Near field detection for optical metrology
An optical metrology tool may include a source of electromagnetic radiation having a characteristic wavelength, an objective having a central obscuration, a near field element located within the central obscuration of the objective, and an electromagnetic radiation detector coupled to the near field element. A mechanism is configured to bring the near field element into proximity to the target. A characteristic dimension of the near field element is sufficient smaller than the wavelength of the electromagnetic radiation that when the electromagnetic radiation passes through the cavity and the cavity is in sufficient proximity to the target that evanescent waves can couple energy from propagating radiation in the near-field element to the target. The detector detects an optical signal due to the evanescent waves coupling to the target.
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This invention generally relates to optical metrology and more particularly to implementing optical near field detection for optical metrology.BACKGROUND OF THE INVENTION
The semiconductor industry often uses far field optical imaging tools such as microscopes or scatterometers for wafer inspection and metrology. Such tools typically couple light from a source to a target through an objective lens. Light scattered from the target is coupled back through the objective to an imaging detector via an optical column. Such far-field optical tools can operate quite quickly and can obtain three-dimensional information about a target.
Another class of imaging tools includes electron microscopes, such as the scanning electron microscope (SEM). The SEM can form an image of a target using an electron beam instead of light. The SEM operates in a similar manner to an optical microscope. Instead of an optical beam, an electron beam is coupled to the target through an objective and secondary electrons from the target are coupled back through the objective to a detector through an electron optical column.
Yet another class of tools used for inspection and metrology is known as scanning probe tools. Such tools use a small probe that is mechanically scanned across a target. Atomic scale interactions between the target and the probe can be detected and amplified and converted to an image as the probe is scanned across the target.
As the components of semiconductor devices shrink to smaller and smaller sizes, presently on the order of a few nanometers, the ability to improve metrology performance, productivity, and device correlation becomes critically important. To determine the alignment of features formed in one layer with respect to features formed in a previous or subsequent layer, metrology targets are often formed in one or more of the layers. The metrology targets facilitate measurement of the dimensions of features and alignment, e.g., overlay between the features, using a metrology tool such as microscope or scatterometer or critical dimension (CD) with SEM or scatterometer.
One of the main obstacles in achieving these metrology requirements with optical based technologies is the large wavelength of the relevant spectral bands and the consequent limited resolution. These limitations are relevant to common far field technologies. Conventional optical metrology methods are based on propagating optical waves and as such are limited by wavelength range resolutions.
Unfortunately, in an optical system operating in a far-field mode, the spatial resolution is diffraction limited. The diffraction limit in traditional optics is imposed by the use of propagating waves in the imaging process. Generally, the lateral spatial resolution d is given by the Rayleigh criterion:
where λ is the wavelength of the light being imaged and NA (the numerical aperture) is equal to n sin θ, where θ is half of the angular aperture on the object side and n is the refractive index of the medium above the object.
One way of overcoming the diffraction limit for an optical system is to use an electron beam system, such as a scanning electron microscope (SEM). Because the SEM uses electrons instead of light SEM can measure much smaller features than can be measured with optical systems. However, a key difference between a conventional SEM and an optical microscope is that an SEM must operate with the target under vacuum. This can slow down the rate at which an SEM can inspect or measure different wafers and also makes an SEM system more expensive and complex. In addition, SEM typically requires that the target be made of an electrically conductive material. Non-conductive materials can be coated with a thin layer of conductive material, e.g., gold, prior to SEM measurements. Unfortunately, such coatings may alter the target, e.g., by obscuring very small scale features.
Furthermore, scanning probe technologies, such as Atomic Force Microscope (AFM), Scanning Tunneling Microscope (STM) and electronic microscope, are best suited for measuring two-dimensional information and have limited ability to provide three-dimensional information. In addition, the measurement and imaging process with scanning probe tools is slow.
