Substrate for spectroscopic analysis

- HAMAMATSU PHOTONICS K.K.
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Description

FIG. 1 is a front view of a substrate for spectroscopic analysis according to our new design.

FIG. 2 is a rear view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 3 is a top plan view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 4 is a bottom view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 5 is a right side view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 6 is a left side view of the substrate for spectroscopic analysis of FIG. 1.

FIG. 7 is a perspective of the substrate for spectroscopic analysis of FIG. 1.

FIG. 8 is a top plan view without the cover part of the substrate for spectroscopic analysis of FIG. 1.

FIG. 9 is a perspective view without the cover part of the substrate for spectroscopic analysis of FIG. 1.

FIG. 10 is a sectional view taken along the line 10-10 of the substrate for spectroscopic analysis of FIG. 3.

FIG. 11 is a sectional view taken along the line 11-11 of the substrate for spectroscopic analysis of FIG. 1.

FIG. 12 is a sectional view taken along the line 12-12 of the substrate for spectroscopic analysis of FIG. 8.

FIG. 13 is an enlarged sectional view taken along the line 13-13 of the substrate for spectroscopic analysis of FIG. 10; and,

FIG. 14 is a reference sectional view taken along the line 10-10 of the substrate for spectroscopic analysis of FIG. 3 in use, wherein the element is inserted in the concave part for element and the glass plate is set above the cover part.

The features shown in dotted lines depict environmental subject matter only and form no part of the claimed design.

The broken lines having alternating long and short segments define bounds of the claimed design and form no part thereof.

The whole of the substrate for spectroscopic analysis of our design is transparent.

The broken lines show portions of the substrate for spectroscopic analysis that form no part of the claimed design.

Claims

The ornamental design for a substrate for spectroscopic analysis, as shown and described.

Referenced Cited
U.S. Patent Documents
4761381 August 2, 1988 Blatt et al.
D302294 July 18, 1989 Hillman
D320269 September 24, 1991 Hammond
D324426 March 3, 1992 Fan et al.
D328135 July 21, 1992 Fan et al.
D351913 October 25, 1994 Hieb et al.
D366938 February 6, 1996 Shartle et al.
D383852 September 16, 1997 Shartle et al.
D395708 June 30, 1998 Shartle et al.
D461906 August 20, 2002 Pham
D467348 December 17, 2002 McMichael et al.
D500142 December 21, 2004 Crisanti et al.
D512512 December 6, 2005 Bell et al.
D528215 September 12, 2006 Malmsater
D530826 October 24, 2006 Rich et al.
D531321 October 31, 2006 Godfrey et al.
D540953 April 17, 2007 Ramel et al.
D559995 January 15, 2008 Handique et al.
D621060 August 3, 2010 Handique
D636893 April 26, 2011 Nicholls et al.
D639976 June 14, 2011 Francis et al.
D639977 June 14, 2011 Francis et al.
D640389 June 21, 2011 Francis et al.
D669191 October 16, 2012 Handique
8330951 December 11, 2012 Li et al.
D676145 February 12, 2013 Kouge et al.
D679024 March 26, 2013 Kouge et al.
D692578 October 29, 2013 Kikuhara et al.
D700711 March 4, 2014 Kikuhara et al.
D702364 April 8, 2014 Iqbal et al.
8709787 April 29, 2014 Handique
20110268630 November 3, 2011 Williams et al.
Foreign Patent Documents
WO-2013/062540 May 2013 WO
Other references
  • U.S. Appl. No. 29/477,936, Hamamatsu Photonics K.K.
  • U.S. Appl. No. 29/477,940, Hamamatsu Photonics K.K.
  • U.S. Appl. No. 29/477,937, Hamamatsu Photonics K.K.
  • U.S. Appl. No. 29/477,957, Hamamatsu Photonics K.K.
  • U.S. Appl. No. 29/477,934, Hamamatsu Photonics K.K.
  • Leaflet “rSERS™ Raman Enhancing Media,” Raman Systems, a wholly owned subsidiary of Agiltron, Inc., www.ramansystems.com.
Patent History
Patent number: D739954
Type: Grant
Filed: Dec 30, 2013
Date of Patent: Sep 29, 2015
Assignee: HAMAMATSU PHOTONICS K.K. (Hamamatsu-shi, Shizuoka)
Inventors: Masashi Ito (Hamamatsu), Katsumi Shibayama (Hamamatsu), Kazuto Ofuji (Hamamatsu), Hiroki Oyama (Hamamatsu), Yoshihiro Maruyama (Hamamatsu)
Primary Examiner: T. Chase Nelson
Assistant Examiner: Mark Cavanna
Application Number: 29/477,946
Classifications