Apertured, continuous filament fabric
Latest Polymer Group, Inc. Patents:
Description
The sole FIGURE is a fragmentary, elevational view of one face of an apertured, continuous filament fabric showing my new design.
Claims
The ornamental design for an apertured, continuous filament fabric, as shown and described.
Referenced Cited
U.S. Patent Documents
| D11534 | December 1879 | Maertens |
| 3020184 | February 1962 | Cubberley et al. |
| 3047444 | July 1962 | Harwood |
| 3485695 | December 1969 | Ness |
| 4548856 | October 22, 1985 | Ali Khan et al. |
| 6531014 | March 11, 2003 | Kobayashi et al. |
| D481872 | November 11, 2003 | Hennel et al. |
| D495150 | August 31, 2004 | Hennel et al. |
| D495888 | September 14, 2004 | Hennel et al. |
| D496795 | October 5, 2004 | Hennel et al. |
| D497260 | October 19, 2004 | Hennel et al. |
Patent History
Patent number: D511898
Type: Grant
Filed: Sep 29, 2004
Date of Patent: Nov 29, 2005
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventor: Nick M. Carter (Mooresville, NC)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/214,358
Type: Grant
Filed: Sep 29, 2004
Date of Patent: Nov 29, 2005
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventor: Nick M. Carter (Mooresville, NC)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/214,358
Classifications
Current U.S. Class:
D5/47
