Patents by Inventor Yukio Watanabe

Yukio Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9894743
    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: February 13, 2018
    Assignee: GIGAPHOTON INC.
    Inventors: Yukio Watanabe, Miwa Igarashi, Masato Moriya, Hiroaki Nakarai
  • Patent number: 9882334
    Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: January 30, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Toru Suzuki, Yukio Watanabe, Miwa Igarashi, Osamu Wakabayashi
  • Publication number: 20170327109
    Abstract: Motorcycles can become unstable when operating at high speeds and at high cornering levels. For example, they can exhibit an oscillation at the rear wheel commonly known as “weave.” A system and method is provided which utilizes a high-fidelity computer simulation model of a 2- or 3-wheel motorcycle to predict operating states such as yaw rate, lateral acceleration and roll angle for a stable motorcycle at a given speed and steer angle. The operating state of a physical motorcycle can be measured and compared to that of the model at every instant in time to determine if the operating state of the physical motorcycle differs from that of the simulation model in such a way as to indicate loss of stability. The nature of that difference can then be used to intervene in the operation of the motorcycle independent of driver actions by application of brakes, modulating the engine torque or applying torques to urge the steering system in a corrective direction.
    Type: Application
    Filed: May 11, 2017
    Publication date: November 16, 2017
    Inventors: Yukio WATANABE, Michael SAYERS
  • Publication number: 20170305006
    Abstract: In an impact tool, a vibration absorbing body is fitted on the outside of an outer periphery of an operating body, and the vibration absorbing body is interposed between the operating body and the cover body. The vibration absorbing body includes a tubular main body, and ring bodies attached to be fitted into recessed grooves formed on an inner peripheral surface and an outer peripheral surface of the tubular main body along the circumferential direction and elastically deformed to expand or contract the outside diameter. The ring bodies are maintained in a state where the ring bodies are elastically contracted in a freely expanding or contracting manner.
    Type: Application
    Filed: April 20, 2016
    Publication date: October 26, 2017
    Applicant: Apuren Co., Ltd.
    Inventors: Yukio WATANABE, Toshiyuki OKADA
  • Patent number: 9562992
    Abstract: Sensitivity is increased by enhancing the fluorescence collection efficiency while suppressing the increase in size of an objective lens. An objective lens 17 is structured to have a convex lens part 26 in a center portion and to have a truncated conical cylindrical body 27 around the convex lens part 26. Therefore, a fluorescence component b having too wide an emission angle to fit in the convex lens part 26, of fluorescence emitted from a sample 16, can be collected by total reflection on an outer peripheral surface 27b of the cylindrical body 27. Thus, even light having too wide an emission angle to be collected by a normal convex lens can be collected. As a result, it is possible to suppress the increase in size of the objective lens, to enhance the fluorescence collection efficiency, and to prevent the S/N ratio from being decreased by the existence of undetected fluorescence that is blocked by a prism 20. This can realize a fluorescence information reading device having high sensitivity.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: February 7, 2017
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yukio Watanabe
  • Publication number: 20160311104
    Abstract: A partially-removed ring body is arranged at the predetermined position facing the hammer in a stop position of the cylinder, and a part of the partially-removed ring body protrudes toward the inside of the cylinder. In addition, a recessed groove is formed in the position corresponding to the partially-removed ring body of the hammer at the stop position, and the recessed groove catches the partially-removed ring body, and thus the hammer is positioned at the stop position in the cylinder.
    Type: Application
    Filed: April 26, 2016
    Publication date: October 27, 2016
    Applicant: Apuren Co., Ltd.
    Inventors: Yukio WATANABE, Shuya ASANO
  • Publication number: 20160315439
    Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.
    Type: Application
    Filed: July 5, 2016
    Publication date: October 27, 2016
    Applicant: Gigaphoton Inc.
