Abstract: A semiconductor device includes: a first substrate; a gate electrode on the first substrate; a gate insulating layer on the gate electrode; an oxide semiconductor film including a channel region disposed over the gate electrode through the gate insulating layer and lowered-resistance region contacting the channel region; a source electrode and a drain electrode on the channel region; a first insulating film covering at least the channel region and including a contact hole that exposes the lowered-resistance region; and a second insulating film having reducing characteristics and disposed above the first insulating film across the contact hole, the second insulating film contacting the lowered-resistance region inside the contact hole.

Abstract: A semiconductor device includes a first conductive film, an insulating film, a second conductive film, and a semiconductor film. The insulating film is formed above the first conductive film such that the first conductive film includes an exposed portion that is exposed. The second conductive film is formed above the insulating film such that sides of the second conductive film are close to the exposed portion of the first conductive film. The semiconductor film includes a channel region for electrically connecting the second conductive film to the first conductive film via the channel region. The semiconductor film is formed above the second conductive film and across the exposed portion of the first conductive film from at least one side to another.

Abstract: A semiconductor device includes a substrate, a first thin film transistor supported on the substrate and having a first active layer that primarily contains a first oxide semiconductor, and second thin film transistor supported on the substrate and having a second active layer that primarily contains a second oxide semiconductor with a higher mobility than the first oxide semiconductor. The first active layer and the second active layer are positioned on the same insulating layer and contact the same insulating layer.

Abstract: A TFT substrate (100A) of a liquid crystal display panel includes: an organic interlayer insulating layer (24) covering a TFT; a first transparent electrically-conductive layer (25) provided in the first region of a surface of the organic interlayer insulating layer (24); and an inorganic dielectric layer (26) covering the first transparent electrically-conductive layer (25) and provided in a second region of the surface of the organic interlayer insulating layer (24) which is different from the first region, the inorganic dielectric layer (26) containing SiN, wherein an arithmetic mean roughness Ra of the first region and the second region of the surface of the organic interlayer insulating layer (24) is not less than 3.45 nm and not more than 5.20 nm.

Abstract: The EL substrate includes semiconductor layers of TFTs, a pixel electrode, and an upper part electrode of a Cs section which are provided on a gate insulating film. The semiconductor layers are covered with a protective film which has openings via which the pixel electrode and the upper part electrode are exposed. The semiconductor layers are an oxide semiconductor layer, and the pixel electrode and the upper part electrode are reduction electrodes of the oxide semiconductor layer.

Abstract: A semiconductor device (100) includes, on a substrate, a plurality of oxide semiconductor TFTs including a first gate electrode (12), a first insulating layer (20) which is in contact with the first gate electrode, an oxide semiconductor layer (16) arranged so as to oppose the first gate electrode via the first insulating layer, and a source electrode (14) and a drain electrode (15) which are connected with the oxide semiconductor layer, and an organic insulating layer (24) covering only some of the plurality of oxide semiconductor TFTs, wherein the plurality of oxide semiconductor TFTs include a first TFT (5A) which is covered with the organic insulating layer and a second TFT (5B) which is not covered with the organic insulating layer, and the second TFT includes a second gate electrode (17) arranged so as to oppose the oxide semiconductor layer via a second insulating layer (22), when viewed in a direction normal to the substrate, the second gate electrode (17) being arranged so as to overlap with at least

Abstract: A semiconductor device (100) includes a substrate (11), a first TFT (10), and a second TFT (20). The first TFT includes a first semiconductor layer (12) that is supported by the substrate, a first gate electrode (14) that is formed on the first semiconductor layer and overlaps with the first semiconductor layer with a first gate insulating layer (13) interposed therebetween, a first insulating layer (16) that covers the first gate electrode, and a first source electrode (17s) and a first drain electrode (17d) that are formed on the first insulating layer and are connected to the first semiconductor layer.

