Apertured, continuous filament fabric
Latest Polymer Group, Inc. Patents:
Description
The sole FIGURE is a fragmentary, elevational view of one face of an apertured, continuous filament fabric showing my new design.
Claims
The ornamental design for an apertured, continuous filament fabric, as shown and described.
Referenced Cited
U.S. Patent Documents
D11534 | December 1879 | Maertens |
D78124 | March 1929 | Rice |
3020184 | February 1962 | Cubberley et al. |
3047444 | July 1962 | Harwood |
3485695 | December 1969 | Ness |
4548856 | October 22, 1985 | Ali Khan et al. |
D464807 | October 29, 2002 | Carter |
6531014 | March 11, 2003 | Kobayashi et al. |
D481872 | November 11, 2003 | Hennel et al. |
D495150 | August 31, 2004 | Hennel et al. |
D495888 | September 14, 2004 | Hennel et al. |
D496795 | October 5, 2004 | Hennel et al. |
D497260 | October 19, 2004 | Hennel et al. |
Patent History
Patent number: D510194
Type: Grant
Filed: Sep 29, 2004
Date of Patent: Oct 4, 2005
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventor: Nick M. Carter (Mooresville, NC)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/214,357
Type: Grant
Filed: Sep 29, 2004
Date of Patent: Oct 4, 2005
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventor: Nick M. Carter (Mooresville, NC)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/214,357
Classifications
Current U.S. Class:
D5/47