Patents by Inventor Yung-Feng Chang
Yung-Feng Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220414309Abstract: A method that includes receiving an integrated circuit (IC) design layout including a layout block, where the layout block has a corner, adding first patterns along a first edge of the corner, adding second patterns along a second edge of the corner, moving a first column of the first patterns closest to the second edge horizontally toward the second edge, moving a second column of second patterns closest to the second edge horizontally toward the second edge, extending lengths of the first and second patterns in the first and second columns, and outputting a pattern layout in a computer-readable format, where the pattern layout includes the first patterns and the second patterns.Type: ApplicationFiled: December 30, 2021Publication date: December 29, 2022Inventors: Yung Feng Chang, Pi-Yun Sun, Tung-Heng Hsieh, Yu-Jung Chang, Bao-Ru Young
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Publication number: 20220406900Abstract: A method includes forming first and second semiconductor fins protruding from a substrate. Each of the first and second semiconductor fins includes a stack of alternating channel layers and non-channel layers. The method also includes forming a dielectric helmet between and protruding from the first and the second semiconductor fins, forming a dummy gate stack over the dielectric helmet, patterning the dummy gate stack to expose a portion of the dielectric helmet, removing the exposed portion of the dielectric helmet, and forming a metal gate structure, such that a remaining portion of the dielectric helmet separates the metal gate structure between the first and the second semiconductor fins. The method also includes forming a contact feature over a portion of the metal gate structure. A sidewall of the contact feature is between one of the semiconductor fins and the remaining portion of the dielectric helmet.Type: ApplicationFiled: February 25, 2022Publication date: December 22, 2022Inventors: Shao-Jyun Wu, Yung Feng Chang, Tung-Heng Hsieh, Bao-Ru Young
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Patent number: 11532607Abstract: Electrostatic discharge (ESD) structures are provided. An ESD structure includes a semiconductor substrate, a first epitaxy region with a first type of conductivity over the semiconductor substrate, a second epitaxy region with a second type of conductivity over the semiconductor substrate, and a plurality of first semiconductor layers and a plurality of second semiconductor layers. The first semiconductor layers and the second semiconductor layers are alternatingly stacked over the semiconductor substrate and between the first and second epitaxy regions. Each of the first and second semiconductor layers has a first side contacting the first epitaxy region and a second side contacting the second epitaxy region, and the first side is opposite the second side.Type: GrantFiled: August 19, 2020Date of Patent: December 20, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chun-Chia Hsu, Tung-Heng Hsieh, Yung-Feng Chang, Bao-Ru Young, Jam-Wem Lee, Chih-Hung Wang
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Patent number: 11527527Abstract: Provided is a tap cell including a substrate, a first well, a second well, a first doped region, and the second doped region. The substrate has a first region and a second region. The first well has a first dopant type and includes a first portion disposed in the first region and a second portion extending into the second region. The second well has a second dopant type and includes a third portion disposed in the second region and a fourth portion extending into the first region. The first doped region having the first dopant type is disposed in the second portion of the first well and the third portion of the second well along the second region. The second doped region having the second dopant type is disposed in the first portion of the first well and the fourth portion of the second well along the first region.Type: GrantFiled: May 21, 2020Date of Patent: December 13, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yung-Feng Chang, Bao-Ru Young, Tung-Heng Hsieh, Chun-Chia Hsu
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Publication number: 20220384416Abstract: An array of poly lines on an active device area of an integrated chip is extended to form a dummy device structure on an adjacent isolation region. The resulting dummy device structure is an array of poly lines having the same line width, line spacing, and pitch as the array of poly lines on the active device area. The poly lines of the dummy device structure are on grid with the poly lines on the active device area. Because the dummy device structure is formed of poly lines that are on grid with the poly lines on the active device area, the dummy device structure may be much closer to the active device area than would otherwise be possible. The resulting proximity of the dummy device structure to the active device area improves anti-dishing performance and reduces empty space on the integrated chip.Type: ApplicationFiled: August 5, 2022Publication date: December 1, 2022Inventors: Yung Feng Chang, Bao-Ru Young, Yu-Jung Chang, Tzung-Chi Lee, Tung-Heng Hsieh, Chun-Chia Hsu
