Face mask

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Description

FIG. 1 is a perspective view of a face mask showing the new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines illustrate portions of the face mask that form no part of the claimed design.

Claims

The ornamental design for a face mask as shown and described.

Referenced Cited
U.S. Patent Documents
D421299 February 29, 2000 Brostrom
D471627 March 11, 2003 Mittelstadt
D473937 April 29, 2003 Fecteau
D568986 May 13, 2008 Holmquist-Brown
D645956 September 27, 2011 Grimsley
D652507 January 17, 2012 Mittelstadt
D655404 March 6, 2012 Mittelstadt
D1001271 October 10, 2023 Wu
12173153 December 24, 2024 Subramaniam
D1061872 February 11, 2025 Ma
20180185677 July 5, 2018 Curran
20230398382 December 14, 2023 Ma
20250144453 May 8, 2025 Moffat
Other references
  • T-61 Half Face Respirator Gas Mask with Organic Vapor and Particulate Filtration by Parcil Safety. Oldest review date: Jan. 6, 2019. Retrieval date: Feb. 22, 2024. Retrieved from internet: https://parcilsafety.com/products/t61-gas-mask-respirator (Year: 2019).
Patent History
Patent number: D1097124
Type: Grant
Filed: Dec 9, 2024
Date of Patent: Oct 7, 2025
Inventors: Chuang Ma (Shanghai), Sheng Zhou (Shanghai), Hongbing Xiang (Shanghai), Xiaojin Han (Shanghai)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/977,584
Classifications
Current U.S. Class: Mask (D24/110.1)