Face mask
Description
The broken lines illustrate portions of the face mask that form no part of the claimed design.
Claims
The ornamental design for a face mask as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
| D421299 | February 29, 2000 | Brostrom |
| D471627 | March 11, 2003 | Mittelstadt |
| D473937 | April 29, 2003 | Fecteau |
| D568986 | May 13, 2008 | Holmquist-Brown |
| D645956 | September 27, 2011 | Grimsley |
| D652507 | January 17, 2012 | Mittelstadt |
| D655404 | March 6, 2012 | Mittelstadt |
| D1001271 | October 10, 2023 | Wu |
| 12173153 | December 24, 2024 | Subramaniam |
| D1061872 | February 11, 2025 | Ma |
| 20180185677 | July 5, 2018 | Curran |
| 20230398382 | December 14, 2023 | Ma |
| 20250144453 | May 8, 2025 | Moffat |
- T-61 Half Face Respirator Gas Mask with Organic Vapor and Particulate Filtration by Parcil Safety. Oldest review date: Jan. 6, 2019. Retrieval date: Feb. 22, 2024. Retrieved from internet: https://parcilsafety.com/products/t61-gas-mask-respirator (Year: 2019).
Patent History
Patent number: D1097124
Type: Grant
Filed: Dec 9, 2024
Date of Patent: Oct 7, 2025
Inventors: Chuang Ma (Shanghai), Sheng Zhou (Shanghai), Hongbing Xiang (Shanghai), Xiaojin Han (Shanghai)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/977,584
Type: Grant
Filed: Dec 9, 2024
Date of Patent: Oct 7, 2025
Inventors: Chuang Ma (Shanghai), Sheng Zhou (Shanghai), Hongbing Xiang (Shanghai), Xiaojin Han (Shanghai)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/977,584
Classifications
Current U.S. Class:
Mask (D24/110.1)