Abstract: A method for detecting objects and labeling the objects with distances in an image includes steps of: obtaining a thermal image from a thermal camera, an RGB image from an RGB camera, and radar information from an mmWave radar; adjusting the thermal image based on the RGB image to generate an adjusted thermal image, and generating a fused image based on the RGB image and the adjusted thermal image; generating a second fused image based on the fused image and the radar information; detecting objects in the images, and generating, based on the fused image, another fused image including bounding boxes marking the objects; and determining motion parameters of the objects.

Abstract: Methods for removing haze defects from a photomask or reticle are disclosed. The photomask is placed into a chamber which includes a hydrogen atmosphere. The photomask is then exposed to radiation. The energy from the radiation, together with the hydrogen, causes decomposition of the haze defects. The methods can be practiced on-site and quickly, without the need for wet chemicals or the need to remove the pellicle before cleaning of the photomask. A device for conducting the methods is also disclosed herein.

Abstract: A method includes: providing a workpiece to a semiconductor apparatus, the workpiece including a material layer, wherein the material layer includes a first strip having a first plurality of exposure fields configured to be exposed in a first direction and a second plurality of exposure fields configured to be exposed in a second direction different from the first direction; scanning the first strip along a first scan route in the first direction to generate first topography measurement data; scanning the first strip along a second scan route in the second direction to generate second topography measurement data; and exposing the first plurality of exposure fields according to the first topography measurement data and exposing the second plurality of exposure fields according to the second topography measurement data.

Abstract: A photolithography exposure of a photoresist coating on a semiconductor wafer uses an optical projection system to form a latent image. The photolithography exposure further uses a mask with a set of multiple pattern focus (MPF) marks. Each MPF mark of includes features having different critical dimension (CD) sizes. The latent image is developed to form a developed photoresist pattern. Dimension sizes are measured of features of the developed photoresist pattern corresponding to the features of the MPF marks having different CD sizes. A spatial focus map of the photolithography exposure is constructed based on the measured dimension sizes. To determine the focal distance at an MPF mark, ratios or differences may be determined between the measured dimension sizes corresponding to the features of the MPF marks having different CD sizes, and the focal distance at the location of the MFP mark constructed based on the determined ratios or differences.

Abstract: A method includes: providing a workpiece to a semiconductor apparatus, the workpiece comprising a material layer, wherein the material layer includes a plurality of areas extending along a first axis; scanning the workpiece in a first direction along the first axis to generate first topography measurement data; scanning the workpiece in a second direction along the first axis to generate second topography measurement data; and performing an exposure operation on the material layer according to the first topography measurement data and the second topography measurement data.

Abstract: A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.

Abstract: Disclosed herein are systems, methods, and software for implementing enhanced menu presentation technology. In at least one implementation, a user interface to a personal information service is presented by a suitable computing system. The user interface includes a viewing pane and an information panel in which various personal information items may be organized. In response to a selection of any of the personal information items for viewing, content associated with the item is presented in the viewing pane. In addition, in response to an identification of an action group that includes multiple ones of the personal information items, an action menu is presented in at least a portion of a space in the user interface occupied by the viewing pane.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

Abstract: Techniques for providing an in-place contextual menu and user interface for email and other information management system triage are provided in which a contextual menu can be overlaid or replace an item on a view screen. The contextual menu can provide action commands specific to the type and state of the items selected in the feature view of the email or other information management system. A single recognized selection input, such as a swipe gesture, selects an item and invokes an in-place contextual menu presenting actions that can be asserted on the selected item. Multiple item selection is available through the same invocation of presenting the in-place contextual menu.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.

Abstract: The present disclosure relates to a method of semiconductor processing. The method includes, receiving a first wafer having a photoresist coating on a face of the first wafer. An exposure unit is used to perform a first number of radiation exposures on the photoresist coating, thereby forming an exposed photoresist coating. The exposed photoresist coating is developed, thereby forming a developed photoresist coating. An OVL measurement zone pattern is selected from a number of different, pre-determined OVL measurement zone patterns based on at least one of: the first number of radiation exposures performed on the first wafer or a previous number of radiation exposures performed on a previously processed wafer, which was processed before the first wafer. A number of OVL measurements are performed on the developed photoresist coating within the selected OVL measurement zone pattern.

Abstract: Techniques for providing an in-place contextual menu and user interface for email and other information management system triage are provided in which a contextual menu can be overlaid or replace an item on a view screen. The contextual menu can provide action commands specific to the type and state of the items selected in the feature view of the email or other information management system. A single recognized selection input, such as a swipe gesture, selects an item and invokes an in-place contextual menu presenting actions that can be asserted on the selected item. Multiple item selection is available through the same invocation of presenting the in-place contextual menu.

Abstract: Techniques for providing an in-place contextual menu and user interface for email and other information management system triage are provided in which a contextual menu can be overlaid or replace an item on a view screen. The contextual menu can provide action commands specific to the type and state of the items selected in the feature view of the email or other information management system. A single recognized selection input, such as a swipe gesture, selects an item and invokes an in-place contextual menu presenting actions that can be asserted on the selected item. Multiple item selection is available through the same invocation of presenting the in-place contextual menu.

Abstract: Disclosed herein are systems, methods, and software for implementing enhanced menu presentation technology. In at least one implementation, a user interface to a personal information service is presented by a suitable computing system. The user interface includes a viewing pane and an information panel in which various personal information items may be organized. In response to a selection of any of the personal information items for viewing, content associated with the item is presented in the viewing pane. In addition, in response to an identification of an action group that includes multiple ones of the personal information items, an action menu is presented in at least a portion of a space in the user interface occupied by the viewing pane.

Abstract: The present disclosure relates to a method of semiconductor processing. The method includes, receiving a first wafer having a photoresist coating on a face of the first wafer. An exposure unit is used to perform a first number of radiation exposures on the photoresist coating, thereby forming an exposed photoresist coating. The exposed photoresist coating is developed, thereby forming a developed photoresist coating. An OVL measurement zone pattern is selected from a number of different, pre-determined OVL measurement zone patterns based on at least one of: the first number of radiation exposures performed on the first wafer or a previous number of radiation exposures performed on a previously processed wafer, which was processed before the first wafer. A number of OVL measurements are performed on the developed photoresist coating within the selected OVL measurement zone pattern.

Abstract: A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes receiving a mask having a plurality of sub-reticles and a substrate having one or more regions. A first sub-reticle of the plurality of sub-reticles is aligned with a first region of the one or more regions. A movement pattern is designated relative to the substrate. A first photolithographic process is performed including exposing the substrate using the mask to form a first exposed area on the substrate. An alignment of the mask relative to the substrate is shifted according to a first direction determined by the movement pattern. A second photolithographic process is performed including exposing the substrate using the mask to form a second exposed area on the substrate such that the second exposed area overlaps the first.

Abstract: Disclosed herein are systems, methods, and software for implementing enhanced menu presentation technology. In at least one implementation, a user interface to a personal information service is presented by a suitable computing system. The user interface includes a viewing pane and an information panel in which various personal information items may be organized. In response to a selection of any of the personal information items for viewing, content associated with the item is presented in the viewing pane. In addition, in response to an identification of an action group that includes multiple ones of the personal information items, an action menu is presented in at least a portion of a space in the user interface occupied by the viewing pane.