The diffraction limit can be overcome by techniques that include near-field radiation (sometimes referred to as evanescent waves) in the detection process. One example of a technique for overcoming the diffraction limit using near-field radiation is described in commonly-assigned U.S. patent application Ser. No. 12/256,324, filed Oct. 22, 2008 entitled SYSTEMS AND METHODS FOR NEAR-FIELD HETERODYNE SPECTROSCOPY, by Guorong V. Zhuang, John Fielden, and Christopher F. Bevis, the entire contents of which are incorporated herein by reference. In this system a target is probed using a probe beam and a modulated pump beam. A near-field generation device receives the modulated pump beam, generates a modulated near-field beam, and directs the modulated near-field beam to a point on the sample that is probed with the probe beam. A reflected probe beam is detected, demodulated, and analyzed. However, this system detects the reflected probe beam in far field as opposed to the near field.
It is within this context that embodiments of the present invention arise.
Objects and advantages of the invention will become apparent upon reading the following detailed description and upon reference to the accompanying drawings in which:
Although the following detailed description contains many specific details for the purposes of illustration, anyone of ordinary skill in the art will appreciate that many variations and alterations to the following details are within the scope of the invention. Accordingly, the examples of embodiments of the invention described below are set forth without any loss of generality to, and without imposing limitations upon, the claimed invention.Introduction
The maximum resolution for an optical microscope is typically limited by how tightly the beam of light could be focused. In scanning optical microscopy, laser light is fed via an optical fiber to an aperture that is scanned across a target. Due to diffraction of the light, the size of the aperture normally determines the resolution obtainable. As noted above, the diffraction limit can be overcome through the inclusion of evanescent waves in the optical detection process. There are a number of promising techniques for including evanescent waves in optical detection. Such techniques include, near-field techniques such as near-field scanning optical microscopy, sub-wavelength aperture imaging, and super lenses.
Near-field scanning optical microscopy (NSOM), sometimes called scanning near-field optical microscopy (SNOM) is a microscopic technique for nanostructure investigation that breaks the far field resolution limit by exploiting the properties of evanescent waves. NSOM involves preparation of an evanescent wave coupled to a detectable propagating wave at some point proximate a target and scanning of this point detection over the target. An evanescent wave is a near-field standing wave with an intensity that exhibits exponential decay with distance from the boundary at which the wave was formed. They are formed at the boundary between two media with different wave motion properties, and are most intense within one-third of a wavelength from the surface of formation.
Near-field scanning optical microscopy (NSOM) permits imaging beyond the far-field visible diffraction limit (˜200 nm) with the capability of performing high spatial resolution (˜10-50 nm) optical spectroscopy. This is done by placing the detector very close (distance much smaller than wavelength λ) to the specimen surface. This allows for surface inspection with high spatial, spectral and temporal resolving power. With this technique, the resolution of the image is limited by the size of the detector aperture and not only by the wavelength of the illuminating light. As in optical microscopy, a contrast mechanism can be adapted to study different properties, such as refractive index, chemical structure and local stress. Dynamic properties can also be studied at a sub-wavelength scale using this technique.
Super-lenses are enabled by the use of meta-materials in which sub-wavelength structures are designed to yield an electronic response in opposite phase to electro-magnetic fields. Such an opposite phase response can result in negative electric permittivity and negative magnetic permeability and therefore negative refractive index. Super-lenses are described in detail by Xiang Zhang and Zhaowei Liu in “Super-lenses to overcome the diffraction limit” in Nature Materials, VOL 7, JUNE 2008, the entire contents of which are incorporated herein by reference.
Zhang and Liu describe an optical superlens made using a thin layer of silver, which can exhibit a negative electric permittivity if the layer is sufficiently thin and if the surfaces on either side of the superlens are sufficiently flat. In the case of visible wavelengths, negative electric permittivity is sufficient given that the bottom of the superlens is located a sub-wavelength distance from the object. Superlenses can be similarly made using silicon carbide and by laminating several thin layers of silver or silicon carbide together. Zhang and Liu also describe superlenses made using photonic crystals. The key to this type of superlens is to design an appropriate dispersion so as to achieve negative refraction for all angles. Such superlenses enable imaging of a near-field image from one point in space to another point in space.
