Patents by Inventor Zhongwei Chen

Zhongwei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9000370
    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
    Type: Grant
    Filed: October 13, 2014
    Date of Patent: April 7, 2015
    Assignee: Hermes Microvision Inc.
    Inventors: Weiming Ren, Zhongwei Chen
  • Patent number: 9000395
    Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.
    Type: Grant
    Filed: May 13, 2014
    Date of Patent: April 7, 2015
    Assignee: Hermes Microvision, Inc.
    Inventors: Weiming Ren, Shuai Li, Zhongwei Chen
  • Publication number: 20150091258
    Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. This design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.
    Type: Application
    Filed: December 11, 2014
    Publication date: April 2, 2015
    Inventors: Qingpo Xi, Tao Li, Feng Cao, Fumin He, Zhongwei Chen
  • Publication number: 20150083912
    Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.
    Type: Application
    Filed: December 4, 2014
    Publication date: March 26, 2015
    Inventors: Zhongwei Chen, Jack Jau, Weiming Ren
  • Publication number: 20150069232
    Abstract: A method for identifying, inspecting, and reviewing all hot spots on a specimen is disclosed by using at least one SORIL e-beam tool. A full die on a semiconductor wafer is scanned by using a first identification recipe to obtain a full die image of that die and then design layout data is aligned and compared with the full die image to identify hot spots on the full die. Threshold levels used to identify hot spots can be varied and depend on the background environments close thereto, materials of the specimens, defect types, and design layout data. A second recipe is used to selectively inspect locations of all hot spots to identify killers, and then killers can be reviewed with a third recipe.
    Type: Application
    Filed: September 9, 2014
    Publication date: March 12, 2015
    Inventors: Steve Lin, Wei Fang, Eric Ma, Zhonghua Dong, Jon Chiang, Yan Zhao, Chester Kuo, Zhongwei Chen
  • Publication number: 20150060665
    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
    Type: Application
    Filed: October 13, 2014
    Publication date: March 5, 2015
    Inventors: Weiming Ren, Zhongwei Chen
  • Publication number: 20150060670
    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
    Type: Application
    Filed: October 13, 2014
    Publication date: March 5, 2015
    Inventors: Weiming Ren, Zhongwei Chen
  • Publication number: 20150060662
    Abstract: An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.
    Type: Application
    Filed: August 26, 2014
    Publication date: March 5, 2015
    Inventors: Zhongwei Chen, Weiming Ren, Xuerang Hu, Xuedong Liu
  • Patent number: 8907281
    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: December 9, 2014
    Assignee: Hermes Microvision Inc.
    Inventors: Weiming Ren, Zhongwei Chen
  • Publication number: 20140291510
    Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.
    Type: Application
    Filed: March 20, 2014
    Publication date: October 2, 2014
    Applicant: Hermes-Microvision, Inc.
    Inventors: Zhongwei Chen, Jack Jau, Weiming Ren
  • Publication number: 20140284476
    Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.
    Type: Application
    Filed: May 13, 2014
    Publication date: September 25, 2014
    Applicant: Hermes Microvision, Inc.
    Inventors: Weiming Ren, Shuai Li, Zhongwei Chen
  • Patent number: 8835867
    Abstract: A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: September 16, 2014
    Assignee: Hermes-Microvision, Inc.
    Inventors: Zhongwei Chen, Weiming Ren, Xuedong Liu
  • Patent number: 8791414
    Abstract: The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
    Type: Grant
    Filed: April 21, 2010
    Date of Patent: July 29, 2014
    Assignee: Hermes Microvision, Inc.
    Inventors: Joe Wang, Van-Duc Nguyen, Yi-Xiang Wang, Jack Jau, Zhongwei Chen
  • Publication number: 20140151554
    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
    Type: Application
    Filed: November 15, 2013
    Publication date: June 5, 2014
    Inventors: Weiming Ren, Zhongwei Chen
  • Publication number: 20140023939
    Abstract: The present invention relates to a bifunctional catalyst for use with air metal batteries and fuel cell. The bifunctional catalyst comprising a core and a shell, where the core comprises a metal oxide and the shell comprises a carbon nanostructure. In a further aspect the bifunctional catalyst is catalytically active for oxygen reduction and oxygen evolution reactions.
    Type: Application
    Filed: July 12, 2013
    Publication date: January 23, 2014
    Inventors: Zhongwei Chen, Zhu Chen
  • Patent number: 8624186
    Abstract: The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: January 7, 2014
    Assignee: Hermes Microvision, Inc.
    Inventors: Yi-Xiang Wang, Joe Wang, Xuedong Liu, Zhongwei Chen
  • Patent number: 8618480
    Abstract: The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: December 31, 2013
    Assignee: Hermes Microvision Inc.
    Inventors: Weiming Ren, Xiaoli Guo, Xuedong Liu, Zhongwei Chen
  • Patent number: 8592761
    Abstract: The monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. The present invention also provides two ways to build a monochromator into a SEM, in which one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: November 26, 2013
    Assignee: Hermes Microvision Inc.
    Inventors: Weiming Ren, Zhongwei Chen
  • Publication number: 20130277554
    Abstract: The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.
    Type: Application
    Filed: March 22, 2013
    Publication date: October 24, 2013
    Inventors: Weiming Ren, Xiaoli Guo, Xuedong Liu, Zhongwei Chen
  • Publication number: 20130257044
    Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. this design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.
    Type: Application
    Filed: April 2, 2012
    Publication date: October 3, 2013
    Applicant: Hermes Microvision, Inc.
    Inventors: Qingpo XI, Tao LI, Feng CAO, Fumin HE, Zhongwei CHEN