    Inventors: Toru SUZUKI, Yukio WATANABE, Miwa IGARASHI, Osamu WAKABAYASHI
  • Patent number: 9429847
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: August 30, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Toshihiro Nishisaka, Yukio Watanabe, Osamu Wakabayashi, Kouji Kakizaki, Michio Shinozaki
  • Patent number: 9398189
    Abstract: An image forming apparatus includes a processor including a CPU formed with a plurality of cores, the CPU performing processes, wherein a CPU core managing unit operates at least one predetermined core by a first control method involving relatively frequent process switching through task switching, and operates the other one or more cores than the at least one predetermined core by a second control method involving relatively less frequent process switching, and when a first process requiring communication with a device outside the processor and a second process not requiring communication with a device outside the processor are performed in parallel, the CPU core managing unit causes the at least one predetermined core to perform the first process, and causes the at least one predetermined core and the other one or more cores to perform the second process.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: July 19, 2016
    Assignee: KONICA MINOLTA, INC.
    Inventor: Yukio Watanabe
  • Publication number: 20160192469
    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
    Type: Application
    Filed: December 30, 2015
    Publication date: June 30, 2016
    Applicant: GIGAPHOTON INC.
    Inventors: Yukio WATANABE, Miwa IGARASHI, Masato MORIYA, Hiroaki NAKARAI
  • Publication number: 20160187787
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Application
    Filed: March 8, 2016
    Publication date: June 30, 2016
    Applicant: Gigaphoton Inc.
    Inventors: Toshihiro NISHISAKA, Yukio WATANABE, Osamu WAKABAYASHI, Kouji KAKIZAKI, Michio SHINOZAKI
  • Patent number: 9332625
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: May 3, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Toshihiro Nishisaka, Yukio Watanabe, Osamu Wakabayashi, Kouji Kakizaki, Michio Shinozaki
  • Patent number: 9301379
    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: March 29, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Yukio Watanabe, Miwa Igarashi, Masato Moriya, Hiroaki Nakarai
  • Publication number: 20160088183
    Abstract: An image forming apparatus includes a processor including a CPU formed with a plurality of cores, the CPU performing processes, wherein a CPU core managing unit operates at least one predetermined core by a first control method involving relatively frequent process switching through task switching, and operates the other one or more cores than the at least one predetermined core by a second control method involving relatively less frequent process switching, and when a first process requiring communication with a device outside the processor and a second process not requiring communication with a device outside the processor are performed in parallel, the CPU core managing unit causes the at least one predetermined core to perform the first process, and causes the at least one predetermined core and the other one or more cores to perform the second process.
    Type: Application
    Filed: September 17, 2015
    Publication date: March 24, 2016
    Applicant: KONICA MINOLTA, INC.
    Inventor: Yukio WATANABE
  • Patent number: 9229192
    Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: January 5, 2016
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Yukio Watanabe, Katsuhiko Wakana, Osamu Wakabayashi
  • Patent number: 9198273
    Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.
    Type: Grant
    Filed: July 23, 2014
    Date of Patent: November 24, 2015
    Assignee: GIGAPHOTON INC.
    Inventors: Miwa Igarashi, Yukio Watanabe, Kouji Ashikawa, Norio Iwai, Osamu Wakabayashi
  • Patent number: 9179534
    Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: November 3, 2015
    Assignee: Gigaphoton Inc.
    Inventors: Yukio Watanabe, Osamu Wakabayashi, Miwa Igarashi
  • Publication number: 20150292940
    Abstract: A photodetection apparatus includes an objective lens element (17) that collects light from a measurement object (16) and a photodetection element that detects the light collected by the objective lens element (17). The objective lens element (17) includes a center portion (28) that collects the light through refraction and a peripheral portion (29) located around the center portion (28) that collects the light through reflection. Thus, light at a large emission angle which may not be collected in a normal convex lens can also be collected, and thus collecting efficiency can be improved and the sensitivity of the photodetection element can be increased.
    Type: Application
    Filed: August 22, 2013
    Publication date: October 15, 2015
    Applicant: SHARP KABUSHIKI KAISHA
    Inventor: Yukio Watanabe
  • Publication number: 20150245457
    Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
    Type: Application
    Filed: May 8, 2015
    Publication date: August 27, 2015
    Inventors: Toshihiro NISHISAKA, Yukio WATANABE, Osamu WAKABAYASHI, Kouji KAKIZAKI, Michio SHINOZAKI
  • Publication number: 20150226935
    Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
    Type: Application
    Filed: April 27, 2015
    Publication date: August 13, 2015
    Inventors: Hiroshi SOMEYA, Yukio WATANABE, Katsuhiko WAKANA, Osamu WAKABAYASHI