Frame for nasal mask

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Description

FIG. 1 is a top, front and left perspective view of a frame for nasal mask showing our new design;

FIG. 2 is a bottom, rear and right perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a top plan view thereof; and,

FIG. 8 is a bottom plan view thereof.

The broken lines in the drawings illustrate portions of the frame for nasal mask which form no part of the claimed design.

Claims

The ornamental design for a frame for nasal mask as shown and described.

Referenced Cited
U.S. Patent Documents
D623288 September 7, 2010 Lubke
D664250 July 24, 2012 Scheiner
D820432 June 12, 2018 Scheiner
D930148 September 7, 2021 Dantanarayana
D930150 September 7, 2021 Manjunath
D950708 May 3, 2022 Dantanarayana
D1031021 June 11, 2024 Choo
D1033632 July 2, 2024 He
D1051357 November 12, 2024 He
D1094693 September 23, 2025 Wang
20160051784 February 25, 2016 Eury
20230057539 February 23, 2023 Chien
Foreign Patent Documents
D1731323 December 2022 JP
Other references
  • Nasal Mask (N6) by BMC Medical. Retrieval date: Sep. 4, 2024. Retrieved from internet: https://en.bmc-medical.com/ products/mask/nasal-mask/333.html (Year: 2024).
Patent History
Patent number: D1123147
Type: Grant
Filed: Mar 30, 2022
Date of Patent: Apr 21, 2026
Assignee: BMC (Tianjin) Medical Co., Ltd. (Tianjin)
Inventors: Yajie Wang (Tianjin), Mingzhao Zhou (Tianjin), Zhi Zhuang (Tianjin)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/832,768
Classifications
Current U.S. Class: Mask (D24/110.1)