Patents by Inventor Zhongwei Chen

Zhongwei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Objective lens system for fast scanning large FOV
    Patent number: 10008360
    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).
    Type: Grant
    Filed: January 27, 2016
    Date of Patent: June 26, 2018
    Assignee: HERMES MICROVISION INC.
    Inventors: Shuai Li, Zhongwei Chen
  • Apparatus of plural charged-particle beams
    Patent number: 9922799
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: March 20, 2018
    Assignee: Hermes Microvision, Inc.
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
  • Tri-Electrode Zinc-Air Battery with Flowing Electrolyte
    Publication number: 20180048041
    Abstract: A rechargeable tri-electrode single flow zinc air battery which is capable of providing theoretically unlimited cycle life is provided. The tri-electrode configuration consists of one anode and two cathodes, one for charging and another for discharging. The charge cathode may comprise a water-permeable metal mesh and/or metal foam, which avoids carbon corrosion. The discharge cathode is a catalytic oxygen reduction electrode. The anode comprises an inert, conductive electrode allowing for zinc deposition during battery charging, and zinc dissolving during battery discharging. The flowing electrolyte removes zinc ions from the anode preventing or minimizing the formation of zinc oxides during discharging, and clean the anode after each full discharge.
    Type: Application
    Filed: March 4, 2016
    Publication date: February 15, 2018
    Inventors: Zhongwei CHEN, Hao LIU
  • METHOD FOR THE PREPARATION OF ANODES FOR LITHIUM BATTERIES
    Publication number: 20180013138
    Abstract: A method for preparing an electrode for use in lithium batteries and the resulting electrodes are described The method comprises coating a slurry of silicon, sulfur doped graphene and polyacrylonitrile on a current collector followed by sluggish heat treatment.
    Type: Application
    Filed: February 5, 2016
    Publication date: January 11, 2018
    Inventors: Zhongwei CHEN, Aiping YU, Fathy Mohamed Hassan
  • APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    Publication number: 20170309449
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: June 26, 2017
    Publication date: October 26, 2017
    Inventors: Weiming REN, Shuai LI, Xuedong LIU, Zhongwei CHEN
  • Microtomic system and process using semiconductor chip grid
    Patent number: 9797813
    Abstract: Provided is a microtomic system and process for the preparation of sections for microscope examination. A cutting edge in the system can cut through a sample block and produce a section one end of which remains attached to the cutting edge. A voltage generator can generate a voltage and apply the voltage between the cutting edge and a section receiver such as a semiconductor chip grid. Through electrostatic force caused by the voltage, another end of the section can anchor to the section receiver. The section is then spread on the receiver. The system is automatable, highly efficient, and does not need liquid to float sample sections, and can therefore maintain the integration of the sample sections.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: October 24, 2017
    Assignee: Focus e-Beam Technology (Beijing) Co., Ltd.
    Inventor: Zhongwei Chen
  • Microtomic system and process utilizing electrostatic force to handle sample sections
    Patent number: 9719889
    Abstract: Provided is a process of using a microtomic system for the preparation of sections for microscope examination. A cutting edge in the system can cut through a sample block and produce a section one end of which remains attached to the cutting edge. A voltage generator can generate a voltage and apply the voltage between the cutting edge and a section receiver such as a semiconductor chip grid. Through electrostatic force caused by the voltage, another end of the section can anchor to the section receiver. The section is then spread on the receiver. The system is automatable, highly efficient, and does not need liquid to float sample sections, and can therefore maintain the integration of the sample sections.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: August 1, 2017
    Assignee: Focus e-Beam Technology (Beijing) Co., Ltd.
    Inventor: Zhongwei Chen
  • Apparatus of Plural Charged-Particle Beams
    Publication number: 20170213688
    Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.
    Type: Application
    Filed: January 27, 2017
    Publication date: July 27, 2017
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Apparatus of plural charged-particle beams
    Patent number: 9691588
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: June 27, 2017
    Assignee: HERMES MICROVISION, INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Apparatus of plural charged-particle beams
    Patent number: 9691586
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: June 27, 2017
    Assignee: HERMES MICROVISION, INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Apparatus of Plural Charged-Particle Beams
    Publication number: 20170154756
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Application
    Filed: November 30, 2016
    Publication date: June 1, 2017
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Apparatus of Plural Charged-Particle Beams
    Publication number: 20170125206
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: January 11, 2017
    Publication date: May 4, 2017
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Apparatus of Plural Charged-Particle Beams
    Publication number: 20170125205
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Application
    Filed: January 11, 2017
    Publication date: May 4, 2017
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Scanning transmission electron microscope with variable axis objective lens and detective system
    Patent number: 9613779
    Abstract: The present invention provides a scanning transmission electron microscope (STEM). In the STEM, a specimen is sandwiched between a variable axis objective lens and a variable axis collection lens. The axis of the collection lens varies along with the variation of the objective lens axis in a coordinated manner. The STEM of the invention exhibits technical merits such as large scanning field, high image resolution across the entire scanning field, and high throughput, among others.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: April 4, 2017
    Assignee: NINGBO FOCUS-EBEAM INSTRUMENTS INC.
    Inventors: Shuai Li, Wei He, Zhongwei Chen
  • Apparatus of plural charged-particle beams
    Patent number: 9607805
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: March 28, 2017
    Assignee: HERMES MICROVISION INC.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Metal seal for ultra high vacuum system
    Patent number: 9605759
    Abstract: A metal gasket has a cross-sectional shape that is a six sided shape that resembles an irregular quadrangle that is substantially isosceles trapezoidal in shape with two sharp angles between the longest side and the second- and third-longest sides, respectively. The longest side of the cross section is the inner wall of the metal gasket.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: March 28, 2017
    Assignee: HERMES MICROVISION INC.
    Inventors: Qingpo Xi, Tao Li, Feng Cao, Fumin He, Zhongwei Chen
  • Core-shell structured bifunctional catalysts for metal air battery/fuel cell
    Patent number: 9590253
    Abstract: The present invention relates to a bifunctional catalyst for use with air metal batteries and fuel cell. The bifunctional catalyst comprising a core and a shell, where the core comprises a metal oxide and the shell comprises a carbon nanostructure. In a further aspect the bifunctional catalyst is catalytically active for oxygen reduction and oxygen evolution reactions.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: March 7, 2017
    Inventors: Zhongwei Chen, Zhu Chen
  • Metal seal for ultra high vacuum system
    Patent number: 9581245
    Abstract: A metal seal flange assembly for a vacuum system is presented. Its metal gasket has a crossectional shape that is an irregular hexagon with two acute angles between the longest side and the second- and third-longest sides, respectively. The longest side of the irregular hexagon is the vertical inner wall of the metal gasket. This design can reduce the normal force required to seal the metal seal flange assembly and reduce the number of bolts needed, enabling use in a limited working space.
    Type: Grant
    Filed: April 2, 2012
    Date of Patent: February 28, 2017
    Assignee: HERMES MICROVISION, INC.
    Inventors: Qingpo Xi, Tao Li, Feng Cao, Fumin He, Zhongwei Chen
  • Apparatus of Plural Charged-Particle Beams
    Publication number: 20170025243
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Application
    Filed: July 21, 2016
    Publication date: January 26, 2017
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Apparatus of Plural Charged-Particle Beams
    Publication number: 20170025241
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Application
    Filed: July 19, 2016
    Publication date: January 26, 2017
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen