Abstract: An EUV light generation apparatus is configured to generate EUV light by irradiating a target output into a chamber with laser light. Here, the EUV light generation apparatus includes a light concentrating unit configured to concentrate the laser light on the target, an angle adjustment mirror configured to adjust an incident angle of the laser light on the light concentrating unit, a position adjustment mirror configured to adjust an incident position of the laser light on the light concentrating unit, a beam monitor configured to measure a parameter related to variation in the incident position, and a processor configured to perform control of adjustment by the position adjustment mirror based on a measurement value of the parameter when performing adjustment by the angle adjustment mirror.

Abstract: An extreme ultraviolet light generation apparatus generating extreme ultraviolet light by irradiating a droplet with laser light includes a tank storing a target substance in a liquid state; a nozzle outputting the target substance stored in the tank; a piezoelectric element applying vibration reflecting an electric signal to the target substance to be output from the nozzle to generate the droplet of the target substance; a first sensor measuring a passage interval of the droplets output from the nozzle; a second sensor measuring a parameter related to the droplet; and a processor setting a prohibited band of a duty of the electric signal based on data in which the duty and the parameter at the duty are associated with each other, and setting the duty of the electric signal to be applied to the piezoelectric element while avoiding the prohibited band.

Abstract: An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.

Abstract: An electronic device includes a case including a coating layer on a surface of a base material. The coating layer includes a first coating layer that is provided on the base material and a second coating layer that includes a raw lacquer and is provided on the first coating layer. The first coating layer is configured to improve adhesion between the base material and the first coating layer and between the first coating layer and the second coating layer. The second coating layer has a first area and a second area where the second coating layer is thinner than in the first area, and is configured such that a paint color of the first coating layer is visible through the second coating layer in the second area.

Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit, a target passage detection device, a delay circuit, a laser device, a target image capturing device, and a processor. Here, the processor controls the vibrating element to provide irregular intervals between droplet targets adjacent to each other; generates integrated image data by integrating plural pieces of image data imaged at different times; specifies a position, in the integrated image data, of the droplet target most emphasized in the integrated image data; and sets a delay time based on a distance from a position of the most emphasized droplet target to a second detection position.

Abstract: Provided is a control method of an extreme ultraviolet light generation system. The extreme ultraviolet light generation system includes a target supply unit configured to supply a target, a laser device configured to irradiate the target with laser light, an EUV energy sensor configured to detect an energy of extreme ultraviolet light generated by the target being irradiated with the laser light, an optical adjuster configured to adjust an energy of the laser light, and a processor configured to adjust the optical adjuster by PID control based on output of the EUV energy sensor. The processor acquires a first index value for the output of the EUV energy sensor and a second index value different from the first index value and determines a control gain in the PID control based on the first and second index values.

Abstract: An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.

Abstract: An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.

Abstract: An extreme ultraviolet light generation system, generating extreme ultraviolet light by irradiating a target substance with laser light, includes a tank storing the target substance in a liquid state, a nozzle outputting the target substance stored in the tank, a piezoelectric element applying vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a droplet detection device detecting a time interval of passage of the droplets output from the nozzle, and at least one processor. The processor acquires a first value of a vibration parameter relating to the vibration of the piezoelectric element, acquires a variation of the time interval corresponding to each of a plurality of values including the first value of the vibration parameter, and generates the droplets using a second value with which the variation of the time interval is smaller than that with the first value.

Abstract: A performance recovery method for an EUV light generation system includes performing a first evaluation step of evaluating performance of EUV light while generating the EUV light at a certain repetition frequency during a first period; performing, when an evaluation result of the first evaluation step is not within a normal range, an adjustment step of adjusting the performance and then the first evaluation step as a check step; performing, when an evaluation result of the check step is within the normal range, a second evaluation step of evaluating performance of the EUV light while generating the EUV light at the repetition frequency during a second period longer than the first period; and terminating processing when the evaluation result of the check step is not within the normal range. An index related to an irradiation position of pulse laser light is evaluated in the first and second evaluation steps.

Abstract: An EUV light generation system includes a processor controlling an actuator which changes an irradiation position of laser light on a target. The processor executes a first control of acquiring a value of a first index related to output values of EUV energy sensors, acquiring a value of a second index related to a ratio of the output values of the EUV energy sensors, and controlling the actuator based on the value of the first index; and a second control of, during the first control, controlling the actuator to move the irradiation position of the laser light in a direction for causing the value of the second index not to exceed a vibration threshold when the value of the second index has exceeded the vibration threshold which reflects a vibration occurrence irradiation position being the irradiation position at which the EUV energy temporally vibrates due to the buffer gas.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.

Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit, a target passage detection device, a delay circuit, a laser device, a target image capturing device, and a processor. Here, the processor controls the vibrating element to provide irregular intervals between droplet targets adjacent to each other; generates integrated image data by integrating plural pieces of image data imaged at different times; specifies a position, in the integrated image data, of the droplet target most emphasized in the integrated image data; and sets a delay time based on a distance from a position of the most emphasized droplet target to a second detection position.

Abstract: An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.

Abstract: An EUV light generation system includes a chamber, a target supply device supplying a target to a plasma generation region in the chamber, a laser device outputting pulse laser light, a beam sensor measuring one of a position and an angle of an optical axis of the pulse laser light as a first optical characteristic, a first reflection control mirror whose angle is controlled, and a processor controlling the laser device. The processor calculates a first corrected angle based on a first attenuation curve defined by the angle of the first reflection control mirror at an end of an immediately preceding irradiation period, the angle of the first reflection control mirror at a cold state, an elapsed time from a start of the pause period, and a first time constant, and to change the angle of the first reflection control mirror to the first corrected angle, during a pause period.

Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

Abstract: An extreme ultraviolet light generation system configured to generate extreme ultraviolet light by irradiating a target substance with laser light includes a nozzle configured to output the target substance, a vibration element that is driven by an input of an electric signal of a rectangular wave and applies vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a first sensor configured to detect energy of the generated extreme ultraviolet light, a second sensor configured to detect energy of the laser light to be radiated to the target substance, and a processor configured to control a duty value of the electric signal for vibrating the vibration element so as to reduce a variation of an energy conversion efficiency calculated based on an output of the first sensor and an output of the second sensor.

Abstract: An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.

Abstract: An extreme ultraviolet light generation system includes a target supply unit configured to supply a target substance to a first predetermined region, a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region, a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region, an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region, and a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.