Abstract: The invention relates generally to ion mobility based systems, methods and devices for analyzing samples and, more particularly, to sample pre-separation and amplification.

Abstract: Apparatus and a method for treating a fluid. The apparatus includes a fluid passageway, at least one source of irradiation, and curved reflecting troughs for reflecting irradiation onto the fluid passageway. A space is defined between the closed ends of the troughs. A first set of reflectors joins end edges of the trough open ends, and a second set of reflectors joins the top and bottom edges of the troughs and the first set of reflectors. The reflectors and troughs define a chamber. The fluid passageway and the at least one source of irradiation are positioned in the chamber, with each source of irradiation within a respective trough. At least one of the fluid passageway and the at least one source of irradiation is spaced from any focal axes so as to provide a substantially uniform irradiation distribution within the fluid in the fluid passageway.

Abstract: A toothbrush or the like may be inserted, bristles downward, into an aperture in a cap removably attached to a body of the apparatus. A peg may be inserted into any one of the apertures in order to allow an electric toothbrush head or other non-standard type of toothbrush to be used. An internal ultraviolet (UV) bulb is located in the apparatus to sanitize the toothbrushes. A timer/control circuit may activate the UV bulb for three minutes and then shut off. To prevent the recurrence of bacterial growth over time, the UV bulb may be automatically reactivated by the timer/control circuit after six hours and activated for another 3 minutes or another amount of time, as programmed. A safety mechanism may interact with a spring-loaded microswitch coupled to the timer/control circuit to disable the unit if the cap is removed. The body has a rounded bottom and is weighted such that the sanitizing apparatus sits upright on a flat surface and returns to an upright position if tipped.

Abstract: An ion trap mass spectrometry system adapted for portability and related method includes an ion source for generating ions from a sample to be analyzed, and a resistive drift tube coupled to an output of the ion source for receiving the ions injected therein. The resistive drift tube decelerates the ions to provide cooled ions having a mean translational kinetic energy of less than 5 keV. A miniature ion trap or trap array, such having apertures <1 mm, is coupled to an output of the resistive drift tube for trapping the cooled ions. A spectrometer is coupled to the miniature ion trap for analyzing the cooled ions.

Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

Abstract: An apparatus 1A for processing carbon nanotubes (CNTs) includes: a processing chamber 3 for housing to-be-processed liquid 2 with CNT raw material 5 to be fragmented being suspended in a solvent 4; and a pulse irradiation light source 10 for applying pulse light having a predetermined wavelength for fragmentation of the CNTs in the solvent 4 to the to-be-processed liquid 2 housed in the processing chamber 3. This achieves a method and apparatus for processing carbon nanotubes that can fragment CNTs efficiently, and carbon nanotube dispersion liquid and carbon nanotube powder produced by the same.

Abstract: A method for sample examination in a dual-beam FIB calculates a first angle as a function of second, third and fourth angles defined by the geometry of the FIB and the tilt of the specimen stage. A fifth angle is calculated as a function of the stated angles, where the fifth angle is the angle between the long axis of an excised sample and the projection of the axis of the probe shaft onto the X-Y plane. The specimen stage is rotated by the calculated fifth angle, followed by attachment to the probe tip and lift-out. The sample may then be positioned perpendicular to the axis of the FIB electron beam for STEM analysis by rotation of the probe shaft through the first angle.

Abstract: There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.

Abstract: A tandem mass spectrometer includes a linear time-of-flight mass analyzer and curved field reflectron mass analyzer. The curved-field reflectron mass analyzer is disposed at an end of the linear time-of-flight mass analyzer such that ions having a plurality of ion masses formed in the linear time-of-flight analyzer such that ions having a plurality of ion masses formed in the linear time-of-flight analyzer enter the curved-field reflectron mass analyzer. The tandem mass spectrometer also includes a mass selection gate disposed between the time-of-flight mass analyzer and the curved-field reflectron mass analyzer. The mass selection gate selects an ion mass from the plurality of ion masses. Furthermore, the tandem mass spectrometer also includes a dissociating component located in a path of the ions formed in the linear time-of-flight analyzer. The dissociating component causes dissociation of the ions into a plurality of ion fragments.

