Heating Source For Spatial Atomic Layer Deposition
Heating apparatus for heating substrates having a graphite body and at least one heating element comprising a continuous section of material disposed within the body are disclosed. Processing chambers incorporating the heating apparatus are also disclosed.
This application claims priority to U.S. Provisional Application No. 62/206,247, filed Aug. 17, 2015, the entire disclosure of which is hereby incorporated by reference herein.
FIELDEmbodiments of the disclosure relate to resistive heaters for semiconductor processing. In particular, embodiments of the disclosure are directed to graphite heaters for use in atomic layer deposition batch processing chambers.
BACKGROUNDSemiconductor device formation is commonly conducted in substrate processing systems or platforms containing multiple chambers, which may also be referred to as cluster tools. In some instances, the purpose of a multi-chamber processing platform or cluster tool is to perform two or more processes on a substrate sequentially in a controlled environment. In other instances, however, a multiple chamber processing platform may only perform a single processing step on substrates. The additional chambers can be employed to maximize the rate at which substrates are processed. In the latter case, the process performed on substrates is typically a batch process, wherein a relatively large number of substrates, e.g. 25 or 50, are processed in a given chamber simultaneously. Batch processing is especially beneficial for processes that are too time-consuming to be performed on individual substrates in an economically viable manner, such as for atomic layer deposition (ALD) processes and some chemical vapor deposition (CVD) processes.
Temperature uniformity may be an important consideration in CVD or ALD process. Resistive heaters are widely employed in the heating systems of CVD and ALD systems. Even slight variations in temperature uniformity across a wafer, on the order of just a few degrees Celsius, can adversely affect a CVD or ALD process. The size of the batch processing chambers further increases the complexity and requirements of the heating sources. Accordingly, there is a need in the art for improved heaters for batch processing chambers
SUMMARYOne or more embodiments of the disclosure are directed to apparatus comprising a body having a top surface, bottom surface and outer edge. The body comprises graphite and has at least one heating element comprising a continuous section of material disposed therein.
Additional embodiments of the disclosure are directed to processing chambers comprising a gas distribution assembly having a front surface, a susceptor assembly and a heating apparatus. The susceptor assembly has a top surface facing the front surface of the gas distribution assembly and a bottom surface. The top surface has a plurality of recesses therein with each recess sized to support a substrate during processing. The heating apparatus has a body comprising graphite with a top surface facing the bottom surface of the susceptor assembly. The heating apparatus includes at least one heating element within the body.
Further embodiments of the disclosure are directed to processing chambers comprising a gas distribution assembly, a susceptor assembly and a heating apparatus. The gas distribution assembly has a front surface. The susceptor assembly has a top surface facing the front surface of the gas distribution assembly and a bottom surface. The top surface has a plurality of recesses therein with each recess sized to support a substrate during processing. The susceptor assembly is connected to a support post. The heating apparatus has a body comprising substantially only graphite with a top surface facing the bottom surface of the susceptor assembly. The heating apparatus includes at least one heating element within the body connected to a 100V to 500V power source. The heating element is effective to heat the susceptor assembly to a temperature sufficient to heat a substrate positioned on the susceptor assembly to a temperature greater than about 1100° C. The heating apparatus includes an opening passing through the body from the top surface to the bottom surface and the support post passes through the opening in the body without contacting the body
So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this disclosure and are therefore not to be considered limiting of its scope, for the disclosure may admit to other equally effective embodiments.
Before describing several exemplary embodiments of the disclosure, it is to be understood that the disclosure is not limited to the details of construction or process steps set forth in the following description. The disclosure is capable of other embodiments and of being practiced or being carried out in various ways. It is also to be understood that the complexes and ligands of the present disclosure may be illustrated herein using structural formulas which have a particular stereochemistry. These illustrations are intended as examples only and are not to be construed as limiting the disclosed structure to any particular stereochemistry. Rather, the illustrated structures are intended to encompass all such complexes and ligands having the indicated chemical formula.
