Patents Issued in April 24, 2001
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Patent number: 6221539Abstract: All edge positions constituting a first mask pattern are shifted by a predetermined change amount, to obtain a second mask pattern. A first finished plan shape transferred by the fist mask pattern and a second finished plan shape transferred by the second mask pattern are obtained by a calculation. Coefficients, which are obtained by respectively dividing dimensional differences between the edge positions of the first and second finished plan shapes by the change amount, are respectively calculated and assigned for edges. A corrected pattern is prepared by shifting the edge positions of the first mask pattern in accordance with magnitude of division of differences between a design pattern and the first finished plan shape by the coefficients assigned to the edges.Type: GrantFiled: July 22, 1999Date of Patent: April 24, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Toshiya Kotani, Satoshi Tanaka, Soichi Inoue
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Patent number: 6221540Abstract: A projection exposure apparatus includes a mark detection system adapted to accommodate a photomask having a phase shift type fiducial mark. The mark detection system may include, for example, a photoelectric detector, a light receiving optical system for guiding light from the fiducial mark to the photoelectric detector, and an adjustable stop member for variably setting at least one of an aperture diameter and an aperture position of the stop member.Type: GrantFiled: March 16, 2000Date of Patent: April 24, 2001Assignee: Nikon CorporationInventors: Hiroshi Onoda, Nobutaka Magome
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Patent number: 6221541Abstract: A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.Type: GrantFiled: May 15, 2000Date of Patent: April 24, 2001Assignee: Canon Kabushiki KaishaInventors: Makoto Ogusu, Kenji Saitoh
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Patent number: 6221542Abstract: A photomask for manufacturing a semiconductor device. The photomask is manufactured by a providing a photomask substrate and alternately depositing a plurality of layers of a light-absorbing material and of an etch-stop material on the photomask substrate. The light-absorbing material is selected as having a well-defined etching selectivity from that of the etch-stop material. The layers are successively patterned by removing by a selective etching process at least a portion of at least one of said layers, the portion removed from a lower, in relation to the substrate, layer a subset of the portion removed from a higher layer. Together, the patterned layers are used as a photomask to photolithographically imprint a pattern of a photoresist on a semiconductor wafer under manufacture. The photoresist is used in the etching process of the semiconductor wafer.Type: GrantFiled: August 9, 2000Date of Patent: April 24, 2001Assignee: Micron Technology, Inc.Inventor: Alan R. Reinberg
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Patent number: 6221543Abstract: An improved electronic display that includes components selected to enhance display performance. The improved display includes an active substrate that has a plurality of thin film transistors and a plurality of thermally transferred color filters that include a colorant in a crosslinked binder. The active substrate can also include a black matrix. Other components in the improved display such as a liquid crystal material, spacers, and bottom polarizer, can be selected to enhance display performance characteristics such as brightness, power consumption, response time, weight, and thickness. The invention also provides a method of forming a color filter substrate for displays including the steps of thermally mass transferring a plurality of color filters and crosslinking the plurality of color filters after transfer. Before the crosslinking step, the plurality of color filters can be inspected and removed for reworking of the substrate.Type: GrantFiled: May 14, 1999Date of Patent: April 24, 2001Assignee: 3M Innovatives PropertiesInventors: Paul F. Guehler, Thomas A. Isberg, Kazuhiko Mizuno, Kazuki Noda, Raghunath Padiyath, Richard J. Pokorny, John S. Staral, Jeffrey C. Chang
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Patent number: 6221544Abstract: In an inspecting method of a color filter, comprising irradiating light from a light source to a coloring portion, measuring a transmitting light amount transmitted through the coloring portion by a light receiving element, and calculating a coloring density of the coloring portion, the light amount of the light source is set substantially constant, the amount of incident light received by the light receiving element is adjusted by an optical element arranged within an optical path, the transmitting light amount of an uncoloring portion is measured and the coloring density of the coloring portion is inspected by comparing the transmitting light amount of the coloring portion to the transmitting light amount of the uncoloring portion.Type: GrantFiled: December 23, 1999Date of Patent: April 24, 2001Assignee: Canon Kabushiki KaishaInventors: Satoshi Hayashi, Hiroshi Fujiike, Yoshitomo Marumoto
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Patent number: 6221545Abstract: An adhesive composition that includes the reaction product of (a) a polyester-based polyurethane; (b) an epoxy resin; (c) an epoxy-functional silane; and (d) an isocyanate-functional compound, and multilayer laminates in which this adhesive composition is used to bond two polymeric substrates together where at least one of the substrates has an ink-bearing surface.Type: GrantFiled: September 9, 1999Date of Patent: April 24, 2001Assignee: Imation Corp.Inventors: Bao Tran, Minyu Li, Eric D. Morrison, Claire A. Jalbert, Jai Venkateson, James A. Baker, Gay L. Herman
