Cover for a heater stage of a plasma processing apparatus

- Tokyo Electron Limited
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Description

FIG. 1 is a front view of a cover for a heater stage of a plasma processing apparatus showing my new design:

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a sectional view taken along line 55 of FIG. 1 thereof;

FIG. 6 is an enlarged view taken along line 66 of FIG. 5 thereof,

FIG. 7 is an enlarged view taken along line 77 of FIG. 5 thereof; and,

FIG. 8 is a perspective view thereof.

Claims

The ornamental design for a cover for a heater stage of a plasma processing apparatus, as shown.

Referenced Cited
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Patent History
Patent number: D582949
Type: Grant
Filed: Jun 14, 2007
Date of Patent: Dec 16, 2008
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Jun Yamashita (Amagasaki)
Primary Examiner: Sandra Snapp
Assistant Examiner: Patricia Palasik
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Application Number: 29/281,069
Classifications