A “substrate” as used herein, refers to any substrate or material surface formed on a substrate upon which film processing is performed during a fabrication process. For example, a substrate surface on which processing can be performed include materials such as silicon, silicon oxide, strained silicon, silicon on insulator (SOI), carbon doped silicon oxides, silicon nitride, doped silicon, germanium, gallium arsenide, glass, sapphire, and any other materials such as metals, metal nitrides, metal alloys, and other conductive materials, depending on the application. Substrates include, without limitation, semiconductor wafers. Substrates may be exposed to a pretreatment process to polish, etch, reduce, oxidize, hydroxylate, anneal and/or bake the substrate surface. In addition to film processing directly on the surface of the substrate itself, in the present disclosure, any of the film processing steps disclosed may also be performed on an underlayer formed on the substrate as disclosed in more detail below, and the term “substrate surface” is intended to include such underlayer as the context indicates. Thus for example, where a film/layer or partial film/layer has been deposited onto a substrate surface, the exposed surface of the newly deposited film/layer becomes the substrate surface.
According to one or more embodiments, the method uses an atomic layer deposition (ALD) process. In such embodiments, the substrate surface is exposed to the precursors (or reactive gases) sequentially or substantially sequentially. As used herein throughout the specification, “substantially sequentially” means that a majority of the duration of a precursor exposure does not overlap with the exposure to a co-reagent, although there may be some overlap. As used in this specification and the appended claims, the terms “precursor”, “reactant”, “reactive gas” and the like are used interchangeably to refer to any gaseous species that can react with the substrate surface.
The specific type of gas distribution assembly 120 used can vary depending on the particular process being used. Embodiments of the disclosure can be used with any type of processing system where the gap between the susceptor and the gas distribution assembly is controlled. While various types of gas distribution assemblies can be employed (e.g., showerheads), embodiments of the disclosure may be particularly useful with spatial ALD gas distribution assemblies which have a plurality of substantially parallel gas channels. As used in this specification and the appended claims, the term “substantially parallel” means that the elongate axis of the gas channels extend in the same general direction. There can be slight imperfections in the parallelism of the gas channels. The plurality of substantially parallel gas channels can include at least one first reactive gas A channel, at least one second reactive gas B channel, at least one purge gas P channel and/or at least one vacuum V channel. The gases flowing from the first reactive gas A channel(s), the second reactive gas B channel(s) and the purge gas P channel(s) are directed toward the top surface of the wafer. Some of the gas flow moves horizontally across the surface of the wafer and out of the processing region through the purge gas P channel(s). A substrate moving from one end of the gas distribution assembly to the other end will be exposed to each of the process gases in turn, forming a layer on the substrate surface.
In some embodiments, the gas distribution assembly 120 is a rigid stationary body made of a single injector unit. In one or more embodiments, the gas distribution assembly 120 is made up of a plurality of individual sectors (e.g., injector units 122), as shown in
The susceptor assembly 140 is positioned beneath the gas distribution assembly 120. The susceptor assembly 140 includes a top surface 141 and at least one recess 142 in the top surface 141. The susceptor assembly 140 also has a bottom surface 143 and an edge 144. The recess 142 can be any suitable shape and size depending on the shape and size of the substrates 60 being processed. In the embodiment shown in
In some embodiments, as shown in
The susceptor assembly 140 of
The heater 105 can be a component of the susceptor assembly 140 or a separate component. The heater 105 shown in
The heater 105 can be connected to and supported by the susceptor assembly 140 or the support post 160 or a separate heater support 107. The heater support 107 can be smaller than or larger than the heater 105.
In some embodiments, a reflector 109 is positioned between the heater 105 and the bottom and/or sides (not shown) of the processing chamber 100. The reflector 109 can help prevent damage to the processing chamber by decreasing the amount of radiant energy impacting the processing chamber from the heater 105. The heater support 107 of some embodiments is also a reflector.
The processing chamber 100 shown in the Figures is a carousel-type chamber in which the susceptor assembly 140 can hold a plurality of substrates 60. As shown in
Processing chambers having multiple gas injectors can be used to process multiple wafers simultaneously so that the wafers experience the same process flow. For example, as shown in
The processing chamber 100 shown in
The embodiment shown in
Rotation of the carousel (e.g., the susceptor assembly 140) can be continuous or discontinuous. In continuous processing, the wafers are constantly rotating so that they are exposed to each of the injectors in turn. In discontinuous processing, the wafers can be moved to the injector region and stopped, and then to the region 84 between the injectors and stopped. For example, the carousel can rotate so that the wafers move from an inter-injector region across the injector (or stop adjacent the injector) and on to the next inter-injector region where the carousel can pause again. Pausing between the injectors may provide time for additional processing steps between each layer deposition (e.g., exposure to plasma).
