Photomask blank
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Description
The broken line showing is for illustrative purposes only and forms no part of the claimed design.
Claims
The ornamental design for a photomask blank, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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| D502866 | March 15, 2005 | Woollard |
| D537048 | February 20, 2007 | Mitsui |
| D543160 | May 22, 2007 | Mitsui et al. |
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| 20030118918 | June 26, 2003 | Ohta |
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- U.S. Appl. No. 29/213,840, filed Sep. 23, 2004, Inventor: Masaru Mitsui; Entitled: Photomask Blank.
Patent History
Patent number: D568839
Type: Grant
Filed: Jan 23, 2007
Date of Patent: May 13, 2008
Assignee: Hoya Corporation (Tokyo)
Inventors: Masaru Mitsui (Mukawa-mura), Shigekazu Matsui (Nirasaki), Masao Ushida (Kofu), Osamu Nagarekawa (Nirasaki)
Primary Examiner: Selina Sikder
Attorney: Frishauf, Holtz, Goodman & Chick, P.C.
Application Number: 29/276,360
Type: Grant
Filed: Jan 23, 2007
Date of Patent: May 13, 2008
Assignee: Hoya Corporation (Tokyo)
Inventors: Masaru Mitsui (Mukawa-mura), Shigekazu Matsui (Nirasaki), Masao Ushida (Kofu), Osamu Nagarekawa (Nirasaki)
Primary Examiner: Selina Sikder
Attorney: Frishauf, Holtz, Goodman & Chick, P.C.
Application Number: 29/276,360
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)