End treatment for a ring mechanism

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Description

FIG. 1 is a perspective view of an end treatment for a ring mechanism showing my new design;

FIG. 2 is an enlarged fragmentary perspective view of FIG. 1;

FIG. 3 is a front elevation view thereof;

FIG. 4 is a right side elevation view thereof, the left side elevation view being a mirror image; and,

FIG. 5 is a bottom plan view thereof.

The broken lines shown in the drawings indicate structure and features which form no part of the claimed design.

Claims

The ornamental design for an end treatment for a ring mechanism, as shown and described.

Referenced Cited
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Foreign Patent Documents
98524 February 2003 CA
Patent History
Patent number: D514621
Type: Grant
Filed: Nov 10, 2003
Date of Patent: Feb 7, 2006
Assignee: World Wide Stationery Manufacturing Company, Limited (Kwai Chung)
Inventor: Hung Yu Cheng (Hong Kong)
Primary Examiner: Jeffrey Asch
Assistant Examiner: Elizabeth Albert
Attorney: Senniger Powers
Application Number: 29/193,545
Classifications
Current U.S. Class: Element Or Attachment (D19/32)