Referring to both
With reference to the embodiments shown in
Referring to
The injector unit 122 of
Referring to
During processing a substrate may be exposed to more than one processing region 250 at any given time. However, the portions that are exposed to the different processing regions will have a gas curtain separating the two. For example, if the leading edge of a substrate enters a processing region including the second reactive gas port 135, a middle portion of the substrate will be under a gas curtain 150 and the trailing edge of the substrate will be in a processing region including the first reactive gas port 125.
A factory interface 280, which can be, for example, a load lock chamber, is shown connected to the processing chamber 100. A substrate 60 is shown superimposed over the gas distribution assembly 120 to provide a frame of reference. The substrate 60 may often sit on a susceptor assembly to be held near the front surface 121 of the gas distribution assembly 120 (also referred to as a gas distribution plate). The substrate 60 is loaded via the factory interface 280 into the processing chamber 100 onto a substrate support or susceptor assembly (see
The conventional ALD sequence in a batch processor, like that of
Accordingly, embodiments of the disclosure are directed to processing methods comprising a processing chamber 100 with a plurality of processing regions 250a-250h with each processing region separated from an adjacent region by a gas curtain 150. For example, the processing chamber shown in
A plurality of substrates 60 are positioned on a substrate support, for example, the susceptor assembly 140 shown
A first reactive gas A is flowed into one or more of the processing regions 250 while an inert gas is flowed into any processing region 250 which does not have a first reactive gas A flowing into it. For example if the first reactive gas is flowing into processing regions 250b through processing region 250h, an inert gas would be flowing into processing region 250a. The inert gas can be flowed through the first reactive gas port 125 or the second reactive gas port 135.
The inert gas flow within the processing regions can be constant or varied. In some embodiments, the reactive gas is co-flowed with an inert gas. The inert gas will act as a carrier and diluent. Since the amount of reactive gas, relative to the carrier gas, is small, co-flowing may make balancing the gas pressures between the processing regions easier by decreasing the differences in pressure between adjacent regions.
Typical heaters 105 may not allow the temperature of the substrate to be high enough for efficient reactions. For example, lamps may use a lot of energy and time to heat the susceptor assembly to heat the supported wafers. One or more embodiments of the disclosure advantageously allow the wafers to be heated to higher temperatures than a conventional heater. Some embodiments advantageously provide a heater that prevents or minimizes particulate contamination. One or more embodiments advantageously provide processing chambers which minimize the oxidation or reaction of the graphite heater.
One or more embodiments of the disclosure use resistive graphite heaters as alternate heating sources to traditional aluminum, stainless steel or materials such as Inconel alloy, heaters or lamps. The resistive graphite heater of some embodiments provides adequate heat for processes with varying temperature requirements which include low temperature (e.g., wafer temperature around 75° C.; resistive heater temp about 100° C.), medium temperature (e.g., wafer temperatures about 450° C.; resistive heater temperatures about 550-600° C.) and high temperature processes (e.g., wafer temperatures about 550° C. to greater than 700° C.; resistive heater temperatures about 720° C. to greater than 900° C.). In some embodiments, the graphite heater has a coating or insulator to prevent particle contamination. The enclosed chamber environment can be filled with an inert gas or barriers to prevent or minimize graphite oxidation or reaction with other gases at any time during processing. Some embodiments include temperature measuring devices, current and/or voltage measuring devices.
The distance D that the heating apparatus 200 is positioned from the susceptor assembly 140 can be varied during processing or fixed. In some embodiments, during use, the heating apparatus 200 is positioned a distance D in the range of about 30 mm to about 140 mm, or in the range of about 50 mm to about 120 mm.
Referring again to
Graphite, as a heating apparatus, presented challenges for use in batch processing chambers due to the difficulty of forming electrical connections, particle formation during processing and oxygen reactivity. One or more embodiments of the disclosure advantageously incorporate a graphite heating apparatus into a batch processing chamber. According to some embodiments, the body 201 of the heating apparatus 200 is made of graphite. In some embodiments, the body 201 comprises substantially only graphite, meaning that the composition of the body 201 is greater than about 95% carbon on an atomic basis. In some embodiments, the composition of the body is greater than about 96%, 97%, 98%, 99%, 99.5% or 99.9% carbon on an atomic basis.