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Patent number: 11507725Abstract: Various examples of integrated circuit layouts with line-end extensions are disclosed herein. In an example, a method includes receiving an integrated circuit layout that contains: a first and second set of shapes extending in parallel in a first direction, wherein a pitch of the first set of shapes is different from a pitch of the second set of shapes. A cross-member shape is inserted into the integrated circuit layout that extends in a second direction perpendicular to the first direction, and a set of line-end extensions is inserted into the integrated circuit layout that extend from each shape of the first set of shapes and the second set of shapes to the cross-member shape. The integrated circuit layout containing the first set of shapes, the second set of shapes, the cross-member shape, and the set of line-end extensions is provided for fabricating an integrated circuit.Type: GrantFiled: March 8, 2021Date of Patent: November 22, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Hsien-Huang Liao, Tung-Heng Hsieh, Bao-Ru Young, Yung Feng Chang
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Publication number: 20220367441Abstract: A semiconductor structure includes a substrate having a first well of a first conductivity type and a second well of a second conductivity type. From a top view, the first well includes first and seconds edges extending along a first direction. The second edge has multiple turns, resulting in the first well having a protruding section and a recessed section. The semiconductor structure further includes a first source/drain feature over the protruding section and a second source/drain feature over a main body of the first well. The first source/drain feature is of the first conductivity type. The second source/drain feature is of the second conductivity type. The first and the second source/drain features are generally aligned along a second direction perpendicular to the first direction from the top view.Type: ApplicationFiled: July 29, 2022Publication date: November 17, 2022Inventors: Yung Feng Chang, Chun-Chia Hsu, Tung-Heng Hsieh, Bao-Ru Young
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Patent number: 11482518Abstract: A semiconductor structure includes a substrate having first and second wells of first and second conductivity types respectively. From a top view, the first and second wells extend lengthwise along a first direction, the first and second wells each includes a protruding section that protrudes along a second direction perpendicular to the first direction and a recessed section that recedes along the second direction. The protruding section of the first well fits into the recessed section of the second well, and vice versa. The semiconductor structure further includes first source/drain features over the protruding section of the first well; second source/drain features over the second well; third source/drain features over the protruding section of the second well; and fourth source/drain features over the first well. The first and second source/drain features are of the first conductivity type. The third and fourth source/drain features are of the second conductivity type.Type: GrantFiled: March 26, 2021Date of Patent: October 25, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yung Feng Chang, Chun-Chia Hsu, Tung-Heng Hsieh, Bao-Ru Young
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Publication number: 20220310583Abstract: A semiconductor structure includes a substrate having first and second wells of first and second conductivity types respectively. From a top view, the first and second wells extend lengthwise along a first direction, the first and second wells each includes a protruding section that protrudes along a second direction perpendicular to the first direction and a recessed section that recedes along the second direction. The protruding section of the first well fits into the recessed section of the second well, and vice versa. The semiconductor structure further includes first source/drain features over the protruding section of the first well; second source/drain features over the second well; third source/drain features over the protruding section of the second well; and fourth source/drain features over the first well. The first and second source/drain features are of the first conductivity type. The third and fourth source/drain features are of the second conductivity type.Type: ApplicationFiled: March 26, 2021Publication date: September 29, 2022Inventors: Yung Feng Chang, Chun-Chia Hsu, Tung-Heng Hsieh, Bao-Ru Young
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Publication number: 20220278093Abstract: A semiconductor device includes a substrate. A first nanosheet structure and a second nanosheet structure are disposed on the substrate. Each of the first and second nanosheet structures have at least one nanosheet forming source/drain regions and a gate structure including a conductive gate contact. A first oxide structure is disposed on the substrate between the first and second nanosheet structures. A conductive terminal is disposed in or on the first oxide structure. The conductive terminal, the first oxide structure and the gate structure of the first nanosheet structure define a capacitor.Type: ApplicationFiled: December 10, 2021Publication date: September 1, 2022Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chung-Hui CHEN, Wan-Te CHEN, Shu-Wei CHUNG, Tung-Heng HSIEH, Tzu-Ching CHANG, Tsung-Hsin YU, Yung Feng CHANG
