Top panel for microwave introduction window of a plasma processing apparatus

- Tokyo Electron Limited
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Description

FIG. 1 is a front view of a top panel for microwave introduction window of plasma processing apparatus showing our new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a sectional view taken along line 77 of FIG. 5;

FIG. 8 is an enlarged view taken along line 88 of FIG. 7;

FIG. 9 is an enlarged view taken along line 99 of FIG. 7; and,

FIG. 10 is a perspective view thereof.

Claims

The ornamental design for a top panel for microwave introduction window of a plasma processing apparatus, as show and described.

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Patent History
Patent number: D571832
Type: Grant
Filed: Jan 30, 2006
Date of Patent: Jun 24, 2008
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Kinya Ota (Amagasaki), Cai Zhong Tian (Amagasaki), Junichi Kitagawa (Amagasaki)
Primary Examiner: Sandra Snapp
Assistant Examiner: Patricia Palasik
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Application Number: 29/252,833
Classifications