Referring to
The resistive heater of some embodiments is a continuous section of material—which can be planar, round, or other shape—disposed within a recess 206 of body 201. In some embodiments, the resistive heater comprises wound bodies of metal wire. While the embodiment shown has two resistive heaters forming two zones, those skilled in the art will understand that there can be any number of zones or individual heating elements. In some embodiments, there are three resistive heaters forming three zones. In some embodiments, there are four resistive heaters forming four zones.
In some embodiments, there is more than one layer of resistive heaters. For example, there can be two, three or four resistive heaters stacked, with or without space between each.
All or any of the resistive heating elements may be made from any suitable material known in the art. In some embodiments, the resistive heating element(s) has a coefficient of thermal expansion similar to those of the body 201. An example of a suitable material for the resistive heating elements includes pyrolytic graphite. The resistive heating elements can be disposed within recesses of the body by, e.g., CVD or ALD deposition.
The body 201 of the heating apparatus 200 may be able to withstand temperatures greater than or equal to about 1050° C., 1100° C., 1150° C. or 1200° C. The heating apparatus of some embodiments is sufficient to heat the susceptor assembly 140 and a substrate 60 positioned on the top surface 141 of the susceptor assembly 140 to a temperature greater than or equal to about 650° C., 675° C., 700° C., 720° C., 725° C., 750° C., 775° C. or 800° C.
The body 201 may be coated with a pyrolytic coating; a material that can withstand the high temperatures and corrosive materials associated with CVD and ALD processes. Suitable examples include, but are not limited to, pyrolytic graphite, pyrolytic boron nitride, graphite powder, graphite powder with a silicate glass binder. In some embodiments, the resistive heater is coated with graphite powder with a water based silicate glass binder and then cured in an oven at elevated temperature. In one or more embodiments, a pyrolytic material, for example, pyrolytic boron nitride, is disposed across the top surface 202 of the body. In some embodiments, the pyrolytic material is disposed across the outer surface of the heating apparatus including the top surface, bottom surface and outer edge.
Referring to
Insulation may be used to prevent the heating apparatus 200 from substantially heating other chamber components (e.g., the support post 160). As used in this regard, “substantially heating” means that the lifetime of the component is not shortened by more than 20%. Suitable insulation includes, but is not limited to, quartz, ceramic, aluminum oxide fibers, alumina silica fiber, ceramic fiber and sapphire. In some embodiments, the insulation has a coefficient of thermal expansion within 20% (relative) of the coefficient of thermal expansion of the body 201 of the heating apparatus 200.
Each resistive heating element 211, 212 has a corresponding power line running 213 (see
With reference to
In
Some embodiments include at least one temperature measurement device. The temperature measurement device can be connected to the heating apparatus 200, the heating elements 211, 212 or remote from the heating apparatus. Referring to
In some embodiments, the temperature measurement device 215 (see
In some embodiments, the temperature measurement device 216 (see
To prevent or minimize the formation of unwanted particulates, some embodiments include an inert gas to shroud around the heating apparatus 200. Referring to
In some embodiments, the insulator 224 (see
In some embodiments, a reflector 109 (see
A control system 295, depicted in
According to one embodiment, the control system 295 includes a user input/output (I/O) system 296, a temperature input 297 and a feedback control circuit 298. The user I/O system 296 provides a user interface that allows a user to select a target temperature of the susceptor or substrate or target voltage or amperage of the resistive heaters.
The temperature input 297 may be electrically connected to temperature measurement device to obtain, in real-time, the current temperature. The temperature input 297 then passes this current temperature to the feedback control circuit 298. In a manner familiar to those in the art, the feedback control circuit 298 accepts as input the current temperature and the target temperature and generates a heating power control output. The purpose of the heating power control output is to control the power delivered to the resistive heater so that the temperature as measured by the temperature measurement device tracks as closely as possible the target temperature. The feedback control circuit 298 may be designed to employ any suitable feedback control method known in the art.
Those skilled in the art will appreciate that the control system for controlling the heating apparatus may comprise a plurality a temperature measurement devices or sensors. Each temperature sensor may measure the temperature of a single region or zone. The temperature sensors may include thermocouples, pyrometers or other suitable temperature sensing devices. Combinations of different types of temperature sensors may be used as well.
