Gun holster

- CYTAC TECHNOLOGY LIMITED
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Description

FIG. 1 is a perspective view of a gun holster showing my new design;

FIG. 2 is another perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof; and,

FIG. 9 is a perspective view of the gun holster where the gun holster is in a configuration of use.

The broken lines in the drawings depict portions of the gun holster, and additional environment matter in FIG. 9, that form no part of the claimed design.

Claims

The ornamental design for a gun holster, as shown and described.

Referenced Cited
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Foreign Patent Documents
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Other references
  • Universal OWB Holster for Berreta, first available Jun. 3, 2020, amazon.com [online], [site visited Sep. 24, 2021], Available at internet URL: https://www.amazon.com/dp/B07YZ13Q2S/?th=1 (Year: 2020).
  • Amomax Per-Fit OWB Universal Holster, first available Nov. 23, 2020, amazon.com [online], [site visited Sep. 24, 2021], Available at internet URL: https://www.amazon.com/Amomax-Universal-Holster-Handguns-Rotation/dp/B08P1YMMBT (Year: 2020).
  • ADAPTX Universal Level 2 Retention Holster—Is it really Universal?, video by YouTube user AirsoftStation.com, posted on Dec. 14, 2018, youtube.com [online], [site visited Sep. 24, 2021], Available at internet URL: https://www.youtube.com/watch?v=9wWdk49fzaA (Year: 2018).
Patent History
Patent number: D945149
Type: Grant
Filed: Apr 24, 2020
Date of Patent: Mar 8, 2022
Assignee: CYTAC TECHNOLOGY LIMITED (Shenzhen)
Inventor: Yong Zhang (Shenzhen)
Primary Examiner: Michelle E. Wilson
Assistant Examiner: Caitlin A Laverty
Application Number: 29/732,430
Classifications
Current U.S. Class: D3/222