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Patent number: 6221546Abstract: The present invention is a coating composition comprising a water insoluble polymer having a Tg less than 25° C. and comprising 75 to 100 weight percent of the monomer having the following formula: wherein: X is selected from the group consisting of —Cl, —F, or —CN, and Y is each independently selected from the group consisting of H, Cl, F, CN, CF3, CH3, C2H5, n—C3H7, iso—C3H7, n—C4H9, n—CH11, n—C6H,13, OCH3, OC2H5, phenyl, C6F5, C6Cl5, CH2Cl, CH2F, Cl, F, CN, CF3, C2F5, n—C3F7, iso— C3F7, OCF3, OC2F5, OC3F7, C(CF3)3, CH2(CF3), CH(CF3)2, —COCF3, COC2F5, COCH3, COC2H5.Type: GrantFiled: July 15, 1999Date of Patent: April 24, 2001Assignee: Eastman Kodak CompanyInventors: Hwei-Ling Yau, Kevin M. O'connor, Tienteh M. Chen, David E. Decker
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Patent number: 6221547Abstract: The invention relates to a photosensitive drum based on a cylindrical base which is made with an electrically conductive resin composition which comprises a polyamide resin as the resin component and an electrically conductive material, said polyamide resin being one selected from the group consisting of polyamide resins obtained from m-xylylenediamine and adipic acid, polyamide resins obtained from &egr;-caprolactam, and mixtures thereof. The cylindrical base for the photosensitive drum has good surface smoothness as well as good mechanical strength, and it can be obtained easily by injection molding or the like from said resin composition.Type: GrantFiled: August 30, 1999Date of Patent: April 24, 2001Assignee: Bridgestone CorporationInventors: Munenori Iizuka, Youichi Nishimuro, Kunio Machida
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Patent number: 6221548Abstract: A toner for making an ink printed-like image, which causes less eyestrain resulting from continuously reading the toner image for a long time, is provided. The toner has main particles and each main particle includes 100 parts by weight of binder resin and 1 to 3 parts by weight of black coloring agent dispersed in the binder resin. A developer using the toner and printed matter obtained by using the toner are also provided.Type: GrantFiled: September 15, 1999Date of Patent: April 24, 2001Assignee: Kyocera Mita CorporationInventors: Hiroaki Shiba, Tohru Takatsuna, Takayuki Itakura, Mamoru Kato, Masatomi Funato, Akemi Kowari
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Patent number: 6221549Abstract: A toner for developing a latent electrostatic image to a visible toner image, which is suitable for use in an image formation method in which a toner recycle system is adopted, is proposed. The toner is such a toner that a tetrahydro-furan-soluble component contained therein exhibits a sub-peak within a weight-average molecular weight range of 100,000 to 10,000,000 in a molecular weight distribution measured by gel permeation chromatography, and the toner has a water content of 5000 ppm or less when the toner has been allowed to stand at 30° C., 60%RH for 24 hours. An image formation method using this toner is also proposed.Type: GrantFiled: October 5, 1999Date of Patent: April 24, 2001Assignee: Ricoh Company, Ltd.Inventors: Shigeru Emoto, Masahide Yamashita, Kumi Hasegawa
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Patent number: 6221550Abstract: An electrostatographic toner composition comprises a polymeric binder and a charge control agent selected from the group consisting of 4H-pyrans having the following general structure: where R1 and R2 are the same or different, each representing H or an alkyl, an aryl or a heterocyclic group, or R1 and R2 taken together may form a saturated hydrocarbon ring; R3 and R4 each represent an alkyl or an aryl group; X and Z are the same or different, each representing a cyano substituent, or an alkanoyl, an aroyl, an alkoxycarbonyl, an aryloxycarbonyl, an arylaminocarbonyl, or an alkylaminocarbonyl group. An electrostatographic developer comprises particles of the described toner composition together with carrier particles.Type: GrantFiled: March 31, 2000Date of Patent: April 24, 2001Assignee: NexPress Solutions LLCInventors: John Charles Wilson, Gretchen Schmidt McGrath, Satyanarayan Ayangar Srinivasan
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Patent number: 6221551Abstract: A method for producing a liquid toner composition includes: melt-mixing a colorant and a thermoplastic resin in an extruder to homogeneously disperse the colorant in the thermoplastic resin to form a colorant/resin mixture; mixing the colorant/resin mixture with a non-polar liquid to form a dispersion; and cold grinding the dispersion to form toner particles of the colorant/resin mixture dispersed in the non-polar liquid, wherein the particles have an average particle size of less than about 20 &mgr;m.Type: GrantFiled: September 23, 1999Date of Patent: April 24, 2001Assignee: Xerox CorporationInventors: Frank J. Bonsignore, Christopher P. Manos, George A. Gibson
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Patent number: 6221552Abstract: A method for permanently marking a photoreceptor surface includes the steps of irradiating a surface of a photoreceptor with an irradiation source to permanently mark the photoreceptor, and ablating material from the photoreceptor to at least one controlled depth in the photoreceptor with the irradiation source.Type: GrantFiled: January 19, 2000Date of Patent: April 24, 2001Assignee: Xerox CorporationInventors: Terry L Street, Edward F Grabowski
