Abstract: A display panel, a display device and a control method thereof are provided. The display panel includes a plurality of display units on a base substrate, each display unit includes: a driving component, and a light splitting component driven by the driving component to convert incident light into light of different colors.

Abstract: The present disclosure provides an array substrate, a method for manufacturing the same, and a display device, which belongs to the field of display technology. The array substrate includes a metal electrode layer, a pad layer, a first insulating layer and a first transparent conductive layer, wherein: the pad layer includes a transparent conductive material, the metal electrode layer includes a conductive layer and protection layers formed on both surfaces of the conductive layer, and the pad layer is connected to the metal electrode layer; the first insulating layer is covered on the metal electrode layer and the pad layer, and the first transparent conductive layer is disposed on the first insulating layer; and a via hole is provided in the first insulating layer, and the first transparent conductive layer is connected to the pad layer through the via hole.

Abstract: The disclosure discloses an array substrate and a liquid crystal display device. The array substrate includes a plurality of data lines paralleled with each other, and a plurality of scan lines perpendicularly intersected with the plurality of data line, wherein the plurality of data lines are insulated from the plurality of scan lines at their intersections; and the array substrate further includes pixel electrodes, wherein each pixel electrode is driven by n thin film transistors sharing a same data line and a same scan line, wherein n is a positive integer greater than or equal to 2.

Abstract: The present disclosure describes a method for fabricating an array substrate, an array substrate, and a display device. The method includes the following steps: forming a gate electrode on a substrate; forming a gate insulating layer on a side of the gate electrode distal to the substrate; and forming an active layer and a source-drain metal sequentially on a side of the gate insulating layer distal to the gate electrode; forming a protection layer for the source-drain metal on a side of the source-drain metal distal to the gate insulating layer; and etching portion of the source-drain metal corresponding to the channel region to form a source electrode and a drain electrode.

Abstract: A patterning method employing a half tone mask includes the steps of: successively forming a first thin film layer, a second thin film layer and a photoresist thin film layer on a substrate; exposing and developing the photoresist thin film layer by using a half tone mask plate; performing a first etching on the substrate that is exposed and developed; performing a second etching on the substrate that has been subject to the first etching; passivating the substrate that has been subject to the first etching; ashing the substrate that has been passivated; performing a third etching on the substrate that has been subject to the ashing and the second etching; and, stripping the substrate that has been subject to the third etching.