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Publication number: 20220059524Abstract: Electrostatic discharge (ESD) structures are provided. An ESD structure includes a semiconductor substrate, a first epitaxy region with a first type of conductivity over the semiconductor substrate, a second epitaxy region with a second type of conductivity over the semiconductor substrate, and a plurality of first semiconductor layers and a plurality of second semiconductor layers. The first semiconductor layers and the second semiconductor layers are alternatingly stacked over the semiconductor substrate and between the first and second epitaxy regions. Each of the first and second semiconductor layers has a first side contacting the first epitaxy region and a second side contacting the second epitaxy region, and the first side is opposite the second side.Type: ApplicationFiled: August 19, 2020Publication date: February 24, 2022Inventors: Chun-Chia HSU, Tung-Heng HSIEH, Yung-Feng CHANG, Bao-Ru YOUNG, Jam-Wem LEE, Chih-Hung WANG
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Publication number: 20210366895Abstract: Provided is a tap cell including a substrate, a first well, a second well, a first doped region, and the second doped region. The substrate has a first region and a second region. The first well has a first dopant type and includes a first portion disposed in the first region and a second portion extending into the second region. The second well has a second dopant type and includes a third portion disposed in the second region and a fourth portion extending into the first region. The first doped region having the first dopant type is disposed in the second portion of the first well and the third portion of the second well along the second region. The second doped region having the second dopant type is disposed in the first portion of the first well and the fourth portion of the second well along the first region.Type: ApplicationFiled: May 21, 2020Publication date: November 25, 2021Applicant: Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TAIWANInventors: Yung-Feng Chang, Bao-Ru Young, Tung-Heng Hsieh, Chun-Chia Hsu
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Patent number: 11177382Abstract: A method and structure for mitigating strain loss (e.g., in a FinFET channel) includes providing a semiconductor device having a substrate having a substrate fin portion, an active fin region formed over a first part of the substrate fin portion, a pickup region formed over a second part of the substrate fin portion, and an anchor formed over a third part of the substrate fin portion. In some embodiments, the substrate fin portion includes a first material, and the active fin region includes a second material different than the first material. In various examples, the anchor is disposed between and adjacent to each of the active fin region and the pickup region.Type: GrantFiled: December 24, 2019Date of Patent: November 16, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Sheng-Hsiung Wang, Yung Feng Chang, Tung-Heng Hsieh
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Publication number: 20210257351Abstract: An array of poly lines on an active device area of an integrated chip is extended to form a dummy device structure on an adjacent isolation region. The resulting dummy device structure is an array of poly lines having the same line width, line spacing, and pitch as the array of poly lines on the active device area. The poly lines of the dummy device structure are on grid with the poly lines on the active device area. Because the dummy device structure is formed of poly lines that are on grid with the poly lines on the active device area, the dummy device structure may be much closer to the active device area than would otherwise be possible. The resulting proximity of the dummy device structure to the active device area improves anti-dishing performance and reduces empty space on the integrated chip.Type: ApplicationFiled: June 16, 2020Publication date: August 19, 2021Inventors: Yung Feng Chang, Bao-Ru Young, Yu-Jung Chang, Tzung-Chi Lee, Tung-Heng Hsieh, Chun-Chia Hsu
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Publication number: 20210192121Abstract: Various examples of integrated circuit layouts with line-end extensions are disclosed herein. In an example, a method includes receiving an integrated circuit layout that contains: a first and second set of shapes extending in parallel in a first direction, wherein a pitch of the first set of shapes is different from a pitch of the second set of shapes. A cross-member shape is inserted into the integrated circuit layout that extends in a second direction perpendicular to the first direction, and a set of line-end extensions is inserted into the integrated circuit layout that extend from each shape of the first set of shapes and the second set of shapes to the cross-member shape. The integrated circuit layout containing the first set of shapes, the second set of shapes, the cross-member shape, and the set of line-end extensions is provided for fabricating an integrated circuit.Type: ApplicationFiled: March 8, 2021Publication date: June 24, 2021Inventors: Hsien-Huang Liao, Tung-Heng Hsieh, Bao-Ru Young, Yung Feng Chang