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Patent number: 6221553Abstract: A thermal transfer element for forming a multilayer device may include a substrate and a multicomponent transfer unit that, when transferred to a receptor, is configured and arranged to form a first operational layer and a second operational layer of a multilayer device. In at least some instances, the thermal transfer element also includes a light-to-heat conversion (LTHC) layer that can convert light energy to heat energy to transfer the multicomponent transfer unit. Transferring the multicomponent transfer unit to the receptor may include contacting a receptor with a thermal transfer element having a substrate and a multicomponent transfer unit. Then, the thermal transfer element is selectively heated to transfer the multicomponent transfer unit to the receptor according to a pattern to form at least first and second operational layers of a device.Type: GrantFiled: April 10, 2000Date of Patent: April 24, 2001Assignee: 3M Innovative Properties CompanyInventors: Martin B. Wolk, Paul F. Baude, Jeffrey M. Florczak, Fred B. McCormick, Yong Hsu
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Patent number: 6221554Abstract: There is described a self-developing film unit which has a photosensitive member and an image-receiving member and wherein one outermost surface of the film unit comprises a support layer carrying a layer of a releasable material and a layer of an adhesive material. After an image is formed in the film unit by photoexposure of the photosensitive element and photographic processing of the exposed photosensitive element, the support and releasable material layer can be removed and the film unit or the image-receiving element, as the case may be, adhered to a surface for viewing of the image.Type: GrantFiled: January 6, 2000Date of Patent: April 24, 2001Assignee: Polaroid CorporationInventors: Philip R. Norris, Harry R. Parsons, William T. Plummer, Donald W. Preissler, Robert J. Wadja
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Patent number: 6221555Abstract: Abnormal losses outside a reflection band attributable to a mismatch of core field diameters are suppressed. A photo-sensitive fiber comprising a core 1 and a cladding having a cladding inner layer and a cladding outer layer formed in this order around the core, in which at least the core is photo-sensitive to form a grating. The core and cladding inner layer include a photo-sensitive dopant for increasing the refractive index. The core additionally includes a first non-photo-sensitive dopant for increasing the refractive index and the cladding inner layer additionally includes a second non-photo-sensitive dopant for creasing the refractive index.Type: GrantFiled: October 6, 1998Date of Patent: April 24, 2001Assignees: Showa Electric Wire & Cable Co., Ltd., Prime Optical Fiber CorporationInventors: Yuichi Murakami, Yuichi Morishita, Kenichi Muta, Jen-Hung Chu, Hen-Tai Shang
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Patent number: 6221556Abstract: Disclosed is an article for the optical storage of data having low birefringence prepared from a mixture of a polycarbonate and a cycloaliphatic polyester. The article may optionally have stabilization and mold release additives that retain transparency, color and processability.Type: GrantFiled: March 5, 1999Date of Patent: April 24, 2001Assignee: General Electric CompanyInventors: Robert R. Gallucci, Frank A. Hoefflin, Steven F. Hubbard, Ramesh Hariharan, Irene Dris
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Patent number: 6221557Abstract: An optical information recording medium includes a substrate with guide grooves thereon, a recording layer provided on the substrate, including a recording material of which phase is reversibly changeable from a stable state to a semistable state and vice versa, a heat-resistant dielectric protective layer provided on the recording layer, including a protective material which includes Zn, Si, S and O, and a light reflection and heat dissipation layer provided on the heat-resistant dielectric protective layer.Type: GrantFiled: February 27, 1997Date of Patent: April 24, 2001Assignee: Ricoh Company, Ltd.Inventors: Makoto Harigaya, Yoshiyuki Kageyama, Hiroko Iwasaki, Michiaki Shinotsuka
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Patent number: 6221558Abstract: The present invention provides an anti-reflection films for lithographic application on polysilicon containing substrate. A structure for improving lithography patterning in an integrated circuit comprises a polysilicon layer, a diaphanous layer located above the polysilicon layer, an anti-reflection layer located above the diaphanous layer, and then a photoresist layer located above the anti-reflection layer for patterning the integrated circuit pattern. The anti-reflection layer is preferably oxynitride.Type: GrantFiled: April 2, 1998Date of Patent: April 24, 2001Assignee: Vanguard International Semiconductor CorporationInventors: Liang-Gi Yao, John Chin-Hsiang Lin, Hua-Tai Lin, Erik S. Jeng, Hsiao-Chin Tuan
