Processing machine for electron beam lithography system

- Hitachi, Ltd.
Description

FIG. 1 is a front, top and right side elevational perspective view of a processing machine showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right elevational view thereof;

FIG. 4 is a left elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a front, top and right side elevational perspective view thereof in condition that a drawer on which a keyboard and a mouse pad is disposed .

Referenced Cited
U.S. Patent Documents
D342909 January 4, 1994 Marchais
D344719 March 1, 1994 Wang et al.
Patent History
Patent number: D352911
Type: Grant
Filed: Feb 8, 1993
Date of Patent: Nov 29, 1994
Assignee: Hitachi, Ltd. (Tokyo)
Inventors: Takashi Yamamoto (Kodaira), Tomoyuki Miyata (Kokubunji), Kazunori Hasimoto (Tachikawa), Mitsuru Ohnuma (Tokyo), Toshihiko Wada (Musashimurayama), Seishiro Sato (Hitachi)
Primary Examiner: Alan P. Douglas
Assistant Examiner: Antoine D. Davis
Law Firm: Antonelli, Terry, Stout & Kraus
Application Number: 0/4,587