Abstract: A steering control system that controls a steering device of a vehicle includes a storage unit, and a control unit configured to make a state transition to a normal control state via a start-up state after a power source system of the vehicle is started. In the start-up state, the control unit executes a correction information storing process of acquiring correction element information using a state variable obtained from the steering device and writing correction information obtained based on the correction element information into the storage unit. In the start-up state, the control unit is configured to execute an abnormal condition determination process of determining whether an abnormal condition indicating that the correction information is abnormal is met. The correction information storing process is re-executed when the abnormal condition is met. The abnormal condition determination process is executed at least either before or after the correction information storing process.

Abstract: A steering control device includes a control unit. The control unit is configured to execute a control angle calculation process, an angle feedback process, and a standard value adjustment process. The control angle calculation process is a process of calculating a control angle as an absolute angle relative to a standard value, and the angle feedback process is a process of performing feedback control on the control angle, and the standard value adjustment process is a process of adjusting the stored standard value. The standard value adjustment process includes a process of, when, in a straight-ahead state, the control angle deviates from a value showing the straight-ahead state, adjusting the standard value such that the deviation of the control angle from the value showing the straight-ahead state decreases.

Abstract: A power supply device includes a driving control device and an auxiliary control device, the vehicle including a main power source, an auxiliary power source, and a supply path, the supply path being a path configured to be opened and closed according to a state of a start switch of the vehicle. The driving control device is a device that controls a state of equipment installed in the vehicle and the auxiliary control device is a device that controls a state of the auxiliary power source. The driving control device is configured to execute a storage process, a permission signal transmission process, and an initial value process, and the auxiliary control device is configured to execute a permission signal reception process and a stop process.

Abstract: A control device for a vehicle includes a plurality of control circuits configured to control a control object by starting in response to powering-on of a vehicle and to perform power latch control for continuing to be supplied with electric power in a predetermined period in response to powering-off of the vehicle. Each of the control circuits is configured to perform starting after all of the control circuits have recognized the powering-on of the vehicle in a case where the vehicle is powered on while the power latch control is being performed after the vehicle has been powered off.

Abstract: A turning control device includes a precursor detection circuit configured to detect a precursor of an abnormality by which a smooth operation of a turning device is impaired. The precursor detection circuit is configured to start measurement of a total running time of a vehicle when the precursor is detected, and is configured to execute a process of reporting the precursor, based on the measured total running time. The precursor detection circuit is configured to perform the measurement of the total running time regardless of whether the precursor is detected again, when a vehicle electric power source is switched off and then is switched on again after the precursor is detected once.

Abstract: A steering control device includes a control circuit configured to control driving of a reaction force motor that generates steering reaction force applied to a steering wheel in which power transmission with turning wheels of a vehicle is separated. When a vehicle power source is turned on, the control circuit requests a vehicle control device to stop traveling of the vehicle when information is exchanged with the vehicle control device in a manner that does not follow a predetermined pattern.

Abstract: The present invention provides a working machine that makes it possible to alert its operator to cautions properly without obstructing the view of the operator. The working machine includes a cab for its operator to ride in, a projection device that projects image light to form an image of cautions to an operator who operates the working machine, a display unit that displays image light projected by the projection device, state detection element to detect a state of the working machine, and a controller that controls the projection device so that a manner of displaying the cautions on the display unit will change depending on the state of the working machine detected by the state detection element.

Abstract: According to one embodiment, a substrate processing method is disclosed. The method can include treating a substrate with a first liquid. The substrate has a structural body formed on a major surface of the substrate. The method can include forming a support member supporting the structural body by bringing a second liquid into contact with the substrate wetted by the first liquid, and changing at least a portion of the second liquid into a solid by carrying out at least one of causing the second liquid to react, reducing a quantity of a solvent included in the second liquid, and causing at least a portion of a substance dissolved in the second liquid to be separated. The method can include removing the support member by changing at least a part of the support member from a solid phase to a gaseous phase, without passing through a liquid phase.

Abstract: According to one embodiment, a substrate processing method is disclosed. The method can include treating a substrate with a first liquid. The substrate has a structural body formed on a major surface of the substrate. The method can include forming a support member supporting the structural body by bringing a second liquid into contact with the substrate wetted by the first liquid, and changing at least a portion of the second liquid into a solid by carrying out at least one of causing the second liquid to react, reducing a quantity of a solvent included in the second liquid, and causing at least a portion of a substance dissolved in the second liquid to be separated. The method can include removing the support member by changing at least a part of the support member from a solid phase to a gaseous phase, without passing through a liquid phase.

Abstract: According to one embodiment, a substrate treatment method of removing an upper end of a protrusion on a substrate is disclosed. An unevenness is formed on a surface of the substrate. The method can supply a first liquid on the surface of the substrate. The unevenness is formed on the surface. The method can form a protective layer. The protective layer covers the surface of the substrate from the first liquid supplied to the surface of the substrate. The method can supply a second liquid onto the protective layer. In addition the method can physically remove the protective layer which is on the upper end of the protrusion, and can bring the second liquid into contact with the upper end of the protrusion. The protective layer is removed from the upper end of the protrusion.

