Abstract: Disclosed are an array substrate, a manufacturing method thereof, and a display device. The array substrate includes a gate insulating layer, an active layer, source-drain electrodes, a first conductive layer and an isolation insulating layer), the source-drain electrodes are in contact with the active layer, the gate insulating layer is located on a surface of the active layer, the isolation insulating layer) is located on another surface of the active layer, and the isolation insulating layer at least includes a first hollow structure in a contacting region of the active layer and the source-drain electrodes; the isolation insulating layer is configured to isolate residue of the active layer located outside a region where the first hollow structure is located from contacting the first conductive layer.

Abstract: A method for manufacturing an array substrate, including: forming a plurality of first metal layer patterns on a base substrate which are independent from each other, each of the plurality of first metal layer patterns including an end at a non-display region of the array substrate; forming an insulating layer on the plurality of first metal layer patterns; and forming a semiconductor pattern on the insulating layer, a portion of semiconductor pattern is disposed directly opposite to the end of the first metal layer patterns.

Abstract: A detection circuit and a detection method for liquid crystal display are provided. The detection circuit comprises a gate driver for providing row scan signal to liquid crystal cell to be detected; a signal source for providing polarity inversion signal to source driver; a source driver for performing digital-analog conversion on received display data signal according to preset reference voltage and polarity inversion signal, generating pixel voltage signal, and sending pixel voltage signal to liquid crystal cell to be detected. The polarity inversion signal comprises column polarity inversion signals each of which polarity inversion signal is continuous high level signal or continuous low level signal. The polarity inversion mode is a column inversion, which makes white dot of damaged area of alignment film is more prominent during detection process, so it would be easy for the operator to recognize it and avoid the issue of missing detection.

Abstract: The present invention relates to an array substrate, which comprises: a display region and a drive circuit region; the drive circuit region comprises GOA units, the GOA unit comprising a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further comprises a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. The invention further relates to a manufacturing method of an array substrate and a display apparatus comprising the array substrate.

Abstract: A method of manufacturing the TFT array substrate includes steps of: forming a first electrically conductive layer on the substrate, the first electrically conductive layer including a first electrically conductive pattern and a first signal line connected electrically to the first electrically conductive pattern located in a pixel region, and a first lead wire connected electrically to the first signal line; forming an insulation layer on the substrate formed with the first electrically conductive layer, the insulation layer including a first via-hole through which the first lead wire is exposed; and forming a second electrically conductive film on the substrate formed with the insulation layer, the second electrically conductive film being connected electrically to the first lead wire through the first via-hole in the insulation layer.

Abstract: The present disclosure provides a method for producing a TFT array substrate, a TFT array substrate, and a display apparatus, and relates to a technical field of display. It can solve a problem of no signal transmission caused by fracture of a source signal line, without increasing a coupling capacitance of the TFT array substrate. The method for producing a TFT array substrate includes: forming a transparent conductive layer and a source-drain metal layer in sequence onto a base substrate; and patterning the source-drain metal layer and the transparent conductive layer in one patterning process to form a source signal line and a pixel electrode line overlapping with each other.

Abstract: A film patterning method is provided. The method comprises: performing a dry etching process on a film to be patterned, so as to form a patterned film; removing a suspended particle on the patterned film; and performing another dry etching process on the patterned film after the suspended particle is removed, to form a final pattern of the film. By moving or completely removing the suspended particle on the patterned film and then performing another dry etching process on the patterned film to etch away the etching residue, existence of the etching residue is completely avoided in the final pattern of the film, so that the product yield is improved and the product quality is ensured.

Abstract: The present application provides an array electrode, which comprises: a plurality of gate lines, a plurality of data lines and a plurality of pixel units arranged in an array, wherein each pixel unit comprises a plate electrode, a slit electrode, and an insulating layer disposed between the plate electrode and the slit electrode. The slit electrode includes a plurality of electrode strips, with slits being formed between adjacent electrode strips, and an electrode strip that at least partially overlaps a projection of the data line on the array substrate being disconnected from other electrode strips. The present application also proposes a display device comprising said array substrate and a method for manufacturing said array substrate.

Abstract: The present invention relates to a pixel structure and a manufacturing method thereof, a display panel and a display device. The pixel structure comprises a plurality of columns of pixels, a data line is provided between every two adjacent columns of pixels, each pixel comprises a pixel electrode and a thin film transistor comprising a gate, an active layer, a source and a drain, wherein, a gate protective layer is provided between the gates and the active layers, grooves, each of which is at least partially located between two adjacent columns of pixels, are provided in the gate protective layer, for opposite ends of the pixel electrodes of the two adjacent columns of pixels and the data line between the two adjacent columns of pixels, one is located in the groove, and the other is located on a part of the gate protective layer without the groove.