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Patent number: 6221559Abstract: The front edge of the a zero throat height (ZTH) defining insulation layer in a magnetic head is formed with a central portion which is centered with respect to a second pole tip with first and second lateral portions which are on each side of the central portion and parallel to the ABS. The central portion is recessed from the ABS a distance appropriate for defining the ZTH between the first and second pole pieces of the head and the first and second lateral edges are further recessed into the head so as to increase the volume of the overcoat layer between the ABS and the first and second lateral edges. The increased volume of the overcoat layer better absorbs stresses and strains due to shock loading and temperature so as to reduce cracking of the head at the ABS.Type: GrantFiled: December 29, 1998Date of Patent: April 24, 2001Assignee: International Business Machines CorporationInventors: Edward Hinpong Lee, Peter Beverley Powell Phipps
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Patent number: 6221560Abstract: A new method for planarizing silicon dioxide surfaces in semiconductor structures. Starting with a structure of an underlying layer (for instance a layer of metal lines) a layer of oxide is deposited and profiled by positive tone imaging. A layer of PPMS is deposited. Using the mask of the starting structure, the PPMS layer is exposed changing the PPMS to PPMSO in the exposed regions. The unexposed PPMS is removed, the PPMSO (unexposed regions of the PPMS) are planarized, this planarization can proceed to the point where no more PPMSO is present (the PPMSO “columns” are removed together with the intra-layer of patterned oxide). The surface thus created shows excellent planarity, this surface can be further planarized down to the top level of the underlying pattern, if it is desirable to do so.Type: GrantFiled: August 12, 1999Date of Patent: April 24, 2001Assignees: Chartered Semiconductor Manufacturing Ltd., National University of SingaporeInventors: Choi Pheng Soo, Lap Chan
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Patent number: 6221561Abstract: A diffusion plate includes a plurality of superimposed basic patterns, each having a large number of microstructures. The microstructures are located in two dimensional periodic arrangements, and lattice vectors, corresponding to the periodic arrangement of the microstructures, vary in accordance with the pattern. The invention also discloses a method for manufacturing a master die for such a diffusion plate, and a focusing screen using the diffusion plate.Type: GrantFiled: August 9, 1999Date of Patent: April 24, 2001Assignee: Asahi Kogaku Kogyo Kabushiki KaishaInventors: Hiroshi Kuboya, Toshiharu Takahashi, Makoto Iki, Moriyasu Shirayanagi, Koichi Maruyama, Teruaki Hiyamuta, Takayuki Sensui
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Patent number: 6221562Abstract: An image reversal method of turning hybrid photoresist spaces into resist lines for sub-feature size applications. The sub-feature size space width of the high resolution hybrid photoresist is largely independent of the lithographic process and mask reticles. These sub-feature size spaces formed by the hybrid resist are then turned into sub-feature size lines using Spin-On-Glass, SOG. The SOG is first coated over the entire patterned hybrid resist to fill in the hybrid spaces and cover the photoresist. SOG is then recessed back to expose the photoresist layer. The exposed photoresist is then removed. The sub-feature size lines are then left behind as a mask to pattern the same onto the underlying films on the substrate.Type: GrantFiled: November 13, 1998Date of Patent: April 24, 2001Assignee: International Business Machines CorporationInventors: Diane C. Boyd, Toshiharu Furukawa, Steven J. Holmes, William H. Ma, Paul A. Rabidoux, David V. Horak
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Patent number: 6221563Abstract: A method of making an organic electroluminescent (EL) device, includes providing positive photoresist layer a plurality of laterally spaced and electrically insulative pedestal strips in a spatial relationship over anode electrodesdisposed on a substrate; forming an undercut-promoting crosslinking inhibition layer over the pedestal strips, and of a material which produces a diffusable crosslinking inhibition agent; providing and patterning an image reversal photoresist layer on the undercut-promoting inhibition layer into an organic vapor deposition mask oriented over each pedestal strip, and having undercut side surfaces which merge with continuous curvature into a mask top surface and wherein the crosslinking inhibition agent has diffused into the organic vapor deposition mask; forming an organic EL-medium layer between adjacent masks; and forming a plurality of cathode electrodes over the organic EL-medium layer, with the cathode electrodes being laterally spaced by the organic masks.Type: GrantFiled: August 12, 1999Date of Patent: April 24, 2001Assignee: Eastman Kodak CompanyInventors: Ewhen Hryhorenko, Steven A. Van Slyke
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Patent number: 6221564Abstract: This invention teaches methods and apparatus for forming self-aligned photosensitive material spacers about protruding structures in semiconductor devices. One embodiment of the invention is a method for forming a lightly doped drain (LDD) structure, utilizing disposable photosensitive material spacers. A second embodiment of the invention comprises a method for forming a transistor, having salicided source/drain regions, utilizing photosensitive polyimide spacers for forming the salicided source/drain regions, without disposing of the spacers. A third embodiment of the invention comprises a method for creating an offset from a protruding structure on a semiconductor substrate, using disposable photosensitive material spacers.Type: GrantFiled: August 13, 1998Date of Patent: April 24, 2001Assignee: Micron Technology, Inc.Inventors: Nanseng Jeng, Christophe Pierrat