Abstract: The present invention provides a working machine that makes it possible to alert its operator to cautions properly without obstructing the view of the operator. The working machine includes a cab for its operator to ride in, a projection device that projects image light to form an image of cautions to an operator who operates the working machine, a display unit that displays image light projected by the projection device, state detection element to detect a state of the working machine, and a controller that controls the projection device so that a manner of displaying the cautions on the display unit will change depending on the state of the working machine detected by the state detection element.

Abstract: A memory controller includes: a memory access part which writes, to memory, an encrypted data acquired by encrypting information data, a first code for error detection based on the information data, and a second code for error detection based on the encrypted data and which reads the encrypted data, the first and second codes from the memory during a monitoring process being executed with a monitoring part; a decryption part for acquiring readout data by decrypting the encrypted data; and an error detection part which acquires a first error detection result by performing an error detection process on the readout data and the first code and a second error detection result by performing an error detection process on the encrypted data and the second code. The monitoring part stops the decryption part during the monitoring process and determines a deterioration level of memory based on the second error detection result.

Abstract: According to one embodiment, a substrate processing apparatus includes a processing chamber, a support part, a heater, and an optical member. In the processing chamber, air flows from the top to the bottom. The support part is located in the processing chamber to support a substrate having a surface to be treated. The heater is arranged so as not to be above the support part and emits light for heating. The optical member is arranged in the processing chamber so as not to be above the support part to guide the light emitted by the heater and having passed above the support part to the surface to be treated of the substrate supported by the support part.

Abstract: A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a water removing agent to the surface of the substrate W to promote replacement of the cleaning water on the surface of the substrate W with the volatile solvent.

Abstract: According to one embodiment, a substrate processing method is disclosed. The method can include treating a substrate with a first liquid. The substrate has a structural body formed on a major surface of the substrate. The method can include forming a support member supporting the structural body by bringing a second liquid into contact with the substrate wetted by the first liquid, and changing at least a portion of the second liquid into a solid by carrying out at least one of causing the second liquid to react, reducing a quantity of a solvent included in the second liquid, and causing at least a portion of a substance dissolved in the second liquid to be separated. The method can include removing the support member by changing at least a part of the support member from a solid phase to a gaseous phase, without passing through a liquid phase.

Abstract: According to one embodiment, a substrate processing apparatus (1) includes: a support (4) configured to support a substrate (W) in a plane; a rotation mechanism (5) configured to rotate the support (4) about an axis that crosses a surface of the substrate (W) supported by the support (4) as a rotation axis; a plurality of nozzles (6a, 6b, 6c), which are aligned from the center toward the periphery of the substrate (W) supported by the support (4), configured to eject a treatment liquid to the surface of the substrate (W) on the support (4) being rotated by the rotation mechanism (5), and a controller (9) configured to control the nozzles to eject the treatment liquid at different ejection timings according to the thickness of a film of the treatment liquid formed on the surface of the substrate (W) on the support (4) being rotated by the rotation mechanism (5).

Abstract: According to one embodiment, a substrate processing apparatus (1) includes a table (4) configured to support a substrate W, a solvent supply unit (8) configured to supply a volatile solvent to a surface of the substrate W on the table (4), and an irradiator (10) configured to emit light to the substrate W, which has been supplied with the volatile solvent, and function as a heater that heats the substrate W such that a gas layer is formed on the surface of the substrate W to make the volatile solvent into a liquid ball. Thus, it is possible to dry the substrate successfully as well as to suppress pattern collapse.

Abstract: A substrate processing device includes a suction drying section drying a surface of a substrate by absorbing and removing a liquid droplet of volatile solvent formed on the surface of the substrate by a heating operation of a heating section.

Abstract: A memory controller includes: a memory access part which writes, to memory, an encrypted data acquired by encrypting information data, a first code for error detection based on the information data, and a second code for error detection based on the encrypted data and which reads the encrypted data, the first and second codes from the memory during a monitoring process being executed with a monitoring part; a decryption part for acquiring readout data by decrypting the encrypted data; and an error detection part which acquires a first error detection result by performing an error detection process on the readout data and the first code and a second error detection result by performing an error detection process on the encrypted data and the second code. The monitoring part stops the decryption part during the monitoring process and determines a deterioration level of memory based on the second error detection result.

Abstract: According to the embodiment, a substrate treating device 10 for treating a semiconductor wafer W using an etchant L containing hydrofluoric acid and nitric acid includes a storage tank 210 that stores the etchant L; a concentration sensor 256 that measures a concentration of nitrous acid in the etchant L; an alcohol feeding line 280 that feeds IPA to the etchant L and maintains the concentration of nitrous acid to a predetermined value or more; and a substrate treating unit 100 that feeds the etchant L in the storage tank 210 to the semiconductor wafer W. The substrate treating device can improve the etching efficiency by efficiently generating nitrous acid, and thereby producing an etchant having a nitrous acid concentration suitable for etching.