Post-procedural mask
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The broken lines in the drawings are for illustrative purposes only and form no part of the claimed design. For example, broken lines formed by equal length dashes show unclaimed portions of the design. Broken lines formed of unequal length dashes (i.e., dash-dot) show boundaries between claimed and unclaimed portions of the design.
Claims
The ornamental design for a post-procedural mask, as shown and described.
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Type: Grant
Filed: Nov 21, 2022
Date of Patent: Jul 8, 2025
Assignee:
Inventors: Amy Billups Batra (New Hope, PA), Jaya Krishna Rose Batra (New Hope, PA), Sanjay Batra (New Hope, PA)
Primary Examiner: Darcey E Gottschalk
Application Number: 29/860,604