SILVER NANOWIRE THIN-FILM PATTERNING METHOD
Disclosed is a silver nanowire patterning method including patterning an adhesive conductive polymer thin-film on a substrate, fabricating a polydimethylsiloxane (PDMS) stamp coated with a silver nanowire thin-film, and bonding the substrate patterned with the conductive polymer thin-film to the PDMS stamp coated with the silver nanowire thin-film and then separating the two bonded substrates.
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This application is a national stage entry of International Application No. PCT/KR2019/007716, filed on Jun. 26, 2019, which claims priority from Korean Patent Application No. 10-2018-0103875, filed on Aug. 31, 2018, in the Korean Intellectual Property Office, the disclosures of which are incorporated herein by reference in their entirety.
BACKGROUND 1. FieldThe following description relates to a simple silver nanowire patterning method.
2. Description of Related ArtConventionally, methods such as photolithography, laser ablation, and shadow-mask-based solution coating are used to perform silver nanowire thin-film patterning.
Related Document 1 (U.S. Patent Publication No. U.S. Pat. No. 8,094,247) and Related Document 2 (S. Park et al, “Journal of Materials Chemistry A,” 1, 14286-14293, 2013) disclose a technique of forming a silver nanowire electrode that is transparent and that has high conductivity and excellent mechanical properties in order to replace an indium tin oxide (ITO) transparent electrode having weak mechanical properties. In detail, Related Document 1 discloses a photolithography method for patterning a formed electrode, and Related Document 2 discloses a method of placing a pre-designed shadow mask on a substrate and apply spray coating thereto in order to pattern a formed electrode.
However, all of the methods disclosed in the above-described related documents are complicated and expensive and have a highly limited degree of freedom of patterning in a facility construction process and a processing process.
SUMMARYThis summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
The following description relates to a silver nanowire thin-film patterning method that can reduce cost because the method is not complicated in a facility construction process and a processing process.
The following description also relates to a silver nanowire thin-film patterning method capable of guaranteeing the degree of freedom of a pattern.
The following description also relates to a silver nanowire thin-film patterning method that may be used to form a flexible or stretchable electrode according to the characteristics of a substrate forming an electrode.
In one general aspect, there is provided a silver nanowire patterning method including patterning an adhesive conductive polymer thin-film on a substrate, fabricating a polydimethylsiloxane (PDMS) stamp coated with a silver nanowire thin-film, and bonding the substrate patterned with the conductive polymer thin-film to the PDMS stamp coated with the silver nanowire thin-film and then separating the two bonded substrates.
Other features and aspects will be apparent from the following detailed description, the drawings, and the claims.
Throughout the drawings and the detailed description, unless otherwise described, the same drawing reference numerals will be understood to refer to the same elements, features, and structures. The relative size and depiction of these elements may be exaggerated for clarity, illustration, and convenience.
DETAILED DESCRIPTIONHereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Also, terms and words used herein are selected in consideration of the functions of the embodiments and may have meanings varying depending on the intent of the invention or a custom. Therefore, terms used in the following embodiments should be interpreted as specifically defined herein and should be interpreted as having meanings generally recognized by those skilled in the art when they are not specifically defined.
The present invention proposes a technique for simply fabricating a highly-conductive and transparent thin-film in various forms by freely patterning an adhesive conductive polymer on a substrate in a desired shape and transferring a silver nanowire onto a fabricated conductive polymer.
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When the AgNW solution 210 is applied onto one side of the PDMS stamp 200, spin coating is performed. Here, spin coating is a method of rotating an object to push out an arbitrary liquid placed on the object using a centrifugal force and thus to coat the object with the liquid and is a process of making a thin film. Since this spin coating has a high coating speed and excellent reproducibility, it is easy to adjust the thickness of the film, and general coating equipment can laminate the thin film without additional equipment. Furthermore, the surface of the thin film is even, and the thickness, hydrophilicity, absorbance, refractive index, etc. can be easily adjusted according to a polymer formation and technique.
Also, as shown in
Referring to
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Referring to
As described above, free patterning with conductive polymer is possible due to the inherent advantages of inkjet printing, and silver nanowire transfer occurs only on an adhesive conductive polymer thin-film. Thus, it is possible to assign process simplicity to the silver nanowire patterning and increase the degree of freedom.
Therefore, according to the present invention, silver nanowire patterning have a high degree of freedom is possible with a simple and inexpensive process compared to a conventionally reported method. That is, it is possible to freely and easily fabricate a silver nanowire thin-film having a desired shape on various substrates.
Also, depending on the required purpose, it is possible to freely adjust the transparency and conductivity of the thin film by adjusting the concentration of the nanowire with which the stamp is coated so that electrodes having various specifications can be fabricated. Also, depending on the field to which an electrode is to be applied, the electrode may be fabricated on a flexible or stretchable substrate. The electrode has similar electrical and optical characteristics but has excellent mechanical characteristics compared to ITO, which is widely used as a transparent electrode. Thus, the electrode is expected to be used as a next-generation transparent electrode applicable to flexible or stretchable devices. For example, the present invention has various application ranges including electronic devices such as flexibility- or stretchability-based organic light emitting diodes (OLED), organic solar cells (OSC), and touch panels.
The present invention has been described above with reference to embodiments referring to the accompanying drawings, but is not limited thereto. Rather, the present invention should be construed as encompassing various modifications that may be apparent to those skilled in the art. The appended claims are intended to cover such modifications.
Claims
1. A silver nanowire patterning method comprising:
- patterning an adhesive conductive polymer thin-film on a substrate;
- fabricating a polydimethylsiloxane (PDMS) stamp coated with a silver nanowire thin-film; and
- bonding the substrate patterned with the conductive polymer thin-film to the PDMS stamp coated with the silver nanowire thin-film and then separating the two bonded substrates.
2. The silver nanowire patterning method of claim 1, wherein the patterning comprises forming, on the substrate, a pattern to be used as a flexible or stretchable element.
3. The silver nanowire patterning method of claim 1, wherein the patterning comprises printing the adhesive conductive polymer thin-film onto the substrate using an inkjet printer.
4. The silver nanowire patterning method of one of claims 1 to 3, where the patterning further comprises performing thermal annealing after the conductive polymer thin-film is printed onto the substrate.
5. The silver nanowire patterning method of claim 1, wherein the fabricating comprises:
- applying a silver nanowire onto a plasma-treated PDMS substrate;
- performing spin coating; and
- performing solvent evaporation at room temperature and then performing salt treatment.
6. The silver nanowire patterning method of claim 1, wherein the separating of the two bonded substrates further comprises bonding the substrate patterned with the conductive polymer thin-film to the PDMS stamp coated with the silver nanowire thin-film, heating the substrate, and then cooling the substrate.
Type: Application
Filed: Jun 26, 2019
Publication Date: Sep 2, 2021
Applicant: Seoul National University R&DB Foundation (Seoul)
Inventors: Yongtaek HONG (Seoul), Jongjang PARK (Suwon-si), Geonhee KIM (Seoul)
Application Number: 17/254,261