Microwave introducing antenna for a plasma processing apparatus

- Tokyo Electron Limited
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Description

FIG. 1 is a front view of a microwave introducing antenna for a plasma processing apparatus showing our new design:

FIG. 2 is a right side view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a sectional view taken along line 4—4 of FIG. 1 thereof; and,

FIG. 5 is a perspective view thereof.

Claims

The ornamental design for a microwave introducing antenna for a plasma processing apparatus, as shown and described.

Referenced Cited
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Foreign Patent Documents
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Patent History
Patent number: D572707
Type: Grant
Filed: Jun 14, 2007
Date of Patent: Jul 8, 2008
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Jun Yamashita (Amagasaki), Cai Zhong Tian (Amagasaki)
Primary Examiner: Robert M. Spear
Assistant Examiner: John Windmuller
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Application Number: 29/281,067