Robot cleaner
Latest Samsung Electronics Patents:
- WAFER POLISHING DEVICE
- SUBSTRATE PROCESSING SYSTEM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- CLOTHES CARE APPARATUS
- METHOD AND APPARATUS WITH SEMICONDUCTOR PROCESS RELIABILITY MEASUREMENT
- DISPLAY DEVICE COMPRISING MIRROR DISPLAY COMPOSED OF PLURALITY OF LAYERS, AND CONTROL METHOD THEREFOR
Description
The broken lines illustrating portions of the robot cleaner are for environmental purposes only and form no part of the claimed design.
Claims
We claim the ornamental design for a robot cleaner, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
| D653824 | February 7, 2012 | Kim |
| D690478 | September 24, 2013 | Li et al. |
| D690887 | October 1, 2013 | Lee |
| D691337 | October 8, 2013 | Kim |
| D703397 | April 22, 2014 | Sungkyung |
| D704400 | May 6, 2014 | Shin |
| D715504 | October 14, 2014 | Deoksang |
| 20140130290 | May 15, 2014 | Jang |
| 20140182627 | July 3, 2014 | Williams |
| 30-2012-0054199 | February 2014 | KR |
- Korean Design Registration No. 30-0659436 English Translation.
- Korean Design Registration No. 30-2012-0054199 English Translation.
Patent History
Patent number: D785261
Type: Grant
Filed: Oct 23, 2015
Date of Patent: Apr 25, 2017
Assignee: SAMSUNG ELECTRONICS CO., LTD. (Suwon-si, Gyeonggi-Do)
Inventors: Hyoungsub Choi (Goyang-si), Euiju Lee (Guri-si)
Primary Examiner: Ruth McInroy
Application Number: 29/543,341
Type: Grant
Filed: Oct 23, 2015
Date of Patent: Apr 25, 2017
Assignee: SAMSUNG ELECTRONICS CO., LTD. (Suwon-si, Gyeonggi-Do)
Inventors: Hyoungsub Choi (Goyang-si), Euiju Lee (Guri-si)
Primary Examiner: Ruth McInroy
Application Number: 29/543,341
Classifications
Current U.S. Class:
For Vacuum Cleaner (D32/31)