A simple thin slab type superlens (referred to as a near field superlens) is only capable of projecting a sub-diffraction-limited image in the near field since the evanescent waves would continue to decay away from such lenses. The basic superlens concept can be enhanced, however, to bring the information from the near field image into the far field so that the near field image can be observed with conventional optics. By adding additional nanoscale corrugations (e.g., a sub-wavelength grating) onto the top surface of a thin-slab superlens a near field image can be projected into the far field and imaged with conventional optics. Such a superlens is referred to as a far-field superlens. A far-field superlens capable of working at visible wavelength has been investigated that uses a sub-wavelength grating on top of a silver slab.Embodiments
In an embodiment of the present invention, a near field optical probe is located within the central obscuration of the objective of an optical metrology or inspection tool. The near field optical probe includes an optical cavity with at least one opening configured to face a target. A width of the opening is smaller than the wavelength of the electromagnetic radiation. The near field optical probe includes a mechanism configured to bring the optical cavity into proximity to the target.
When the optical cavity is brought into sufficient proximity to a target evanescent optical waves emanating from the cavity through the opening can be coupled to both the target and a propagating wave inside the cavity. Interaction between the evanescent wave and the target can change in the coupling between the near field radiation and the propagating wave. Changes in the coupling between the near field wave and the propagating wave can be detected. This technique can detect changes in a multitude of optical properties, such as intensity, wavelength, phase and polarization. The changes in these properties can be related to the characteristics of the target.
By placing the near field optical probe in the central obscuration of the objective, embodiments of the present invention allow images of the target to be obtained quickly so that areas of interest can be located. If these areas of interest contain small-scale features, the near field optical probe can be brought into proximity to the target for near field probe measurements. Such a system combines the best features of far field and near field optical techniques into a single tool.
In the implementation of near field techniques into the nanometer scale semiconductor metrology and inspection, the near field device 100 can be mounted to a translation stage, such as a piezoelectric tube (PZT) that can impart nanometer scale movement to the cavity 101 and bring it to the proximity of the target 108. When the evanescent wave 106 is brought proximity to a target 108, the affect of coupling of the near field radiation to the target 108 can affect the propagating states of the radiation 104 in the optical cavity 101. The propagating states of the radiation 104 can be coupled to and from the optical cavity 101 by suitable waveguides, e.g., optical fibers as shown in
Depending upon the sample being imaged, there are multiple sensing modes for the near field device.
There are a number of different types of measurement that can be made using this configuration. For example critical dimension (CD) can be measured by translating a periodic grating target 208 in a direction perpendicular to the target's grating and measuring the periodic optical signal obtained when the evanescent wave travels above the periodic target. In case each period of the target is a compound structure, each period of the detected optical signal could also have a structure that can be analyzed. Due to the exponential nature of the evanescent wave, performing the lateral scan at different object—probe distances, can also yield additional information on the structure of the target.
The configuration shown in
The optical coupler 205 can direct another portion of the radiation from the source 204 (referred to as a sample beam) to the optical cavity 202. A small opening in the cavity 202 allows evanescent waves E to optically couple energy from propagating states in the cavity 202 to a target 208. Changes in the propagating states in the optical cavity 202 affect the phase of radiation in the sample beam that is coupled to the detector 206 from the cavity 202 via fiber 203A, the coupler 205, and fiber 201B. Changes in phase can be detected at the detector 206 through interference of the sample beam and the reference beam at the detector 206. A phase-dependent signal from the detector 206 can be coupled to an analyzer 210. The analyzer 210 can be configured to determine properties of the target 208 from the phase-dependent signal. The analyzer 210 can optionally receive signals obtained from radiation emanating from the source 204 to measure differences in radiation coupled to and from the cavity 202.