Abstract: At the time of partial drive, the levels of voltages applied to data lines SL1 to SLn are switched according to a rewrite frequency set for each region of a display screen. For example, in a still-image display region with a relatively low rewrite frequency, the levels of the voltages applied to the data lines SL1 to SLn are set to be higher than those for a moving-image display region with a relatively high rewrite frequency. By this, the same effect as that obtained when a counter voltage is switched according to the rewrite frequency can be obtained. Thus, flicker occurring in each region of the display screen can be suppressed.

Abstract: A TFT substrate (100A) of a liquid crystal display panel includes: an organic interlayer insulating layer (24) covering a TFT; a first transparent electrically-conductive layer (25) provided in the first region of a surface of the organic interlayer insulating layer (24); and an inorganic dielectric layer (26) covering the first transparent electrically-conductive layer (25) and provided in a second region of the surface of the organic interlayer insulating layer (24) which is different from the first region, the inorganic dielectric layer (26) containing SiN, wherein an arithmetic mean roughness Ra of the first region and the second region of the surface of the organic interlayer insulating layer (24) is not less than 3.45 nm and not more than 5.20 nm.

Abstract: In a display control circuit (200) of a display device, an image pattern detection portion (230) detects whether an image is an anti-flicker pattern or not, and when it is an anti-flicker pattern, a backlight source is driven (typically, such that its luminance changes in the opposite phase relative to luminance changes that would occur), on the basis of predicted values, which are predetermined so as to compensate for the luminance changes that would occur. Moreover, the backlight is not turned on during the scanning period. As a result, flicker due to current leakage, etc., can be reduced or eliminated in a display device for which a scanning period and a scan stop period are set.

Abstract: A semiconductor device (100A) includes a substrate (11); a TFT (10A) supported on the substrate, the TFT including an oxide semiconductor layer (16); an organic insulating layer (24) covering the TFT; a lower layer electrode (32) on the organic insulating layer; a dielectric layer (34) on the lower layer electrode; an upper layer electrode on the dielectric layer; and an upper layer electrode (36) including a portion opposing the lower layer electrode via the dielectric layer. The dielectric layer is a silicon nitride film having a hydrogen content of 5.33×1021 atoms/cm3 or less.

Abstract: This semiconductor device (100A) includes: a substrate (2); a gate electrode (3) formed on the substrate (2); a gate insulating layer (4) formed over the gate electrode (3); an oxide semiconductor layer (5) formed on the gate insulating layer (4); source and drain electrodes (6s, 6d) electrically connected to the oxide semiconductor layer (5); a first transparent electrode (7) electrically connected to the drain electrode (6d); an interlayer insulating layer (8a) including portions formed on the source and drain electrodes (6s, 6d); and a second transparent electrode (9) formed on the interlayer insulating layer (8a). At least a portion of the second transparent electrode (9) overlaps with the first transparent electrode (7) with the interlayer insulating layer (8a) interposed between them. And the oxide semiconductor layer (5) and the first transparent electrode (7) are formed out of a same oxide film.

Abstract: This semiconductor device (100A) includes: an oxide layer (15) which includes a semiconductor region (5) and a conductor region (7) that contacts with the semiconductor region; a source electrode (6s) and a drain electrode (6d) which are electrically connected to the semiconductor region; an insulating layer (11) formed on the source and drain electrodes; a transparent electrode (9) arranged to overlap at least partially with the conductor region with the insulating layer interposed between them; a source line (6a) formed out of the same conductive film as the source electrode; and a gate extended line (3a) formed out of the same conductive film as a gate electrode (3). The source line is electrically connected to the gate extended line via a transparent connecting layer (9a) which is formed out of the same conductive film as the transparent electrode.

Abstract: The TFT substrate (10) of this liquid crystal display device (100) includes: a TFT (11) which is provided for each pixel; an upper electrode (12) which is electrically connected to the TFT's drain electrode (11d); a lower electrode (13) which is arranged under the upper electrode; and a dielectric layer (14) which is arranged between the upper and lower electrodes. Its counter substrate (20) includes a counter electrode (21) which faces the upper electrode. The upper electrode has first and second regions (R1, R2) which have mutually different electrode structures, and a third region (R3) which electrically connects the first and second regions to the drain electrode. The third region of the upper electrode includes a symmetrical connecting portion (12c) that is a conductive film pattern, of which the shape is substantially symmetrical with respect to a virtual line (L1) that splits each pixel into two adjacent regions in a row direction.

