Abstract: A defect inspection device includes: an illumination optical system including a polarization element configured to switch polarization of irradiation light between first polarization and second polarization orthogonal to the first polarization; a polarization diffraction grating configured to emit diffraction light of a specific order of the irradiation light in a direction along a normal line of a sample stage surface, a diffraction efficiency of the specific order of the first polarization of the irradiation light is equal to or less than 20% of a diffraction efficiency of the specific order of the second polarization, the polarization diffraction grating being settable at a light collection position of the irradiation light on the sample stage surface and including an anisotropic pattern whose period is equal to or less than twice a wavelength of the irradiation light; a detection optical system.

Abstract: A defect inspection device in which an optical axis of a detection optical system is inclined with respect to a surface of a sample, and an imaging sensor is inclined with respect to the optical axis, a height variation amount of an illumination spot in a normal direction of the surface of the sample is calculated based on an output of a height measuring unit, a deviation amount of the focusing position with respect to the light receiving surface in an optical axis direction of the detection optical system is calculated based on the height variation amount of the illumination spot, the deviation amount of the focusing position being generated accompanying a height variation of the illumination spot, and the focus actuator is controlled based on the deviation amount of the focusing position, and scattered light intensities at the same coordinates of the sample are added.

Abstract: A communication device capable of communicating with an external device in accordance with states of an operator and a movable apparatus includes: a riding determination unit configured to determine whether an operator is riding a movable apparatus; and a communication unit configured to transmit a message including attribute information indicating the movable apparatus to another device when the riding determination unit determines that the operator is in a first state in which the operator is riding the movable apparatus, and to transmit a message including attribute information indicating a pedestrian to the other device when the riding determination unit determines that the operator is in a second state in which the operator is not riding the movable apparatus and is operating the movable apparatus.

Abstract: An image processing apparatus capable of reducing the influence of a distance variation includes a boundary detection unit configured to detect a boundary in each divisional region obtained by dividing image information into a plurality of divisional regions on the basis of color information of each pixel of the image information, and a combined distance information determination unit configured to determine combined distance information for each sub-region separated by the boundary in the divisional region on the basis of distance information of each pixel of the image information.

Abstract: A defect inspection apparatus includes an illumination unit configured to irradiate a surface of a sample with a linear illumination spot; a condensing detection unit configured to condense reflected light of the illumination spot and to control a polarization state of the incident light to form an optical image; and a sensor unit configured to output the optical image and including an array-shaped light receiving portion and an antireflection film at a position conjugate with the illumination spot, in which the condensing detection unit includes a polarization control unit configured to increase light incident efficiency to the sensor unit. The normal line of the light receiving surface of the sensor unit is inclined from the optical axis of the condensing detection unit by 10 degrees or more and less than 80 degrees. The light condensing detection unit increases the optical magnification in the lateral direction of the illumination spot.

Abstract: A distance measuring device includes a light emitting unit that outputs a measurement light, a first polarization state control unit that controls a polarization state of the measurement light output from the light emitting unit, a second polarization state control unit that controls the polarization state of the measurement light of which a polarization state is controlled by the first polarization state control unit, and an optical path switching element that selects an emission direction of the measurement light of which a polarization state is controlled by the second polarization state control unit, in which the second polarization state control unit controls the polarization state of the measurement light so that the measurement lights are emitted from the optical path switching element in a plurality of the emission directions, and the optical path switching element receives a reflected light obtained by reflecting the emitted measurement light by an object.

Abstract: An information processing device includes one or more memories and one or more processors. The one or more processors and the one or more memories are configured to receive control information and data that contains three-dimensional position information generated by a three-dimensional range sensor and convert, based on the received control information, the three-dimensional position information contained in the data received from the three-dimensional range sensor into two-dimensional image data containing information on a distance from a predetermined viewpoint.

Abstract: A defect inspection device includes an illumination unit that irradiates a sample with a linear illumination spot; a condensing detection unit that condenses reflected light of the illumination spot from the sample; and a sensor unit that forms an optical image on a light reception surface, and outputs the optical image as an electrical signal. An angle ? formed between an optical axis of the condensing detection unit and a longitudinal direction of the linear illumination spot is 10° or more and less than 80°. The sensor unit is a line sensor provided with an array-like light reception unit at a position conjugate with the illumination spot. An angle ? formed between direction of the line sensor and the optical axis of the condensing detection unit is 10° or more and less than 80°, and has a difference from the angle ? of 5° or more.