When the near optical cavity 202 is brought into operation, the near field optical probe can be operated as a near field scanning optical microscope. The sub-wavelength opening can be scanned across the target 208. There are several types of sub-wavelength openings depending on the application benefits and measurement sequence. The sub-wavelength opening can be a spot, line or any other shape that is found to be optimal for performance. Some examples of different scanning modes that can be used in conjunction with different configurations of the opening in the cavity are illustrated in
As shown in
In a variation on the version shown in
There are a number of different ways to analyze the effect of the evanescent wave coupling on the propagating modes. For example, broadband light may be fed into the optical cavity 302 and compare the input and output spectra. Alternatively, narrow band light could be coupled to the cavity 302 and the effect on the propagating modes may be observed as the central wavelength of the narrow band light changes. If the openings 301 are far enough apart (e.g., >2 microns) then possibly band filters can be prepared above each opening to enable combined spectral and lateral scanning. In this case each of the illumination schemes mentioned could work. Alternatively, the far field side of the opening 301 could be imaged as discussed below. Using a single wavelength in such a case can obtain more information about the target with fewer scanning steps.
Although circular openings are depicted in
As mentioned above, as the cavity 302 is scanned over the target and evanescent waves associated with the opening(s) can couple to the target 308, changing the characteristics of the propagating waves within the cavity. The changes can be detected and characterized in terms of intensity, wavelength, polarization or phase of the radiation. Information about the changes in the propagating modes can be used either directly, in case of simple large targets, or further analyzed with a dedicated model to obtain the details of the near field device and/or the target. For example, a periodic CD target can be scanned to produce a periodic signal that can be analyzed to determine properties of the target, such as pitch, CD, side wall angle, thickness, optical constants, and the like.
As discussed above, the near field probe can be located in an obscuration of the objective of an optical inspection or metrology system. As used herein, the term “obscuration” refers to a region of space proximate the target from which the objective gathers no light during optical measurements. In some optical inspection or metrology tools, light may be coupled to the target through the objective during optical measurements. Consequently, the term “obscuration” can also refer to a region of space proximate the target to which the objective supplies no light during optical measurements.
The near field probe can be mounted to the same mechanical structure as the objective. By mounting the probe in this way, an existing optical tool can be readily modified to add a scanning probe capability. For example, many inspection and metrology tools include a stage for mounting the sample. The stage often includes a mechanism for translating or rotating the target. This mechanism can be used to scan the target in the X and Y directions. The tool may also include a Z translation mechanism to allow translation of the stage along a Z direction that is perpendicular to the X and Y directions. Such a capability is often included to facilitate focusing of the objective of the target. This Z-translation capability can be incorporated into the target stage or into the mounting of the objective or an entire optical column of which the objective is a part. This mechanism can be used to bring the near field probe into sufficient proximity to the target to allow coupling of evanescent waves for NSOM.
In general, the optical cavity of the near field probe can be located between an outmost optical element (e.g., lens or mirror) of the objective and the target. It is
By way of example, and not by way of limitation, a near field optical probe can be combined with an optical metrology or inspection tool that employs a reflective or catadioptric objective. In this case, the optical cavity of the near field probe can be located in the objective's central obscuration, when not needed and brought into proximity to the target when required. Such a configuration can save space as well as time of the navigation step as the near field device is already above the target measured previously by the method using the reflective objective. In some implementations the optical tool may include a reflective objective for the purpose of navigating the near field probe over the target, which can be a challenge for near field probes.
By way of example, the target 420 may be mounted to a stage 422, that includes a translation mechanism that allows translation of the sample along x and y directions parallel to a plane of the sample and along a z direction perpendicular to the plane of the sample. In such a case, the mechanism 407 may be a simple mechanical mount that spaces the near-field element 406 from the back of the secondary mirror 404 by a sufficient amount that the cavity can be brought into proximity through translation of the sample along the z-axis. Alternatively, the mechanism 407 may be configured to translate the near-field element 406 along the z axis in the direction of the target 420.
In some implementations, the near-field device 405 may include a proximity sensor coupled in a feedback loop to the mechanism 407 and/or to the translation mechanism for the stage 422 to keep a fixed distance from the target 420 to the near field element during near field imaging. By way of example, and not by way of limitation, the distance sensor may be a capacitive sensor with sub-nanometer positioning measurement accuracy.
