Mask

- DCSTAR INC
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Description

FIG. 1 is a front view of a mask showing my new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a top view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a perspective view thereof; and,

FIG. 8 is another perspective view thereof.

The broken lines depict portions of the mask that form no part of the claimed design. The dot-dash boundary lines illustrate boundaries of the claimed design and form no part of the claimed design.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D556898 December 4, 2007 Guney
D556901 December 4, 2007 Davidson
7640933 January 5, 2010 Ho
D761415 July 12, 2016 Walker
10926050 February 23, 2021 Eves
11471633 October 18, 2022 Baba
D994876 August 8, 2023 Bornholdt
D1003431 October 31, 2023 Rothermel
D1007669 December 12, 2023 Li
D1019936 March 26, 2024 He
D1034959 July 9, 2024 He
D1036157 July 23, 2024 He
12274829 April 15, 2025 Luo
D1084298 July 15, 2025 He
D1084299 July 15, 2025 Luo
20020005198 January 17, 2002 Kwok
20070125384 June 7, 2007 Zollinger
20140144448 May 29, 2014 Eifler
20210038848 February 11, 2021 Eves
20240382711 November 21, 2024 Wang
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Foreign Patent Documents
15075473-0010 November 2024 EM
Patent History
Patent number: D1131783
Type: Grant
Filed: May 2, 2024
Date of Patent: Jun 23, 2026
Assignee: DCSTAR INC (New York, NY)
Inventor: David Luo (New York, NY)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/940,515
Classifications