Although the disclosure herein has been described with reference to particular embodiments, it is to be understood that these embodiments are merely illustrative of the principles and applications of the present disclosure. It will be apparent to those skilled in the art that various modifications and variations can be made to the method, apparatus and system of the present disclosure without departing from the spirit and scope of the disclosure. For example, the outer region of the body of the stage may be divided not into only four zones, but into any number of zones greater than one. In certain embodiments, each of these zones would be provided its respective heating power ratio. Also, the resistive heater zones may overlap with each other. The various heating elements may be on the top surface, bottom surface or embedded in the body of the stage. Zonal temperature measurement may be provided by utilizing multiple temperature measurement devices (thermocouple, pyrometer, etc). Thus, it is intended that the present disclosure include modifications and variations that are within the scope of the appended claims and their equivalents.
Claims
1. An apparatus comprising:
- a body having a top surface, bottom surface and outer edge, the body comprising graphite; and
- at least one heating element comprising a continuous section of material disposed within the body.
2. The apparatus of claim 1, wherein the body can withstand temperatures in excess of at least about 1150° C.
3. The apparatus of claim 1, further comprising a pyrolytic coating on the body.
4. The apparatus of claim 1, wherein the heating element comprises pyrolytic graphite.
5. The apparatus of claim 1, wherein the body further comprises an opening passing through the body from the top surface to the bottom surface.
6. The apparatus of claim 1, further comprising a temperature measurement device.
7. The apparatus of claim 6, wherein the temperature measurement device is connected to the at least one heating element and comprises one or more of a voltmeter or an ammeter.
8. The apparatus of claim 6, wherein the temperature measurement device is in contact with body and comprises one or more of a thermistor and a thermocouple.
9. The apparatus of claim 1, wherein there are two or more heating elements arranged in zones radially outwardly from a center of the body.
10. The apparatus of claim 1, wherein the body comprises substantially only graphite.
11. A processing chamber comprising:
- a gas distribution assembly having a front surface;
- a susceptor assembly having a top surface facing the front surface of the gas distribution assembly and a bottom surface, the top surface having a plurality of recesses therein, each recess sized to support a substrate during processing; and
- a heating apparatus having a body comprising graphite with a top surface facing the bottom surface of the susceptor assembly, the heating apparatus including at least one heating element within the body.
12. The processing chamber of claim 11, wherein the heating apparatus is effective to heat the susceptor assembly to a temperature sufficient to heat a substrate positioned on the susceptor assembly to a temperature greater than about 700° C.
13. The processing chamber of claim 11, wherein the heating apparatus is connected to a power source in the range of about 100V to about 500V.
14. The processing chamber of claim 13, further comprising insulation between the power source and adjacent components.
15. The processing chamber of claim 11, wherein the susceptor assembly is supported by a support post and the body of the heating apparatus further comprises an opening passing through the body from the top surface to the bottom surface and the support post passes through the opening in the body without contacting the body.
16. The processing chamber of claim 11, further comprising a temperature measurement device connected to the at least one heating element, the temperature measurement device comprising one or more of a voltmeter or an ammeter.
17. The processing chamber of claim 11, further comprising a temperature measurement device comprising a pyrometer positioned to determine a temperature of substrate on the top surface of the susceptor assembly.
18. The processing chamber of claim 11, further comprising a purge gas injector positioned to direct a flow of inert gas toward the heating apparatus.
19. The processing chamber of claim 11, further comprising a reflector positioned the bottom surface of the heating apparatus and a wall of the processing chamber.
20. A processing chamber comprising:
- a gas distribution assembly having a front surface;
- a susceptor assembly having a top surface facing the front surface of the gas distribution assembly and a bottom surface, the top surface having a plurality of recesses therein, each recess sized to support a substrate during processing, the susceptor assembly connected to a support post; and
- a heating apparatus having a body comprising substantially only graphite with a top surface facing the bottom surface of the susceptor assembly, the heating apparatus including at least one heating element within the body connected to a 100V to 500V power source, the heating element effective to heat the susceptor assembly to a temperature sufficient to heat a substrate positioned on the susceptor assembly to a temperature greater than about 1100° C., the heating apparatus including an opening passing through the body from the top surface to the bottom surface and the support post passes through the opening in the body without contacting the body.
Type: Application
Filed: Jul 28, 2016
Publication Date: Feb 23, 2017
Inventors: Garry K. Kwong (San Jose, CA), Joseph Yudovsky (Campbell, CA), Kevin Griffin (Livermore, CA), Kallol Bera (Fremont, CA), Omer Ozgun (San Jose, CA)
Application Number: 15/222,010