As shown in
The reflective objective 400 described in
In this embodiment, a light source 204, detector 206 and near-field element 509 can be optically coupled to an optical coupler 205 by dedicated optical fibers 201A, 201B, and 203 respectively for use in a near field sensing mode of the type discussed above with respect to
In particular, a first end of the dedicated fiber 203 can be optically coupled to the fiber coupler 205 and a second end of the dedicated fiber is located along an optical axis of the objective 508 between a central obscuration and a focal point of the objective and coupled to the optical cavity of the near field element 509. In operation, a portion of the light from the source 204 (referred to as the focus beam) is coupled to a sample 510 via the fiber coupler 205 and the objective 508. Some energy of the light propagating in the optical cavity of the near field element 509 can be coupled to a target 510 through a small opening in the cavity 509 by evanescent waves. The effect of the coupling on the radiation modes propagating in the cavity can be detected by the detector 206 and analyzed by an analyzer 210.
The systems shown in
In an alternative mode of operation, the target 510 can be scanned relative to the near field element 509 in the X and Y directions while keeping the cavity at a fixed height above the target 510. The signal can then be plotted as a function of X and Y.
It is further noted that in some embodiments, the near field element 509 may be mounted to the objective 508 by a mechanism that allows for some translation of the cavity in the Z direction. For example, the mechanism 407 referred to above with respect to
Other variations on the embodiments described above are possible and within the scope of embodiments of the present invention. For example, embodiments of the present invention are not limited to those that use an optical cavity as the near field element. Alternatively, other near-field optical elements, such as sub-wavelength apertures or superlenses may be used as the near field element that is located in an obscuration of an objective in a metrology tool.
As seen in
In alternative embodiments of the present invention, the sub-wavelength aperture element 606 may include a regular array of sub-wavelength apertures having a characteristic spacing pattern. For example, as shown in
The near-field detection system may image the sub-wavelength apertures. If each of the circular apertures 603 in
Embodiments of the present invention include configurations that allow use of different wavelengths in the near field illumination and detection in an apparatus of the type shown in
Standard illumination 701′ and near-field illumination 701 may be selectively introduced to the objective or the near-field element 706 through a dichroic beamsplitter 714A and a regular beamsplitter 714B. The dichroic beamsplitter 714A can be transparent to the wavelengths of radiation used for the standard illumination 701′ in the objective and reflective for wavelengths used for the near-field illumination in the near field element 706. The regular beamsplitter 714B can reflect a portion of the standard illumination 701′ toward the objective for focusing onto the target 710. Standard illumination scattered by the target and collected by the objective can also pass through the regular beamsplitter 714B into an imaging optical column (not shown).
Several variations on the basic configuration shown in
The near field illumination 801 can be reflected by the dichroic beamsplitter 814A and the regular beamsplitter 814B to a near-field optical device 805 positioned in a central obscuration of the objective 803. The near-field device can include a near-field element 806 and positioning mechanism 807. The near-field illumination 801 interacts with a target 810 to produce a near field signal 801′″. The near field signal can be reflected by the second dichroic beamsplitter 814C to a near field signal collection optics 820B and detected by a second detector 818B. In some implementations, a known polarization may optionally be introduced to the near-field illumination 801 e.g., by passing the near-field illumination through a polarizer 822A located between a near field illumination source 824 and the first dichroic beamsplitter 814A. The polarization of the near-field signal 801′ may be analyzed by passing the near-field signal 801′″ through an analyzer 822B having a known polarizing direction and observing the effect of the polarizing directions of the polarizer 822A and analyzer 822B on the signal detected by the near-field detector 818.
A potential issue in embodiments of the present invention is the presence of background noise from near-field illumination that is scattered by the near field element into the near field detection optics.
