Inner tube for use in a semiconductor wafer heat processing apparatus

- Tokyo Electron Limited
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Description

FIG. 1 a perspective view of an inner tube for use in a semiconductor wafer heat processing apparatus;

FIG. 2 a front elevational view thereof;

FIG. 3 a top plan view thereof; and,

FIG. 4 a cross-sectional view taken along line IV--IV in FIG. 3.

Referenced Cited
U.S. Patent Documents
4857689 August 15, 1989 Lee
5314574 May 24, 1994 Takahashi
5320218 June 14, 1994 Yamashita et al.
5752796 May 19, 1998 Muka
Patent History
Patent number: D407696
Type: Grant
Filed: Feb 2, 1998
Date of Patent: Apr 6, 1999
Assignee: Tokyo Electron Limited (Tokyo-to)
Inventor: Tomohisa Shimazu (Shiroyama-machi)
Primary Examiner: Brian N. Vinson
Law Firm: Ladas & Parry
Application Number: 0/82,977
Classifications
Current U.S. Class: Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)
International Classification: 1303;