Abstract: Radiation source for electromagnetic radiation the major effective component of which is in the near-infrared region, in particular in the wavelength region between 0.8 ?m and 1.5 ?m, to form an elongated irradiation zone, with an elongated halogen lamp comprising a glass body that has a tubular shape with bases at the ends and contains at least one spiral filament, and with an elongated reflector, such that the bases of the halogen lamp are disposed in the region of the reflector surface or behind it with reference to the position of the halogen lamp, wherein the ends of the halogen lamp are bent around toward the reflector and the spiral filaments or at least one of them is made thicker or is more densely wound in the bent region of the glass body, in such a way that the radiation flux density of the radiation source is substantially constant in the long direction of the source, between the outermost points of the bases.

Abstract: One embodiment disclosed relates to a reflective electron patterning device. The device includes a pattern on a surface. There is an electron reflective portion of the pattern and an electron non-reflective portion of the pattern. Another embodiment disclosed relates to a method of reflecting a pattern of electrons. An electron beam is generated to be incident upon a surface. The pattern is formed on the surface. The incident electrons are reflected from a reflective portion of the pattern are prevented from being reflected from a non-reflective portion of the pattern.

Abstract: An instrument for non-invasively measuring nanoparticle exposure includes a corona discharge element generating ions to effect unipolar diffusion charging of an aerosol, followed by an ion trap for removing excess ions and a portion of the charged particles with electrical mobilities above a threshold. Downstream, an electrically conductive HEPA filter or other collecting element accumulates the charged particles and provides the resultant current to an electrometer amplifier. The instrument is tunable to alter the electrometer amplifier output toward closer correspondence with a selected function describing particle behavior, e.g. nanoparticle deposition in a selected region of the respiratory system. Tuning entails adjusting voltages applied to one or more of the ion trap, the corona discharge element and the collecting element. Alternatively, tuning involves adjusting the aerosol flow rate, either directly or in comparison to the flow rate of a gas conducting the ions toward merger with the aerosol.

Abstract: An insulator usable in high current ion implantation systems includes increased surface due to the configuration of an inner cylinder and an outer cylinder coupled to the inner cylinder at one end. A cylindrical cavity extends between the two cylinders increasing the surface area and making the insulator resistant to being coated by a coating that could produce a leakage path.

Abstract: An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.

Abstract: An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

Abstract: Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber, a heating device in communication with the vacuum chamber, and combinations thereof are provided. In one embodiment, the vacuum chamber comprises an electron source wherein the electron source comprises a cathode connected to a high voltage source, an anode connected to a low voltage source, and a substrate support. In another embodiment, the vacuum chamber comprises a grid located between the anode and the substrate support. In one embodiment the heating device comprises a first parallel light array and a second light array positioned such that the first parallel light array and the second light array intersect. In one embodiment the thermocouple assembly comprises a temperature sensor made of aluminum nitride.

Abstract: A system and method for manipulating and processing nanowires in solution with arrays of holographic optical traps. The system and method of the present invention is capable of creating hundreds of individually controlled optical traps with the ability to manipulate objects in three dimensions. Individual nanowires with cross-sections as small as 20 nm and lengths exceeding 20 ?m are capable of being isolated, translated, rotated and deposited onto a substrate with holographic optical trap arrays under conditions where single traps have no discernible influence. Spatially localized photothermal and photochemical processes induced by the well-focused traps can also be used to melt localized domains on individual nanowires and to fuse nanowire junctions.

Abstract: Method and system for producing a neutral beam source is described. The neutral beam source comprises a plasma generation system for forming a first plasma in a first plasma region, a plasma heating system for heating electrons from the first plasma region in a second plasma region to form a second plasma, and a neutralizer grid for neutralizing ion species from the second plasma in the second plasma region. Furthermore, the neutral beam source comprises a pumping system that enables use of the neutral beam source for semiconductor processing applications, such as etching processes.

Abstract: An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

Abstract: A shielding assembly for use in a semiconductor manufacturing apparatus, such as an ion implantation apparatus, includes one or more removable shielding members configured to cover inner surfaces of a mass analyzing chamber. The shielding assembly reduces process by-products from accumulating on the inner surfaces. In one embodiment, a shielding assembly includes first and second shielding members, each having a unitary construction and configured to cover a magnetic area in the mass analyzing chamber. The shielding members desirably are made entirely of graphite or impregnated graphite to minimize contamination of the semiconductor device being processed caused by metal particles eroded from the inner surfaces of the mass analyzing chamber.