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Patent number: 6221565Abstract: The present invention relates generally to electro-optically active waveguide segments, and more particularly to the use of a selective voltage input to control the phase, frequency and/or amplitude of a propagating wave in the waveguide. Particular device structures and methods of manufacturing are described herein.Type: GrantFiled: February 8, 1999Date of Patent: April 24, 2001Assignee: University of New MexicoInventors: Ravinder Jain, Balaji Srinivasan
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Patent number: 6221566Abstract: The present invention is directed to a method of enhancing the photosensitivity of an optical waveguide and an optical waveguide having persistent UV photosensitivity following out diffusion of a loading gas such as H2 or D2. The optical waveguide is loaded with a gas such as H2 or D2 to form an associated baseline refractive index. At least a portion of the loaded optical waveguide is exposed to UV radiation to induce a change in the baseline refractive index and the waveguide is annealed to diffuse the gas from the loaded optical waveguide and to stabilize the change in refractive index. Following annealing the optical waveguide retains a UV photosensitivity sufficient to produce significant refractive index changes relative to the induced change in baseline refractive index. The method of the present invention is particularly well suited for designing and fabricating grating devices, tuning grating strength and wavelength, and for providing accurate spatial control of waveguide photosensitivity.Type: GrantFiled: February 18, 1999Date of Patent: April 24, 2001Assignee: Corning IncorporatedInventors: Glenn Eric Kohnke, Danny Wayne Nightingale, Peter Gerard Wigley
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Patent number: 6221567Abstract: Methods of etching polyamic acid layers and the like are disclosed. In exemplary embodiments of the present invention, the polymeric acid layer to be etched is alternatively exposed to etchant solutions (etchants) and rinse solutions, where the etchant solutions are of relatively moderate alkalinity and the rinse solutions have a lower pH than the etchant solutions. The present invention enables polymeric acid layers to be developed with standard basic etchants at relatively moderate concentrations and at room temperature with little, if any, corrosion to any underlying metal layers. The present invention enables the more reliable and cleaner spin-spray processing method to be employed, thereby significantly increasing yields and reducing overall processing costs. The present invention also enables the etching of thick layers of polymeric acid without the need for special treatments, such as exposure to highly concentrated etchant solutions or high temperature processing conditions.Type: GrantFiled: January 8, 1999Date of Patent: April 24, 2001Assignee: Fujitsu LimitedInventors: Solomon I. Beilin, William T. Chou, David Dung Ngo
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Patent number: 6221568Abstract: The present invention is directed to developer compositions for poly-alpha-acrylate or methacrylate based resists giving high contrast and whose components are closely matched in boiling points. The use of the present developer improved the critical dimensional uniformity of images developed in a positive electron beam resist. More particularly, the present invention is directed to developer formulations whose compositions are directed to enhanced printed linearity, better across the plate uniformity, and improved contrast of the imaged positive resists. Such a improved developer can be used for the positive resist exposed by photons, electrons, ions, or X-rays.Type: GrantFiled: October 20, 1999Date of Patent: April 24, 2001Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Wayne Martin Moreau, Karen Elizabeth Petrillo
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Patent number: 6221569Abstract: There are provided a method of forming color images, wherein the image information recorded in a color negative film, which is constituted so as to provide an optical density of not higher than 0.50 in the non-image area in each of densitometric measurements using red light, green light and blue light respectively after exposure and development processing operation, is read photoelectrically, the read image information is converted into electric digital image information, the converted image information is subjected to picture processing and then the processed image information is transmitted to a printer, thereby reproducing color positive images; and a color negative film having the density specified above in the non-image area.Type: GrantFiled: August 4, 1998Date of Patent: April 24, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Takatoshi Ishikawa
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Patent number: 6221570Abstract: The present invention provides compositions and methods of making one-part bleach-fix liquid concentrates, packaged in a single unit, wherein the bleaching agent is a polyvalent metal oxidizing agent that is protected from reduction for an extended period of time by incorporating a thiocyanate salt as at least one fixing agent. The thiocyanate salt in added in an amount sufficient to provide one-part bleach-fix liquid concentrates that are homogeneous, essentially free of crystallized components and which retain effective oxidizing potential during extended storage.Type: GrantFiled: January 6, 2000Date of Patent: April 24, 2001Assignee: Trebla Chemical CompanyInventor: Laszlo Papai
