Photography stand

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Description

FIG. 1 is a front perspective view of a photography stand showing our new design;

FIG. 2 is a rear perspective view thereof;

FIG. 3 is a front elevation view thereof;

FIG. 4 is a rear elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a right side elevation view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is an enlarged view of portion 9 in FIG. 1;

FIG. 10 is an enlarged view of portion 10 in FIG. 1; and,

FIG. 11 is an enlarged view of portion 11 in FIG. 1.

The evenly broken lines in the drawings illustrate portions of the photography stand that form no part of the claim.

Claims

The ornamental design for a photography stand, as shown and described.

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Other references
  • Neewer Adjustable Stainless Steel C-Stand. [online] Retrieved Jul. 28, 2022 from URL: https://neewer.com/collections/light-stand/products/lighting-studio-10093452 (Year: 2022).
  • China E-Image Professional Heavy Duty Light Stand. [online] Retrieved Jul. 28, 2022 from URL: https://nbeimage2020.en.made-in-china.com/product/ZNgQCdVDewcs/China-E-Image-Professional-Heavy-Duty-Light-Stand-Grip-Arm-Kit-C-Stand-LCS-02-.html (Year: 2022).
  • Photo Studio Stainless Steel Heavy Duty C Stand. [online] Published Feb. 27, 2021. Retrieved Jul. 28, 2022 from URL: https://www.amazon.com/Photo-Studio-Stainless-Steel-Heavy/dp/B08XNDZ2X3 (Year: 2021).
Patent History
Patent number: D967243
Type: Grant
Filed: Jun 10, 2021
Date of Patent: Oct 18, 2022
Assignee: SHENZHEN NEEWER TECHNOLOGY CO. LTD (Shenzhen)
Inventors: Jun Wang (Shenzhen), Yan Ke (Shenzhen)
Primary Examiner: Vy N Koenig
Application Number: 29/794,094