Face mask
Description
1. Face mask
The broken lines do not form part of the claimed designs; reproduction no.
Claims
The ornamental design for a face mask, as shown and described.
Referenced Cited
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Patent History
Patent number: D980411
Type: Grant
Filed: Aug 31, 2021
Date of Patent: Mar 7, 2023
Inventors: Seigou Fujishima (Hamamatsu), Takeharu Ishikawa (Hamamatsu)
Primary Examiner: Rhea Shields
Application Number: 35/513,736
Type: Grant
Filed: Aug 31, 2021
Date of Patent: Mar 7, 2023
Inventors: Seigou Fujishima (Hamamatsu), Takeharu Ishikawa (Hamamatsu)
Primary Examiner: Rhea Shields
Application Number: 35/513,736
Classifications
Current U.S. Class:
Mask (D24/110.1)