By way of example,
In the example depicted in
An alternative scheme for a metrology tool 850 may implement background noise rejection based on a heterodyne effect as illustrated in
If the sub-wavelength element 806 includes an array of apertures, e.g., as discussed above with respect to
Techniques for rejecting background noise in embodiments of the present invention are not limited to those illustrated in
Embodiments of the present invention include configurations that use far-field superlens in conjunction with a conventional objective so that both conventional imaging and near-field imaging may be done using the same imaging optical column. For example, as seen in
As seen in
The near-field device may include one or more additional optical elements 908 configured to optically couple propagating waves from the superlens 906 into the imaging optical column. Such propagating waves can be collected by standard optical elements 920A and imaged onto the same imaging detector 918A as is used for standard imaging with the objective. By way of example, and not by way of limitation, the optical elements may include a dichroic mirror as the secondary mirror 904. Such a dichroic mirror can be configured to transmit a first range of wavelengths used during near-field imaging of the target 910 with the superlens 906 and to reflect a second range of wavelengths used during conventional imaging of the target with the objective.
In some implementations, the near-field device 905 may include a proximity sensor 911, sensor coupled in a feedback loop 912 to translation stage 916 to keep a fixed distance from the target 910 to the superlens 906 during near field imaging. By way of example, and not by way of limitation, the proximity sensor 911 may be a capacitive sensor with sub-nanometer positioning measurement accuracy.
The use of near field based metrology in combination with existing optical metrology and inspection techniques opens a new realm of opportunities for accurate nanometer scale metrology as by combining the maturity and flexibility of optical technologies with the capability of measuring deeply sub-wavelength features.
The reader's attention is directed to all papers and documents which are filed concurrently with this specification and which are open to public inspection with this specification, and the contents of all such papers and documents incorporated herein by reference.
All the features disclosed in this specification (including any accompanying claims, abstract and drawings) may be replaced by alternative features serving the same, equivalent or similar purpose, unless expressly stated otherwise. Thus, unless expressly stated otherwise, each feature disclosed is one example only of a generic series of equivalent or similar features.
While the above is a complete description of the preferred embodiment of the present invention, it is possible to use various alternatives, modifications and equivalents. Therefore, the scope of the present invention should be determined not with reference to the above description but should, instead, be determined with reference to the appended claims, along with their full scope of equivalents. Any feature, whether preferred or not, may be combined with any other feature, whether preferred or not. In the claims that follow, the indefinite article “A”, or “An” refers to a quantity of one or more of the item following the article, except where expressly stated otherwise. The appended claims are not to be interpreted as including means-plus-function limitations, unless such a limitation is explicitly recited in a given claim using the phrase “means for.”
1. An optical metrology tool, comprising:
- a source of electromagnetic radiation having a characteristic wavelength;
- an objective having a central obscuration;
- a near field optical probe located within the central obscuration of the objective, wherein the near field optical probe includes a near field optical element, and a mechanism configured to bring the near field optical element into proximity to the target, wherein a characteristic dimension of the near field optical element is smaller than the wavelength of the electromagnetic radiation, wherein the characteristic dimension is sufficiently small that when the electromagnetic radiation passes through the near field optical element and the near field optical element is in sufficient proximity to the target evanescent waves couple energy from the radiation in the cavity to the target; and
- an electromagnetic radiation detector coupled to the near-field optical element, wherein the detector is configured to detect an optical signal due to coupling of the evanescent waves to the target and generate a corresponding output signal.
2. The optical metrology tool of claim 1, wherein the near field optical element is an optical cavity with at least one opening configured to face a target, wherein the characteristic dimension is a size of the opening, wherein, wherein the detector is configured to detect a difference in the electromagnetic radiation in the optical cavity due to coupling of the evanescent waves to the target and generate a corresponding difference signal.
3. The optical metrology tool of claim 1 wherein the near field optical element is a sub-wavelength aperture.
4. The optical metrology tool of claim 1 wherein the near field optical element includes a regular array of sub-wavelength apertures.
5. The optical metrology tool of claim 4 wherein the apertures in the regular array are linear apertures.
6. The optical metrology tool of claim 1 wherein the near field optical element is a superlens.
7. The optical metrology tool of claim 6 wherein the superlens is a far field superlens.
8. The optical metrology tool of claim 7 further comprising optics configured to couple the optical signal due to coupling of the evanescent waves to the target to the objective.