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Patent number: 6221571Abstract: A silver halide light sensitive photographic element is disclosed comprising a support bearing at least one cyan image forming hydrophilic colloid layer comprising cyan image dye forming coupler of Formula I and benzoic acid ester or diester high boiling solvent of Formula II. wherein Ra is an alkyl group, Rb is a ballast group, and X is hydrogen or a coulping-off group. wherein: each m is independently 0, 1, 2 or 3; each R1 is an individually selected alkyl group with up to four carbon atoms; n is 1 to 7; each R2, R3, R4 and R5 may be the same or different and is individually selected from hydrogen or an alkyl group with up to four carbon atoms; p is 0 to 3; q is 1 to 7; r is 0 or 1; and the log P of the solvent is at least 4.0. The photographic elements of the invention provide high cyan coupler reactivity and form deep cyan dye hues upon photographic processing without degrading cyan dye dark stability.Type: GrantFiled: December 10, 1998Date of Patent: April 24, 2001Assignee: Eastman Kodak CompanyInventors: Paul L. Zengerle, Gary N. Barber
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Patent number: 6221572Abstract: A color photographic material having a support and at least one light-sensitive silver halide emulsion layer and at least one color coupler associated with the latter, wherein the silver halide emulsion layer contains at least one compound of formula (I) wherein m denotes 0, 1, 2, 3 or 4, n denotes 2, 3, 4, 5 or 6, R1 denotes a di- to hexavalent group, R2 denotes alkyl, alkenyl, cycloalkyl, aryl, alkoxy, aryloxy, alkylthio, arylthio, acyl, alkoxycarbonyl, aryloxycarbonyl, hydroxy, halogen, cyano, —SO2R5, —SOR5, —CON(R5)R6 or —SO2N(R5)R6, L1 denotes alkylene, arylene, aralkylene or alkylidene, L2 denotes L3, L4 denote a C1-C3 alkylene which is optionally substituted, R5 denotes alkyl or aryl, and R6 denotes H or R5, wherein L2 and X are as defined in the specification, is distinguished b improved stability to light.Type: GrantFiled: May 14, 1998Date of Patent: April 24, 2001Assignee: Afga-Gevaert Naamloze VennootschapInventors: Jörg Hagemann, Günter Helling, Heinrich Odenwälder
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Patent number: 6221573Abstract: The specification discloses a photographic element comprising a light-sensitive silver halide emulsion layer having associated therewith a dye-forming coupler having Formula F-1: wherein: (1) W1 is a heteroatom or heterogroup; (2) X is hydrogen or a coupling-off group other than halogen, and Y and Z are independently selected from hydrogen or a substituent; (3) W4 and W5 are, independently, either hydrogen or a substituent; (4) R1 is hydrogen or a substituent group, other than unsubstituted phenyl, and is attached through the oxygen atom to a position meta or para to the carbon link to the heterocycle containing W1; and (5) each R2 is an independently selected substituent, and n is 0 to 4; provided that any substituents may join to form a ring.Type: GrantFiled: October 27, 1999Date of Patent: April 24, 2001Assignee: Eastman Kodak CompanyInventors: Faraj Abu-Hasanayn, Beata Owczarczyk, Thomas R. Welter
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Patent number: 6221574Abstract: The present application provides cyanine dyes of the formula (I) in which R1, R2, R3, R4, R5 and R6 mutually independently denote a substituent, providing that at least one of the residues R1, R2, R3 denotes an indolyl substituent, X denotes O, S, Se, NR9, CH═CH or C(CH3)2, wherein R9 denotes a optionally substituted alkyl residue, R7, R8 mutually independently denote alkyl, sulfoalkyl, carboxyalkyl, —(CH2)1—SO2−Y—SO2—alkyl, —(CH2)1—SO2—Y—CO—alkyl, —(CH2)1—CO—Y—SO2—alkyl, —(CH2)1—CO—Y—O—alkyl or —(CH2)1—NH—SO3&thgr;, —(CH2)1—N(alkyl)—SO3&thgr; or —(CH2)1—N(aryl)—SO3&thgr;, providing that l=1 to 6 and Y means NH or N−, n means 1, 3, 5, 7, L denotes a substituted or unsubstituted methine group, which may be a constituent of one or more carbocyclic rings, and M denotes a counterion optionally necessType: GrantFiled: September 29, 1999Date of Patent: April 24, 2001Assignee: Agfa-Gevaert N.V.Inventor: Michael Missfeldt
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Patent number: 6221575Abstract: The invention provides methods for drying platelets to obtain compositions which are storage stable over a wide range of temperatures and for an extended period of time. The invention also provides compositions obtained thereby and devices for use therein.Type: GrantFiled: February 6, 1998Date of Patent: April 24, 2001Assignee: Quadrant Holdings Cambridge Ltd.Inventors: Bruce J. Roser, Valentine Menys, Lynda Grandage, Diana Phipps
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Patent number: 6221576Abstract: The invention relates to a process for preparing a composition comprising macrophages, optionally activated, and/or cells derived from-monocytes with a strong potential for antigen presentation, said process comprising a stage of culture of monocytes present in the starting composition, this stage being preceding and/or followed by a stage of elimination of all or part of the constituents other than the monocytes present in the starting composition, with the aid of antibodies directed against said constituents, and/or followed by a stage of elutriation. The invention also concerns the compositions of kits of reducing this process to practice.Type: GrantFiled: September 23, 1999Date of Patent: April 24, 2001Assignee: I. D. M. Immuno-Designed MoleculesInventors: Jean-Loup Romet-Lemonne, Mohamed Chokri