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Patent number: 11004842Abstract: A mandrel is formed over an active region that includes a first region and a second region. The first region and the second region are reserved for the formation of a source and a drain of a FinFET, respectively. A portion of the mandrel formed over the second region is broken up into a first segment and a second segment separated from the first segment by a gap. Spacers are formed on opposite sides of the mandrel. Using the spacers, fins are defined. The fins protrude upwardly out of the active region. A portion of the second region corresponding to the gap has no fins formed thereover. The source is epitaxially grown on the fins in the first region. At least a portion of the drain is epitaxially grown on the portion of the second region having no fins.Type: GrantFiled: October 21, 2019Date of Patent: May 11, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tzung-Chi Lee, Tung-Heng Hsieh, Bao-Ru Young, Yung Feng Chang
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Patent number: 10943054Abstract: Various examples of integrated circuit layouts with line-end extensions are disclosed herein. In an example, a method includes receiving an integrated circuit layout that contains: a first and second set of shapes extending in parallel in a first direction, wherein a pitch of the first set of shapes is different from a pitch of the second set of shapes. A cross-member shape is inserted into the integrated circuit layout that extends in a second direction perpendicular to the first direction, and a set of line-end extensions is inserted into the integrated circuit layout that extend from each shape of the first set of shapes and the second set of shapes to the cross-member shape. The integrated circuit layout containing the first set of shapes, the second set of shapes, the cross-member shape, and the set of line-end extensions is provided for fabricating an integrated circuit.Type: GrantFiled: November 18, 2019Date of Patent: March 9, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Hsien-Huang Liao, Tung-Heng Hsieh, Bao-Ru Young, Yung Feng Chang
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Patent number: 10803227Abstract: Various examples of integrated circuit layouts with line-end extensions are disclosed herein. In an example, a method includes receiving an integrated circuit layout that contains: a first and second set of shapes extending in parallel in a first direction, wherein a pitch of the first set of shapes is different from a pitch of the second set of shapes. A cross-member shape is inserted into the integrated circuit layout that extends in a second direction perpendicular to the first direction, and a set of line-end extensions is inserted into the integrated circuit layout that extend from each shape of the first set of shapes and the second set of shapes to the cross-member shape. The integrated circuit layout containing the first set of shapes, the second set of shapes, the cross-member shape, and the set of line-end extensions is provided for fabricating an integrated circuit.Type: GrantFiled: August 29, 2017Date of Patent: October 13, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Hsien-Huang Liao, Tung-Heng Hsieh, Bao-Ru Young, Yung Feng Chang
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Publication number: 20200135924Abstract: A method and structure for mitigating strain loss (e.g., in a FinFET channel) includes providing a semiconductor device having a substrate having a substrate fin portion, an active fin region formed over a first part of the substrate fin portion, a pickup region formed over a second part of the substrate fin portion, and an anchor formed over a third part of the substrate fin portion. In some embodiments, the substrate fin portion includes a first material, and the active fin region includes a second material different than the first material. In various examples, the anchor is disposed between and adjacent to each of the active fin region and the pickup region.Type: ApplicationFiled: December 24, 2019Publication date: April 30, 2020Inventors: Sheng-Hsiung WANG, Yung Feng CHANG, Tung-Heng HSIEH
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Publication number: 20200082055Abstract: Various examples of integrated circuit layouts with line-end extensions are disclosed herein. In an example, a method includes receiving an integrated circuit layout that contains: a first and second set of shapes extending in parallel in a first direction, wherein a pitch of the first set of shapes is different from a pitch of the second set of shapes. A cross-member shape is inserted into the integrated circuit layout that extends in a second direction perpendicular to the first direction, and a set of line-end extensions is inserted into the integrated circuit layout that extend from each shape of the first set of shapes and the second set of shapes to the cross-member shape. The integrated circuit layout containing the first set of shapes, the second set of shapes, the cross-member shape, and the set of line-end extensions is provided for fabricating an integrated circuit.Type: ApplicationFiled: November 18, 2019Publication date: March 12, 2020Inventors: Hsien-Huang Liao, Tung-Heng Hsieh, Bao-Ru Young, Yung Feng Chang