Abstract: A fixing device includes: an endless belt; a heater; a stay; a holder having a heater supporting surface and a contacting surface in contact with the stay; and a pressure roller having a diameter that becomes smaller from each end of the pressure roller in an axial direction toward a center of the pressure roller in the axial direction. In a state prior to assembling the holder with both the stay and the heater, a distance in an orthogonal direction between the heater supporting surface and the contacting surface at a center of the holder in the axial direction is longer than a distance in the orthogonal direction between the heater supporting surface and the contacting surface at each end of the holder in the axial direction. The orthogonal direction is orthogonal to the axial direction.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.

Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit, a target passage detection device, a delay circuit, a laser device, a target image capturing device, and a processor. Here, the processor controls the vibrating element to provide irregular intervals between droplet targets adjacent to each other; generates integrated image data by integrating plural pieces of image data imaged at different times; specifies a position, in the integrated image data, of the droplet target most emphasized in the integrated image data; and sets a delay time based on a distance from a position of the most emphasized droplet target to a second detection position.

Abstract: An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.

Abstract: An EUV light generation system includes a chamber, a target supply device supplying a target to a plasma generation region in the chamber, a laser device outputting pulse laser light, a beam sensor measuring one of a position and an angle of an optical axis of the pulse laser light as a first optical characteristic, a first reflection control mirror whose angle is controlled, and a processor controlling the laser device. The processor calculates a first corrected angle based on a first attenuation curve defined by the angle of the first reflection control mirror at an end of an immediately preceding irradiation period, the angle of the first reflection control mirror at a cold state, an elapsed time from a start of the pause period, and a first time constant, and to change the angle of the first reflection control mirror to the first corrected angle, during a pause period.

Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

Abstract: An extreme ultraviolet light generation system configured to generate extreme ultraviolet light by irradiating a target substance with laser light includes a nozzle configured to output the target substance, a vibration element that is driven by an input of an electric signal of a rectangular wave and applies vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a first sensor configured to detect energy of the generated extreme ultraviolet light, a second sensor configured to detect energy of the laser light to be radiated to the target substance, and a processor configured to control a duty value of the electric signal for vibrating the vibration element so as to reduce a variation of an energy conversion efficiency calculated based on an output of the first sensor and an output of the second sensor.

Abstract: An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.

Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

Abstract: An object of the present invention is to provide a method for producing 5-hydroxymethyl-2-furfural (5-HMF) suitable for industrial-scale production and a novel catalyst composition for use in synthesizing 5-HMF. The present invention provides a method for producing 5-HMF comprising performing a dehydration reaction of a carbohydrate comprising a hexose as a constituent sugar or a derivative thereof by using activated carbon as a catalyst; and a catalyst composition for use in the reaction for producing 5-HMF from a carbohydrate comprising a hexose as a constituent sugar through a dehydration reaction, the catalyst composition comprising activated carbon.

Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism.

Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism.

Abstract: An extreme ultraviolet light generation system according to an aspect of the present disclosure includes a first actuator that changes a travel direction of prepulse laser light to be output from a first optical element arranged on an optical path of the prepulse laser light between a prepulse laser device and a beam combiner, and a second actuator that changes irradiation positions of the prepulse laser light and main pulse laser light to be output from a light concentrating optical system, a plurality of sensors that detect light radiated from a predetermined region by a target being irradiated with the main pulse laser light, and a controller. Here, the controller controls the first actuator so that an evaluation value calculated from output of the plurality of sensors approaches a target value, and thereafter, controls the second actuator so that the evaluation value approaches the target value.

Abstract: An object of the present invention is to provide a method for producing 5-hydroxymethyl-2-furfural (5-HMF) with suppressed production of byproducts. The present invention provides a method for producing 5-HMF, comprising the step of performing a dehydration reaction of a carbohydrate comprising a hexose as a constituent sugar or a derivative thereof to produce 5-hydroxymethyl-2-furfural, wherein the dehydration reaction is performed in the presence of activated carbon. The present invention also provides a method for producing a carbohydrate composition comprising 5-hydroxymethyl-2-furfural, comprising the step of heating a carbohydrate composition comprising one or more selected from the group consisting of a carbohydrate comprising a hexose as a constituent sugar and a derivative thereof, in the presence of an acid catalyst and activated carbon at a temperature of 90 to 400° C.

Abstract: An extreme ultraviolet light generation system according to one aspect of the present disclosure includes: a pulse laser apparatus configured to output a pulse laser beam, the pulse laser beam being supplied to a predetermined region in a chamber in which plasma containing extreme ultraviolet light is to be generated; a sensor configured to detect a beam size of the pulse laser beam; an actuator configured to change the beam size; and a controller. The controller performs, based on a first algorithm, first control that controls the actuator by a first control amount in a beam size minifying direction when the beam size has exceeded a first upper limit threshold in one burst duration, and then performs, based on a second algorithm, second control that controls the actuator by a second control amount smaller than the first control amount so that the beam size becomes closer to a target value.

Abstract: An object of the present invention is to provide a method for producing 5-hydroxymethyl-2-furfural (5-HMF) with suppressed production of byproducts. The present invention provides a method for producing 5-HMF, comprising the step of performing a dehydration reaction of a carbohydrate comprising a hexose as a constituent sugar or a derivative thereof to produce 5-hydroxymethyl-2-furfural, wherein the dehydration reaction is performed in the presence of activated carbon. The present invention also provides a method for producing a carbohydrate composition comprising 5-hydroxymethyl-2-furfural, comprising the step of heating a carbohydrate composition comprising one or more selected from the group consisting of a carbohydrate comprising a hexose as a constituent sugar and a derivative thereof, in the presence of an acid catalyst and activated carbon at a temperature of 90 to 400° C.

Abstract: An extreme ultraviolet light generation system according to one aspect of the present disclosure includes: a pulse laser apparatus configured to output a pulse laser beam, the pulse laser beam being supplied to a predetermined region in a chamber in which plasma containing extreme ultraviolet light is to be generated; a sensor configured to detect a beam size of the pulse laser beam; an actuator configured to change the beam size; and a controller. The controller performs, based on a first algorithm, first control that controls the actuator by a first control amount in a beam size minifying direction when the beam size has exceeded a first upper limit threshold in one burst duration, and then performs, based on a second algorithm, second control that controls the actuator by a second control amount smaller than the first control amount so that the beam size becomes closer to a target value.

Abstract: A keyboard instrument includes a plurality of key blocks, each including key main bodies, connecting sections, and a supporting section. Each key main body has a top surface that can be pressed by a user to play the keyboard instrument. Each connecting section extends from a key main body and deforms in response to pressing at the top surface of the key main body. The supporting section supports the key main bodies as one key block through the connecting sections. The key blocks are stacked at the supporting section in an instrument case so that a plurality of connecting sections of one key block and a plurality of connecting sections of another key block overlap each other. In at least one key block, each connecting section extends from a top surface side of the corresponding key main body.

Abstract: An edge-incident light receiving element is equipped with a light receiving portion formed near a first surface of a semiconductor substrate, a concave reflective portion formed at a second surface of the semiconductor substrate that opposes the first surface, and a planar reflective portion formed between the first surface and the second surface, and the planar reflective portion reflects incident light on an edge surface of the semiconductor substrate that is perpendicular to the first surface and to the second surface toward the concave reflective portion, and the concave reflective portion reflects the incident light reflected by the planar reflective portion so as to condense on the light receiving portion.