Frame for nasal mask
Description
The broken lines in the drawings illustrate portions of the frame for nasal mask which form no part of the claimed design.
Claims
The ornamental design for a frame for nasal mask as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
| D623288 | September 7, 2010 | Lubke |
| D664250 | July 24, 2012 | Scheiner |
| D820432 | June 12, 2018 | Scheiner |
| D930148 | September 7, 2021 | Dantanarayana |
| D930150 | September 7, 2021 | Manjunath |
| D950708 | May 3, 2022 | Dantanarayana |
| D1031021 | June 11, 2024 | Choo |
| D1033632 | July 2, 2024 | He |
| D1051357 | November 12, 2024 | He |
| D1094693 | September 23, 2025 | Wang |
| 20160051784 | February 25, 2016 | Eury |
| 20230057539 | February 23, 2023 | Chien |
| D1731323 | December 2022 | JP |
- Nasal Mask (N6) by BMC Medical. Retrieval date: Sep. 4, 2024. Retrieved from internet: https://en.bmc-medical.com/ products/mask/nasal-mask/333.html (Year: 2024).
Patent History
Patent number: D1123147
Type: Grant
Filed: Mar 30, 2022
Date of Patent: Apr 21, 2026
Assignee: BMC (Tianjin) Medical Co., Ltd. (Tianjin)
Inventors: Yajie Wang (Tianjin), Mingzhao Zhou (Tianjin), Zhi Zhuang (Tianjin)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/832,768
Type: Grant
Filed: Mar 30, 2022
Date of Patent: Apr 21, 2026
Assignee: BMC (Tianjin) Medical Co., Ltd. (Tianjin)
Inventors: Yajie Wang (Tianjin), Mingzhao Zhou (Tianjin), Zhi Zhuang (Tianjin)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/832,768
Classifications
Current U.S. Class:
Mask (D24/110.1)