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Patent number: 6221577Abstract: The invention relates to seroreactive regions on protein E1 and E2 of human papillomavirus (HPV) 16. The application also relates to a vaccine which contains such peptides which contain the seroreactive regions. The invention likewise embraces compositions for diagnostic purposes which contain peptides with the seroreactive regions.Type: GrantFiled: June 6, 1995Date of Patent: April 24, 2001Assignee: Dade Behring Marburg GmbHInventors: Martin Müller, Lutz Gissmann
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Patent number: 6221578Abstract: The present invention is drawn to A method of managing HIV chemotherapy of patients who are HIV positive, which comprises transfecting a cell line susceptible to infection by HIV with a sequence from the pol gene of HIV, which sequence encodes a desired target enzyme, obtained by isolating viral RNA from a sample of a biological material from a patient and reverse transcribing the desired region of the pol gene, and a HIV-DNA construct from which the sequence has been deleted, culturing the transfected cells so as to create a stock of chimeric viruses providing an indication of the resistance profile of the circulating virus, assessing the phenotypic sensitivity of the chimeric viruses to an inhibitor of the enzyme encoded by the pol gene of HIV and assigning a value thereto, constructing a data set comprising the value for chimeric virus sensitivity and the corresponding value for a chimeric wild-type strain of HIV, repeating the sensitivity assessment for at least two further inhibitors and thereby construcType: GrantFiled: July 24, 1998Date of Patent: April 24, 2001Assignee: Virco N.V.Inventors: Marie-Pierre de Béthune, Kurt Hertogs, Rudi Pauwels
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Patent number: 6221579Abstract: The present invention provides an inexpensive and sensitive system and method for detecting analytes present in a medium. The system comprises a diffraction enhancing element, such as functionalized microspheres, which are modified such that they are capable of binding with a target analyte. Additionally, the system comprises a polymer film, which may include a metal coating, upon which is printed a specific, predetermined pattern of a analyte-specific receptors. Upon attachment of a target analyte to select areas of the polymer film, either directly or with the diffraction enhancing element, diffraction of transmitted and/or reflected light occurs via the physical dimensions and defined, precise placement of the analyte. A diffraction image is produced which can be easily seen with the eye or, optionally, with a sensing device.Type: GrantFiled: December 11, 1998Date of Patent: April 24, 2001Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Dennis S. Everhart, Rosann M. Kaylor, Kevin McGrath
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Patent number: 6221580Abstract: The present invention provides an anti-idiotypic antibody having specific reactivity with an idiotope common to more than one type of anti-HIV-1 antibody, and having no specific reactivity with non-HIV-1 antibodies. The present invention provides methods of diagnosis, monitoring and treatment of HIV-related diseases through the use of this antibody or related compounds.Type: GrantFiled: July 5, 2000Date of Patent: April 24, 2001Assignee: Immune Network Research, Ltd.Inventors: Sybille Müller, Haitao Wang
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Patent number: 6221581Abstract: Double hybrid or multihybrid probes and compositions are usefully combined with capture assay and immobilization to provide for detection processes in which target polynucleotides can be detected or the presence or absence of genetic mutations or defects in genetic material can be determined. The capture assay involves capturing a hybrid structure, e.g., single hybrid, double hybrid or multihybrid, or capturing a complex formed by reacting a hybrid structure with a complex forming moiety, e.g., protein, such as a binding protein including an antibody. Immobilization can also be employed prior to hybridization or complexation in which instance a polynucleotide probe can be fixed to a matrix or solid support, e.g., natural or synthetic. Capture and immobilization can be carried out using direct and indirect binding and attachment techniques. Targets can be detected directly or indirectly by using a signal generating moiety and labels.Type: GrantFiled: June 7, 1995Date of Patent: April 24, 2001Assignees: Enzo Diagnostics, Inc., c/o Enzo Biochem, Inc.Inventors: Dean L. Engelhardt, Elazar Rabbani
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Patent number: 6221582Abstract: The invention relates to the use of the GTPase gene family as a target for nucleic acid based assays for the detection and differentiation of prokaryotic organisms. The invention relates to polynucleic acids derived from gene sequences encoding prokaryotic GTPase (=GTP-binding) proteins, as well as their use in the detection and identification of prokaryotic organisms; primers and probes derived from said polynucleic acid sequences, for specific amplification and detection of prokaryotic DNA in a biological sample; as well as methods and kits allowing the detection and identification of at least one micoroorganism, and preferentially several microorganisms simultaneously in a sample. More specifically, the invention relates to new polynucleic acid sequences encoding GTPase proteins from Campylobacter species, primers and probes derived from them, and methods and kits comprising these reagents for the detection and differentiation of species belonging to the genus Campylobacter.Type: GrantFiled: August 7, 1997Date of Patent: April 24, 2001Assignees: Innogenetics N.V., Delft Diagnostic Laboratory B.V.Inventors: Belinda Giesendorf, Wilhelmus Quint, Leendert-Jan Van Doorn
