Semi-conductor substrate with conducting pattern

- Ibiden Co., Ltd.
Description

FIG. 1 is a top perspective view of a substrate with conducting pattern showing our new design;

FIG. 2 is a bottom perspective view thereof;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a rear elevational view thereof; and

FIG. 6 is a front elevational view thereof;

FIG. 7 is a top plan view thereof; and

FIG. 8 is a bottom plan view thereof.

Referenced Cited
U.S. Patent Documents
4288841 September 8, 1981 Gogal
4437141 March 13, 1984 Prokop
4513355 April 23, 1985 Shroeder et al.
Foreign Patent Documents
0232837 August 1987 EPX
644662 February 1985 JPX
647072 March 1985 JPX
647074 March 1985 JPX
647078 March 1985 JPX
673983-1 March 1986 JPX
673983 March 1986 JPX
673984 March 1986 JPX
0035653 February 1987 JPX
Patent History
Patent number: D319045
Type: Grant
Filed: Apr 13, 1988
Date of Patent: Aug 13, 1991
Assignee: Ibiden Co., Ltd. (Ogaki)
Inventors: Terutomi Hasegawa (Ogaki), Nobumichi Goto (Seki)
Primary Examiner: Susan J. Lucas
Assistant Examiner: Joel Sincavage
Law Firm: Lorusso & Loud
Application Number: 7/181,256