Heat insulating cylinder for thermal treatment of semiconductor wafers

- Tel Sagami Limited
Description

FIG. 1 is a front elevational view of a heat insulating cylinder for thermal treatment of semiconductor wafers showing our new design;

FIG. 2 is a right side elevational view, the left side elevational view being a mirror image;

FIG. 3 is a top plan view;

FIG. 4 is a bottom plan view; and,

FIG. 5 is a rear elevational view thereof.

Referenced Cited
U.S. Patent Documents
D215093 September 1969 Cone
D234847 April 1975 Hoffman
D258526 March 10, 1981 Nederman
3604694 September 1971 Muller
3737282 June 1973 Hearn et al.
3744650 July 1973 Henebry et al.
4761134 August 2, 1988 Foster
4849608 July 18, 1989 Muraoka et al.
Foreign Patent Documents
17213 1888 GBX
Patent History
Patent number: D326273
Type: Grant
Filed: Jan 25, 1989
Date of Patent: May 19, 1992
Assignee: Tel Sagami Limited (Kanagawa)
Inventors: Ken Nakao (Sagamihara), Seishiro Sato (Machida), Wataru Ohkase (Sagamihara)
Primary Examiner: Donald P. Walsh
Assistant Examiner: Antoine D. Davis
Law Firm: Oblon, Spivak, McClelland, Maier & Neustadt
Application Number: 7/301,997
Classifications
Current U.S. Class: D15/1441