Electrostatic chuck with improved spacing mask and workpiece detection device
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Description
FIG. 1 depicts a top view of the electrostatic chuck with improved spacing mask and workpiece detection device;
FIG. 2 depicts an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1;
FIG. 3 depicts a detailed view of part of a surface and circumferential edge of the electrostatic chuck seen of FIG. 2;
FIG. 4 depicts an elevation view of the electrostatic chuck when looking down along the y-axis of FIG. 1;
FIG. 5 depicts an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1, the view when looking to the right being a mirror image to that of FIG. 5; and,
FIG. 6 is a bottom view of the electrostatic chuck.
Referenced Cited
Patent History
Patent number: D425919
Type: Grant
Filed: Nov 14, 1997
Date of Patent: May 30, 2000
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventors: Vincent E. Burkhart (San Jose, CA), Allen Flanigan (San Jose, CA), Steven Sansoni (San Jose, CA)
Primary Examiner: Antoine Duval Davis
Law Firm: Thomason, Moser & Patterson
Application Number: 0/79,585
Type: Grant
Filed: Nov 14, 1997
Date of Patent: May 30, 2000
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventors: Vincent E. Burkhart (San Jose, CA), Allen Flanigan (San Jose, CA), Steven Sansoni (San Jose, CA)
Primary Examiner: Antoine Duval Davis
Law Firm: Thomason, Moser & Patterson
Application Number: 0/79,585
Classifications