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Patent number: 6221583Abstract: The invention relates to nucleic acids covalently coupled to electrodes via conductive oligomers. More particularly, the invention is directed to the site-selective modification of nucleic acids with electron transfer moieties and electrodes to produce a new class of biomaterials, and to methods of making and using them.Type: GrantFiled: July 24, 1997Date of Patent: April 24, 2001Assignee: Clinical Micro Sensors, Inc.Inventors: Jon Faiz Kayyem, Stephen D. O'Connor, Michael Gozin, Changjun Yu, Thomas J. Meade
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Patent number: 6221584Abstract: The invention concerns a method for the detection of telomerase activity wherein (a) a sample to be tested is provided, (b) a first primer suitable as a telomerase substrate and nucleoside triphosphates are added and the reaction mixture is incubated under conditions under which a primer extension by the telomerase can take place, (c) an amplification of the extension product produced by the telomerase is carried out, (d) the amplification product produced in step (c) is immobilized on a solid phase and (e) the immobilized amplification product is detected qualitatively or/and quantitatively. Furthermore the invention concerns a suitable reagent kit for carrying out the method.Type: GrantFiled: December 29, 1997Date of Patent: April 24, 2001Assignee: Roche Diagnostics GmbHInventors: Thomas Emrich, Hermann Leying, Matthias Hinzpeter, Gerlinde Karl
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Patent number: 6221585Abstract: The present invention relates generally to the field of genomics. More particularly, the present invention relates to a method for gene identification beginning with user-selected input phenotypes. The method is referred to generally as the ValiGeneSMGene Identification method, or the VGIDSM method. The method employs nucleic acid mismatch binding protein chromatography to effect a molecular comparison of one phenotype with others. Genes are identified as having a specified function, or as causing or contributing to the cause or pathogenesis of a specified disease, or as associated with a specific phenotype, by virtue of their selection by the method. Identified genes may be used in development of reagents, drugs and/or combinations thereof useful in clinical or other settings for prognosis, diagnosis and/or treatment of diseases, disorders and/or conditions. The method is equally suited for gene identification for agricultural, bio-engineering, medical, veterinary, and many other applications.Type: GrantFiled: January 15, 1998Date of Patent: April 24, 2001Assignee: ValiGen, Inc.Inventors: Francois J. -M. Iris, Jean-Louis Pourny
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Patent number: 6221586Abstract: Compositions and methods for electrochemical detection and localization of genetic point mutations and other base-stacking perturbations within oligonucleotide duplexes adsorbed onto electrodes and their use in biosensing technologies are described. An intercalative, redox-active moiety (such as an intercalator or nucleic acid-binding protein) is adhered and/or crosslinked to immobilized DNA duplexes at different separations from an electrode and probed electrochemically in the presence or absence of a non-intercalative, redox-active moiety. Interruptions in DNA-mediated electron-transfer caused by base-stacking perturbations, such as mutations or binding of a protein to its recognition site are reflected in a difference in electrical current, charge and/or potential.Type: GrantFiled: April 8, 1998Date of Patent: April 24, 2001Assignee: California Institute of TechnologyInventors: Jacqueline K. Barton, Michael G. Hill, Shana O. Kelley
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Patent number: 6221587Abstract: Methods of identifying molecular interaction sites in eukaryotic and prokaryotic nucleic acids, especially RNA, are described. Secondary structural elements are identified from highly conserved sequences. Methods of preparing databases relating to such molecular interaction sites are also provided herein as are databases themselves. Therapeutic, agricultural, industrial, and other applicability results from interaction of such molecular interaction sites with “small” and other molecules.Type: GrantFiled: May 12, 1998Date of Patent: April 24, 2001Assignee: ISIS Pharmceuticals, Inc.Inventors: David J. Ecker, Ranga Sampath, Richard Griffey, John McNeil
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Patent number: 6221588Abstract: The functional analysis of genes frequently requires the manipulation of large genomic regions. A yeast-bacteria shuttle vector is described, that can be used to clone large regions of DNA by homologous recombination. The important feature of present invention is the presence of the a bacterial replication origin, which allows large DNA insert capacity. The utility of this vector lies in its ability to isolate, manipulate and maintain large fragments in bacteria and yeast, allowing for mutagenesis by yeast genetics and simplified preparation of plasmid DNA in bacteria.Type: GrantFiled: June 10, 1998Date of Patent: April 24, 2001Assignee: Yale UniversityInventors: M. Suzanne Bradshaw, Jacques A. Bollekens, Frank H. Ruddle