9. The optical metrology tool of claim 8 wherein the optics include a dichroic mirror in the objective that is configured to transmit a first range of wavelengths used during near-field imaging of the target and to reflect a second range of wavelengths used during conventional imaging of the target with the objective.
10. The optical metrology tool of claim 1 further comprising an interferometer coupled to the near-field illumination, wherein the interferometer is configured to introduce a 180 degree phase difference between background near-field illumination reflected by the near-field element and near-field radiation that has interacted with the target.
11. The optical metrology tool of claim 1 further comprising sources for first and second near field illumination wavelengths and detector electronics coupled to a near-field signal detector, wherein the first and second near-field illumination wavelengths have a frequency difference that is small enough to produce a heterodyne beat note when the first and second wavelengths are detected by the target wherein the beat note is characterized by a frequency that is within a range of detection by detector electronics, and wherein the electronics are configured to detect a phase difference in the beat note due to a difference in phase between background near-field illumination reflected by the near field element and a near field signal containing information from an interaction between the near-field illumination and the target.
12. The optical metrology tool of claim 1, further comprising an analyzer coupled to the detector, wherein the analyzer is configured to analyze the difference signal in terms of intensity, wavelength, polarization, or phase of the electromagnetic radiation to determine one or more characteristics of the sample.
13. The optical metrology tool of claim 1, further comprising an image detector optically coupled to the objective.
14. The optical metrology tool of claim 13, further comprising an illumination source optically coupled to the objective.
15. The optical metrology tool of the claim 1, further comprising a source of electromagnetic radiation wherein the near field optical probe is optically coupled to the source of electromagnetic radiation, wherein the source of electromagnetic radiation and the detector are respectively optically coupled by first and second fibers to an optical coupler and wherein the optical cavity is optically coupled by a third fiber to the optical coupler.
16. The optical metrology tool of claim 1, further comprising a source of electromagnetic radiation wherein the near field optical probe is optically coupled to the source of electromagnetic radiation, wherein the source of electromagnetic radiation, the optical cavity, a reference optical path, and the detector are optically coupled in an interferometer configuration in which the optical cavity is part of a sample beam path.
17. The optical metrology tool of claim 16, wherein the interferometer configuration includes an optical coupler connected to first, second, third, and fourth optical fibers,
- wherein in the sample beam path, the source of electromagnetic radiation is optically coupled to the optical cavity via the first fiber, the optical coupler and the second fiber, and the detector is optically coupled to the optical cavity via the second fiber, the optical coupler, and the third fiber; and
- wherein in the reference beam path, the source is optically coupled to a reflector via the first fiber, the coupler, and the fourth fiber, and the reflector is optically coupled to the detector via the fourth fiber, the coupler, and the third fiber.
18. The optical metrology tool of claim 1, wherein the at least one opening includes one or more spot openings characterized by a diameter that is smaller than the characteristic wavelength of the electromagnetic radiation.
19. The optical metrology tool of claim 18, further comprising a scanning mechanism configured to scan the near field optical probe relative to the target in one or more directions parallel to a plane of the target.
20. The optical metrology tool of claim 1, wherein the at least one opening includes one or line openings and the characteristic dimension is a width of the line openings, wherein the width is smaller than the characteristic wavelength of the electromagnetic radiation.
21. The optical metrology tool of claim 1, wherein the objective is a reflective objective having a focusing mirror.
22. The optical metrology tool of claim 21, wherein the near field optical probe is mounted inside the reflective objective.
23. The optical metrology tool of claim 22, wherein the reflective objective includes a secondary mirror optically coupled to the focusing mirror, wherein the near field optical probe is mounted in an obscuration area created by the secondary mirror.
24. The optical metrology tool of claim 21 wherein the near field device is mounted between the objective and the target.
25. The optical metrology tool of claim 1 wherein the optical cavity includes a gold foil having a thickness of about 100 nanometers or less.
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International Classification: G02F 1/01 (20060101); G01J 4/00 (20060101);