Application
    Filed: October 23, 2020
    Publication date: April 28, 2022
    Inventors: Katsumasa KAWASAKI, Kartik RAMASWAMY, Yue GUO, Chunlei ZHANG, Sergio Fukuda SHOJI, Jorge ZANINOVICH, Smbat KARTASHYAN
  • Publication number: 20220100312
    Abstract: The present disclosure provides an interactive device, an inductive screen, an interactive system, and a positioning method, and relates to the field of display technologies, with an objective of providing a low-cost positioning and interactive method. The interactive device includes: a first housing, a first end of the first housing having a light-exit opening; a first light-emitting component, arranged inside the first housing and configured to emit a linear light beam through the light-exit opening of the first housing, the linear light beam rotating with rotation of the first housing; and a driving component, connected to a second end of the first housing opposite to the first end and configured to drive the first housing to rotate.
    Type: Application
    Filed: January 7, 2021
    Publication date: March 31, 2022
    Inventors: Qian ZHANG, Xintong WU, Lei LIU, Longyue GAO, Yue GUO
  • Patent number: 11271717
    Abstract: The present invention is direct a two-mode blockchain consensus protocol and a system implementing such a protocol. The system includes a plurality of node computers (and a communications network connecting the plurality of node computers. The plurality of node computers includes a first node computer, a collecting node computer, a committee of node computers, and one or more node computers that operate based on proof of work algorithms. Each node computer in the plurality includes a blockchain consensus software application running on the processor of the node computer. The blockchain consensus software application is adapted to connect to the plurality of node computers that are connected to the communications network. The blockchain consensus software application implements the two-mode blockchain consensus protocol. Through the software application, the plurality of node computers operate to reach a consensus on adding data to a public ledger.
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: March 8, 2022
    Assignee: Thunder Token Inc.
    Inventors: Runting Shi, Rafael Pass, Yue Guo
  • Publication number: 20220037121
    Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.
    Type: Application
    Filed: May 7, 2021
    Publication date: February 3, 2022
    Inventors: Leonid DORF, Rajinder DHINDSA, James ROGERS, Daniel Sang BYUN, Evgeny KAMENETSKIY, Yue GUO, Kartik RAMASWAMY, Valentin N. TODOROW, Olivier LUERE
  • Publication number: 20220037119
    Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.
    Type: Application
    Filed: May 7, 2021
    Publication date: February 3, 2022
    Inventors: Leonid DORF, Rajinder DHINDSA, James ROGERS, Daniel Sang BYUN, Evgeny KAMENETSKIY, Yue GUO, Kartik RAMASWAMY, Valentin N. TODOROW, Olivier LUERE, Linying Cui
  • Publication number: 20220037120
    Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.
    Type: Application
    Filed: May 7, 2021
    Publication date: February 3, 2022
    Inventors: Leonid DORF, Rajinder DHINDSA, James ROGERS, Daniel Sang BYUN, Evgeny KAMENETSKIY, Yue GUO, Kartik RAMASWAMY, Valentin N. TODOROW, Olivier LUERE, Jonathan KOLBECK, Linying CUI
  • Publication number: 20210398022
    Abstract: The present disclosure provides a method and apparatus of fusing operators, an electronic device and a storage medium, which relates to fields of deep learning, artificial intelligence and knowledge graph. The method includes: determining operator groups to be fused, according to an operator graph to be processed, wherein each operator group of the operator groups includes at least two operators in the operator graph respectively; obtaining a fused operator corresponding to the each operator group respectively; and for the fused operator, replacing corresponding operators in the operator graph with the fused operator respectively, and coupling dependence edges of the corresponding operators to the any fused operator, wherein the corresponding operators include operators in the operator group corresponding to the fused operator.
    Type: Application
    Filed: September 1, 2021
    Publication date: December 23, 2021
    Inventors: Guibin WANG, Yangkai XU, Huanxin ZHENG, Yue GUO
  • Patent number: 11134229
    Abstract: A model training method includes: constructing a mapping model between original color information values and standard color information values of images with a coefficient matrix; establishing an objective function of the mapping model based on a regular term of a variable exponent; determining original color information values and standard color information values of a plurality of sample images; and calculating the objective function from the original color information values and the standard color information values of the plurality of sample images to determine the coefficient matrix.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: September 28, 2021
    Assignees: Beijing BOE Display Technology Co., Ltd., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yue Guo, Lei Liu, Yanjun Sun, Qian Zhang, Juan Wang
  • Publication number: 20210296131
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.
    Type: Application
    Filed: May 28, 2021
    Publication date: September 23, 2021
    Inventors: Kartik Ramaswamy, Yang Yang, Kenneth Collins, Steven Lane, Gonzalo Monroy, Yue Guo
  • Publication number: 20210287907
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.
    Type: Application
    Filed: June 2, 2021
    Publication date: September 16, 2021
    Inventors: Kartik Ramaswamy, Yang Yang, Kenneth Collins, Steven Lane, Gonzalo Monroy, Yue Guo
  • Patent number: 11043375
    Abstract: A method of forming a transparent carbon layer on a substrate is provided. The method comprises generating an electron beam plasma above a surface of a substrate positioned over a first electrode and disposed in a processing chamber having a second electrode positioned above the first electrode. The method further comprises flowing a hydrocarbon-containing gas mixture into the processing chamber, wherein the second electrode has a surface containing a secondary electron emission material selected from a silicon-containing material and a carbon-containing material. The method further comprises applying a first RF power to at least one of the first electrode and the second electrode and forming a transparent carbon layer on the surface of the substrate.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: June 22, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Yang Yang, Eswaranand Venkatasubramanian, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Lucy Zhiping Chen, Yue Guo
  • Patent number: 11043387
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: June 22, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kartik Ramaswamy, Yang Yang, Kenneth Collins, Steven Lane, Gonzalo Monroy, Yue Guo