Abstract: A defect detection device including an illumination optical system, an image capturing optical system configured to capture an image of scattered light generated by the illumination optical system irradiating the wafer, and an image processing unit configured to process a picture of the image of the scattered light to extract a defect on the wafer. The image capturing optical system includes an objective lens, a filter unit configured to shield a part of light transmitted through the objective lens, and an imaging lens configured to form an image of light transmitted through the filter unit. The filter unit includes a first microlens array configured to condense parallel light transmitted through the objective lens, a shutter array including a light transmission unit at a focus position of the first microlens array, and a second microlens array disposed opposite to the first microlens array with respect to the shutter array.

Abstract: An inspection device includes an illumination optical system that irradiates a sample to be inspected with light having a predetermined wavelength, a detection optical system that includes a photoelectric conversion unit, collects reflected light or scattered light from the sample irradiated with the light, and guides the collected reflected or scattered light to the photoelectric conversion unit, and a data processing unit that extracts positional information of a foreign substance or a defect on the sample by processing an output signal from the photoelectric conversion unit that detects the reflected light or scattered light. The light collection optical system includes a polarized light transmission control unit that changes transmission characteristics according to polarization characteristics of the collected reflected light or scattered light.

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

Abstract: As a technique to improve processing efficiency of defect inspection by quickly adjusting a position of a detection system, provided is a defect inspection apparatus including: a stage that moves with a sample and a pattern substrate placed thereon; an illumination optical system that irradiates an object on the stage from a direction inclined from the normal direction of the pattern substrate; a first detection optical system that detects scattered light in the normal direction; a second detection optical system that detects scattered light in a direction different from the scattered light detected by the first detection optical system; a signal processing unit that processes both scattered light signals; and a control unit.

Abstract: In a defect inspection device that irradiates a surface of a sample or a surface of a pattern chip with an illumination light shaped to extend in a first direction, and detects a scattered light generated from the surface of the sample or the surface of the pattern chip by the illumination light to detect a defect on the surface of the sample, the pattern chip has a dot pattern area in which multiple dots are arrayed in multiple rows and multiple columns, a minimum interval between the dots corresponding to the lines aligned in the first direction among the multiple dots arrayed in the dot pattern area in a second direction orthogonal to the first direction is smaller than a width of the illumination light, and a minimum interval between the multiple dots arrayed in the dot pattern area is larger than a resolution of the detection optical system.

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

Abstract: Detection can be performed even for a thick inspection target object through time delay integration without degradation of spatial resolution. There is provided an X-ray inspection device configured to include: an X-ray source that generates X-rays; a transport unit that performs transporting a sample; a detecting unit that has a time delay integration type detector which detects X-rays generated by the X-ray source and transmitted through the sample transported by the transport unit; and a defect determining unit that processes a signal obtained by detecting the X-rays transmitted through the sample by the time delay integration type detector of the detecting unit and determines a defect in the sample. The transport unit performs transporting the sample while causing the sample to rotate in synchronization with the transporting when the sample passes in front of the time delay integration type detector of the detecting unit.

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

Abstract: As a technique to improve processing efficiency of defect inspection by quickly adjusting a position of a detection system, provided is a defect inspection apparatus including: a stage that moves with a sample and a pattern substrate placed thereon; an illumination optical system that irradiates an object on the stage from a direction inclined from the normal direction of the pattern substrate; a first detection optical system that detects scattered light in the normal direction; a second detection optical system that detects scattered light in a direction different from the scattered light detected by the first detection optical system; a signal processing unit that processes both scattered light signals; and a control unit.

Abstract: A projection control apparatus that controls projection using a plurality of projection devices that project optical images onto a projection plane. The projection control apparatus obtains a projected area of each of the plurality of projection devices on the basis of an image obtained by capturing the projection plane. The projection control apparatus then executes a first adjustment process of adjusting the projected area of each projection device so as to cause the projected areas of other projection devices, among the plurality of projection devices, that are not a reference projection device, to correspond to the projected area of the reference projection device. The projection control apparatus cancels geometric correction applied in the other projection devices before starting the first adjustment process and does not cancel geometric correction applied in the reference projection device before starting the first adjustment process.

Abstract: A distance measuring device includes a light emitting unit that outputs a measurement light, a first polarization state control unit that controls a polarization state of the measurement light output from the light emitting unit, a second polarization state control unit that controls the polarization state of the measurement light of which a polarization state is controlled by the first polarization state control unit, and an optical path switching element that selects an emission direction of the measurement light of which a polarization state is controlled by the second polarization state control unit, in which the second polarization state control unit controls the polarization state of the measurement light so that the measurement lights are emitted from the optical path switching element in a plurality of the emission directions, and the optical path switching element receives a reflected light obtained by reflecting the emitted measurement light by an object.