Abstract: The present disclosure relates to the field of display technology, and provides an array substrate, its manufacturing method and a display device. A signal line on the array substrate includes at least two conductive layers electrically connected to each other. When one of the conductive layers is broken, a signal may be transmitted through the other conductive layer(s). As a result, it is able to improve the reliability of the electrical connection of the signal line, thereby to improve the yield of the display device. Further, the plurality of conductive layers of the signal line is formed simultaneously in an existing process for manufacturing the conductive layer patterns for the array substrate, so it is unnecessary to form the signal line separately, and thereby the manufacturing process is simplified.

Abstract: The present invention provides an array substrate, a method of fabricating the array substrate, and a display device. The method of fabricating the array substrate of the present invention comprises steps of: sequentially forming a first transparent conductive film and a source-drain metal film on a substrate; forming a source-drain metal pattern by performing a patterning process on the source-drain metal film; forming a pattern comprising a pixel electrode and a compensation structure that is provided below the source-drain metal pattern by performing a patterning process on the first transparent conductive film.

Abstract: The present invention relates to an array substrate, which comprises: a display region and a drive circuit region; the drive circuit region comprises GOA units, the GOA unit comprising a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further comprises a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. The invention further relates to a manufacturing method of an array substrate and a display apparatus comprising the array substrate.

Abstract: The present disclosure provides a method for manufacturing a slit electrode, the slit electrode, and a display panel. The method includes steps of forming a first photoresist pattern on a passivation layer, the first photoresist pattern being of a shape identical to a slit of the slit electrode, forming a slit electrode pattern on the passivation layer with the first photoresist pattern, the slit electrode pattern being covering with a second photoresist pattern which has a shape identical to the slit electrode; and removing the first photoresist pattern and the second photoresist pattern.

Abstract: The present invention provides an array substrate, a display device, and a mother board. One or more short-circuit rings are each arranged at an end of a corresponding signal line and connected to the corresponding signal line, and the short-circuit rings are serially connected through a common electrode line. The array substrate is added with a test line and a testing terminal pad, the testing terminal pad is connected to the common electrode line via the test line and is configured to apply a negative voltage onto the common electrode line connected to the test line while testing the signal line.

Abstract: The invention provides a display motherboard, a display panel and a display device for solving the problem of unsmooth cutting of the display motherboard in the prior art during cutting. In the display motherboard, the display panel and the display device provided by the present invention, a cutting area of the display motherboard is provided with a raised portion on one side close to sealant, and the raised portion can make the cutting stress more concentrated when the display motherboard is cut, so that adhesion of the sealant to substrates is reduced and thus the display motherboard is cut more smoothly.

Abstract: The invention provides a display motherboard, a display panel and a display device for solving the problem of unsmooth cutting of the display motherboard in the prior art during cutting. In the display motherboard, the display panel and the display device provided by the present invention, a cutting area of the display motherboard is provided with a raised portion on one side close to sealant, and the raised portion can make the cutting stress more concentrated when the display motherboard is cut, so that adhesion of the sealant to substrates is reduced and thus the display motherboard is cut more smoothly.

Abstract: A film patterning method is provided. The method includes: forming a to-be-patterned film on a surface of a base substrate; forming a protective layer for blocking foreign materials on a surface of the to-be-patterned film, before moving the base substrate to an etching device to pattern the to-be-patterned film; and forming a patterned mask, and etching the to-be-patterned film with the patterned mask so as to form a patterned film.

Abstract: The present disclosure discloses an array substrate, a display panel and a display device. The array substrate includes gate regions, gate lines, data lines, pixel electrodes and common electrode lines. The common electrode lines and the gate lines have the same extension direction, the pixel electrodes are located in regions defined by adjacent gate lines and adjacent data lines, the gate lines traverse the gate regions in the extension direction that are located in the same row as the gate lines, and the pixel electrodes have a gap from the gate lines at ends thereof closer to the gate lines. As such, a portion of the gate region that extends to the pixel region has a reduced area and hence a reduced edge length. This way, during the cleaning of the active layer after formation, less active layer metal may remain at the edges of the gate region. Thereby, the array substrate fabrication process is improved, and a product yield rate of the array substrate is increased.

Abstract: The present invention provides an array substrate, a method for manufacturing the same, and a display device including the same. In the manufacturing method of the present invention, photoresist is exposed and developed by using a mask to allow the first regions to retain photoresist with a first thickness and second regions to retain photoresist with a second thickness, wherein the first thickness is greater than the second thickness, and each of the first regions is at least partially connected with the second region, so that the contact area between the exposed photoresist and the substrate is large and the photoresist in the first regions is unlikely to peel off. The manufacturing method of the present invention is applicable to manufacturing various array substrates.

Abstract: Embodiments of the present disclosure relate to a three-dimensional touch sensing method, a three-dimensional display device and a wearable device. The three-dimensional touch sensing method, comprising: receiving an electron beam being perpendicularly incident to a preset plane on the preset plane, the electron beam having a preset emission intensity; obtaining a reception position and a reception intensity of the electron beam; determining a projection position of a touch position on the preset plane according to the reception position of the electron beam; and calculating a distance from the touch position to the preset plane according to the reception intensity of the electron beam and the preset emission intensity.