Reformed wafer boat
The present invention discloses a reformed wafer boat. The reformed wafer boat has a plurality of trenches. A first interval is formed between each trench and one adjacent trench, and a second interval is formed between each trench and the other adjacent trench. The wafers placed on the trenches at both ends of the second interval are in form of back to back, and the first interval is formed between surfaces of each wafers. This kind of design does not affect uniformity during process, and the throughput can also be effectively improved.
1. Field of the Invention
The invention relates to a wafer boat for placing the semiconductor wafers, and more particularly, to a wafer boat that the distances between trenches are sequentially a long one and a short one.
2. Description of the Prior Art
With the development of science and technology, various electric appliances have influenced our life profoundly. There are semiconductor chips in most of the electric appliances, so the importance of semiconductor chip industry cannot be ignored.
In the manufacturing process of the semiconductor chips, the diffusion process using the furnace is one of the fundamental processes. In the diffusion process, wafers are firstly placed on a wafer boat, and then the wafer boat is placed into the furnace for batch processing. The amount of the semiconductor chips that can be manufactured in equipment at the same time seriously affects the manufacturing cost of the semiconductor chips. If the amount of wafers in each batch process can be increased, the manufacturing cost will be effectively lowered and the throughput will be also improved.
Please refer to
It is therefore a primary objective of the claimed invention to provide a reformed wafer boat that can increase the amount of wafer carried in the wafer boat while proceeding the diffusion process using gases with great coefficient of viscosity.
It is therefore another objective of the claimed invention to provide a reformed wafer boat that can improve the manufacturing throughput.
According to the claimed invention, a reformed wafer boat is disclosed. The reformed wafer boat has a plurality of trenches, and each trench is used for placing a wafer and each trench and its adjacent trench form an interval. The plurality of intervals between the plurality of trenches are alternately composed of a first interval and a second interval, the first interval is longer than the second interval, and the wafers placed on the trenches at both ends of the second interval are in form of back to back.
These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.
BRIEF DESCRIPTION OF DRAWINGS
For increasing the amount of wafers placed on the wafer boat during the POCl3 doping process, the interval between the trenches and the placing direction of the wafers are reformed in the present invention. Without affecting the uniformity of the wafer, the amount of wafer placed on the wafer boat is increased.
Please refer to
Besides the first preferred embodiment, the wafer boat with little difference from the present invention is also claimed. As shown in
In contrast to the prior art, the present invention of the reformed wafer boat can increase the amount of wafer placed on the wafer boat without affecting the uniformity of wafers, so that the manufacturing cost can be effectively lowered and the throughput can be also improved.
Those skilled in the art will readily observe that numerous modifications and alterations of the device may be made while retaining the teachings of the invention. Accordingly, the above disclosure should be construed as limited only by the metes and bounds of the appended claims.
Claims
1. A reformed wafer boat with a plurality of trenches, each trench is used for placing a wafer and each trench and its adjacent trench form an interval, the plurality of intervals between the plurality of trenches are alternately composed of a first interval and a second interval, the first interval is longer than the second interval, and the wafers placed on the trenches at both ends of the second interval are in form of back to back.
2. The reformed wafer boat of claim 1, wherein the reformed wafer boat is used in a furnace process.
3. The reformed wafer boat of claim 1, wherein the reformed wafer boat is used in a POCl3 doping process.
Type: Application
Filed: Mar 18, 2004
Publication Date: Sep 22, 2005
Inventors: Juan Chuang (Hsinchu City), Joe Hsu (Keelung City), Chang Sun (Dashu Township), Hsiuen Lu (Jhubei City), Shun Wang (Shanhua Township)
Application Number: 10/802,791