Face mask

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Description

1. Face mask

1.1 : Front

1.2 : Back

1.3 : Top

1.4 : Bottom

1.5 : Right

1.6 : Cross sectional

1.7 : Enlarged

1.8 : Enlarged

1.9 : Enlarged

The broken lines do not form part of the claimed designs; reproduction no. 1.6 is the cross sectional view cut along the A-A line in reproduction no. 1.1; reproduction no. 1.7 is the enlarged view of the B-B portion in reproduction no. 1.6; reproduction no. 1.8 is the enlarged view of the C-C portion in reproduction no. 1.6; reproduction no. 1.9 is the enlarged view of the D-D portion in reproduction no. 1.6; left views are omitted since they are mirror images of the right views, respectively.

Claims

The ornamental design for a face mask, as shown and described.

Referenced Cited
U.S. Patent Documents
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D519208 April 18, 2006 Wolfe
D759718 June 21, 2016 Adler
D803391 November 21, 2017 Reese
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D837970 January 8, 2019 Henderson
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D906597 December 29, 2020 Wilson
11246359 February 15, 2022 Coates
D949327 April 19, 2022 Park
D954937 June 14, 2022 An
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D961775 August 23, 2022 Yoon
D962420 August 30, 2022 Smith, IV
D962421 August 30, 2022 Kim
D963838 September 13, 2022 Yoon
D964548 September 20, 2022 Rookard
D964549 September 20, 2022 Amanfoh
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Patent History
Patent number: D980411
Type: Grant
Filed: Aug 31, 2021
Date of Patent: Mar 7, 2023
Inventors: Seigou Fujishima (Hamamatsu), Takeharu Ishikawa (Hamamatsu)
Primary Examiner: Rhea Shields
Application Number: 35/513,736
Classifications
Current U.S. Class: Mask (D24/110.1)