Abstract: This semiconductor device (100) includes: a gate electrode (3); a gate insulating layer (4); an oxide layer (50) which is formed on the gate insulating layer (4) and which includes a first conductor region (55) and a first semiconductor region (51) that overlaps at least partially with the gate electrode (3) with the gate insulating layer (4) interposed between them; a source electrode (6s) formed to contact with the upper surface of the first semiconductor region (51) of the oxide layer (50); a drain electrode (6d) which is formed to contact with the upper surface of the first semiconductor region (51) of the oxide layer (50) and which is electrically connected to the first conductor region (55); and a conductive layer (60) which is formed in contact with the upper surface of the oxide layer (50) and which a plurality of holes (66) or notches.

Abstract: Provided is a liquid crystal display device with reduced power consumption employing a CS drive method. A CS driver (500) consists of a CS shift register (510) and a CS output portion (520). The CS shift register (510) outputs control signals (COUT(1) to COUT(m)) in accordance with a CS clock signal CCK. The CS output portion (520) outputs auxiliary capacitance signals (CSS(1) to CSS(m)) in accordance with the control signals (COUT(1) to COUT(m)), respectively. An idle period (T2) is set following a scanning period (T1). During the idle period (T2), the CS driver (500) is driven in accordance with the CS clock signal (CCK) at an idle-period CS frequency (fcck2). The idle-period CS frequency (fcck2) is lower than a scanning-period CS frequency (fcck1).

Abstract: A semiconductor layer for an active element included in each of a plurality of pixels in a display section is constituted by an oxide layer containing at least one element selected from the group consisting of In, Ga, and Zn. There is provided, for the display section, a liquid crystal panel's timing controller (13) configured to carry out control so that (i) a length of a first period during which image data is written is not more than twice that of the second period and/or (ii) one (1) frame period is longer than 16.7 msec.

Abstract: A semiconductor device has: a first transparent electrode, a drain electrode, and a source electrode formed on a substrate; an oxide layer joined electrically to the source electrode and the drain electrode and containing a semiconductor region; an insulating layer formed on the oxide layer and the first transparent electrode; a gate electrode formed on the insulating layer; and a second transparent electrode formed so as to overlap at least a part of the first transparent electrode with the insulating layer interposed therebetween. The oxide layer and the first transparent electrode are formed of the same oxide film.

Abstract: This TFT substrate (100A) includes: a gate connecting layer (3a) formed on a substrate (1) out of a same conductive film as a gate electrode (3) or a transparent connecting layer (2a) formed on the substrate (1) out of a same conductive film as a first transparent electrode (2); an oxide layer (5z) which is formed on an insulating layer (4) and which includes at least one conductor region (5a); and a source connecting layer (6a) formed on the oxide layer (5z) out of a same conductor film as a source electrode (6s). The source connecting layer (6a) is electrically connected to either the gate connecting layer (3a) or the transparent connecting layer (2a) via the at least one conductor region (5a).

Abstract: In order to suppress crosstalk between a pixel electrode and a source line to reduce flicker, an LCD device includes: gate lines 102 and source lines 105 which are provided in a grid pattern; pixel electrodes 111 arranged in a matrix pattern so as to correspond to intersections of the gate lines and the source lines; a transparent auxiliary capacitor electrode 109; and switching elements 121 configured to apply an image signal voltage supplied from the source line 105 to the pixel electrode 111 according to a scanning signal applied from the gate line 102. The switching element 121 is formed by using an oxide semiconductor layer 104, and the transparent auxiliary capacitor electrode 109 is provided between the source line 105 and the pixel electrode 111.